NIR, SWIR, MWIR e LWIR exigem projetos distintos
Combine os filtros IR com o material do detector, transmissão do substrato e temperatura de trabalho. As bandas IR não são intercambiáveis.
OPTOStokes é a marca de filtros ópticos da Optofilters.com, com filtros em estoque e revestimentos personalizados para UV, VIS, NIR e IR.
Confira filtros NIR, SWIR, MWIR e LWIR. Compare passa-banda de IR médio, filtros de IR distante, silício, safira, janelas de germânio AR e janelas IR metalizadas para detecção e imagem.
Escolha primeiro a região infravermelha; depois confirme sensibilidade do detector, transmissão do substrato, banda do revestimento, ambiente e montagem. Os materiais IR frequentemente diferem dos usados no visível.
Os filtros IR OPTOStokes cobrem infravermelho próximo (750-1100nm), SWIR 1.1-2.5µm, MWIR 3-5µm e LWIR 8-14µm. O catálogo também inclui passa-banda estreitos de IR médio/distante, passa-banda largos, passa-longa IR, revestimentos AR e janelas IR metalizadas para imagem térmica, gases, espectroscopia e encapsulamento de detectores.
| Modelo | CWL (nm) | Transmitância | FWHM (nm) | Densidade óptica |
|---|---|---|---|---|
| STO-BP680 | 680 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 300-1100 nm |
| STO-BP1120 | 1120 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 300-1200 nm |
| STO-BP1150 | 1150 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 300-1200 nm |
| STO-BP1173 | 1173 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 300-1200 nm |
| STO-BP1250 | 1250 ± 2 | T≥70% | 10-20 | OD ≥ 3 at 700-1800 nm |
| STO-BP1285 | 1285 ± 2 | T≥70% | 10-20 | OD ≥ 3 at 1000-1700 nm |
| STO-BP1455 | 1455 ± 2 | T≥50% | 10-20 | OD ≥ 3 at 1200-1800 nm |
| STO-BP1535 | 1535 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 600-2000 nm |
| STO-BP1545 | 1545 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 600-2000 nm |
| STO-BP1550 | 1550 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 600-2000 nm |
| STO-BP1555 | 1555 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 600-2000 nm |
| STO-BP1570 | 1570 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 1250-1700 nm |
| STO-BP1615 | 1615 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 1450-1900 nm |
| STO-BP1620 | 1620 ± 2 | T≥70% | 10-20 | OD ≥ 3 at 1450-1900 nm |
| STO-BP1625 | 1625 ± 2 | T≥70% | 10-20 | OD ≥ 3 at 1450-1900 nm |
| STO-BP1655 | 1655 ± 5 | T≥70% | 10-20 | OD ≥ 3 at 1350-2200 nm |
| STO-BP1660 | 1660 ± 5 | T≥70% | 10-20 | OD ≥ 3 at 1350-2200 nm |
| STO-BP1680 | 1680 ± 10 | T≥90% | 10-20 | OD ≥ 3 at 800-3000 nm |
| STO-BP1685 | 1685 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 1550-2000 nm |
| STO-BP1695 | 1695 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 1550-2000 nm |
| STO-BP1935 | 1935 ± 2 | T≥60% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP1940 | 1940 ± 2 | T≥60% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP2050 | 2050 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP2180 | 2180 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP2230 | 2230 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP2270 | 2270 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP2340 | 2340 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP1100 | 1100 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1120 | 1120 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1125 | 1125 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1150 | 1150 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1173 | 1173 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1200 | 1200 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1235 | 1235 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1245 | 1245 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1250 | 1250 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1290 | 1290 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1300 | 1300 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1320 | 1320 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1340 | 1340 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1380 | 1380 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1430 | 1430 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1445 | 1445 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1450 | 1450 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1530 | 1530 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1535 | 1535 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1540 | 1540 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1550 | 1550 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1570 | 1570 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1575 | 1575 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1600 | 1600 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 350-1700 nm |
| STO-BP1610 | 1610 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 350-1700 nm |
| STO-BP1630 | 1630 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 350-1700 nm |
| STO-BP1650 | 1650 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1654 | 1654 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1660 | 1660 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 800-3000 nm |
| STO-BP1680 | 1680 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 800-3000 nm |
| STO-BP1700 | 1700 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 800-2000 nm |
| STO-BP1714 | 1714 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 800-2000 nm |
| STO-BP1716 | 1716 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 800-2000 nm |
| STO-BP1780 | 1780 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1800 | 1800 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1810 | 1810 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1818 | 1818 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1830 | 1830 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1920 | 1920 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1930 | 1930 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1935 | 1935 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1940 | 1940 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1945 | 1945 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1950 | 1950 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| Modelo | Comprimento de onda de corte (cut-on) (nm) | Transmitância | Faixa de transmissão (nm) | Densidade óptica |
|---|---|---|---|---|
| STO-LP900 | 900 ± 5 | T≥90% | 910-1100 | OD ≥ 3 at 350-880 nm |
| STO-LP910 | 910 ± 5 | T≥90% | 920-1100 | OD ≥ 3 at 350-890 nm |
| STO-LP920 | 920 ± 5 | T≥90% | 930-1100 | OD ≥ 3 at 350-900 nm |
| STO-LP920 | 920 ± 10 | T≥90% | 940-1700 | OD ≥ 3 at 350-890 nm |
| STO-LP930 | 930 ± 5 | T≥90% | 940-1100 | OD ≥ 3 at 350-910 nm |
| STO-LP940 | 940 ± 5 | T≥90% | 950-1100 | OD ≥ 3 at 350-920 nm |
| STO-LP950 | 950 ± 5 | T≥90% | 970-1100 | OD ≥ 3 at 350-930 nm |
| STO-LP970 | 970 ± 5 | T≥90% | 980-1100 | OD ≥ 3 at 350-940 nm |
| STO-LP1000 | 1000 ± 10 | T≥90% | 1020-2000 | OD ≥ 3 at 350-970 nm |
| STO-LP1010 | 1010 ± 10 | T≥90% | 1030-1200 | OD ≥ 3 at 350-990 nm |
| STO-LP1060 | 1060 ± 10 | T≥88% | 1085-1100 | OD ≥ 3 at 350-1035 nm |
| STO-LP1150 | 1150 ± 10 | T≥90% | 1180-1700 | OD ≥ 3 at 700-1120 nm |
| STO-LP1170 | 1170 ± 10 | T≥90% | 1200-1700 | OD ≥ 3 at 700-1135 nm |
| STO-LP1200 | 1200 ± 10 | T≥90% | 1230-1800 | OD ≥ 3 at 350-1175 nm |
| STO-LP1250 | 1250 ± 10 | T≥90% | 1260-1750 | OD ≥ 3 at 350-1215 nm |
| STO-LP1270 | 1270 ± 10 | T≥90% | 1300-1800 | OD ≥ 3 at 350-1240 nm |
| STO-LP1380 | 1380 ± 10 | T≥90% | 1400-2150 | OD ≥ 3 at 700-1360 nm |
| STO-LP1400 | 1400 ± 10 | T≥90% | 1420-1100 | OD ≥ 3 at 350-1380 nm |
| STO-LP1450 | 1450 ± 10 | T≥90% | 1480-1800 | OD ≥ 3 at 350-1420 nm |
| STO-LP1470 | 1470 ± 10 | T≥90% | 1500-1800 | OD ≥ 3 at 350-1400 nm |
| STO-LP1600 | 1600 ± 10 | T≥90% | 1625-2300 | OD ≥ 3 at 350-1540 nm |
Filtros passa-banda estreitos de IR médio e distante usam silício, safira, germânio, fluoreto de cálcio e seleneto de zinco nas bandas MWIR e LWIR. Há dimensões personalizadas para módulos detectores e sistemas térmicos.
| Modelo | Região IR | CWL (nm) | FWHM (nm) | Transmitância de pico | Bloqueio | Substrato | Dimensões |
|---|---|---|---|---|---|---|---|
| STO-NBP 2750 500nm | MWIR | 2750 ± 50 | 500 ± 60 | >=80% | 400-7000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 2775 250nm | MWIR | 2775 ± 30 | 250 ± 20 | >=80% | 400-7000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 2850 400nm | MWIR | 2850 ± 40 | 400 ± 30 | >=80% | 400-7000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3040 140nm | MWIR | 3040 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3040 140nm | MWIR | 3040 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 3060 140nm | MWIR | 3060 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3060 140nm | MWIR | 3060 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 3080 140nm | MWIR | 3080 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 3090 140nm | MWIR | 3090 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3280 160nm | MWIR | 3280 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3300 160nm | MWIR | 3300 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3300 160nm | MWIR | 3300 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 3310 60nm | MWIR | 3310 ± 10 | 60 ± 20 | >=80% | 400-4700nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3330 60nm | MWIR | 3330 ± 10 | 60 ± 20 | >=80% | 400-4700nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3330 160nm | MWIR | 3330 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3375 160nm | MWIR | 3375 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3375 160nm | MWIR | 3375 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 3400 120nm | MWIR | 3400 ± 30 | 120 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3400 180nm | MWIR | 3400 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3420 180nm | MWIR | 3420 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3440 120nm | MWIR | 3440 ± 30 | 120 ± 20 | >=80% | 400-25000nm,T ≤ 1% | Sapphire | Dia. 25 x 0.8mm |
| STO-NBP 3440 160nm | MWIR | 3440 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3460 150nm | MWIR | 3460 ± 30 | 150 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3800 300nm | MWIR | 3800 ± 40 | 300 ± 30 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3900 90nm | MWIR | 3900 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3920 90nm | MWIR | 3920 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3950 90nm | MWIR | 3950 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3950 90nm | MWIR | 3950 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | 3.3 x 3.3 x 0.5mm |
| STO-NBP 3970 90nm | MWIR | 3970 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4000 90nm | MWIR | 4000 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4050 180nm | MWIR | 4050 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4100 180nm | MWIR | 4100 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4200 180nm | MWIR | 4200 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4230 160nm | MWIR | 4230 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4260 180nm | MWIR | 4260 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4260 180nm | MWIR | 4260 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | 2.9 x 2.9 x 0.5mm |
| STO-NBP 4260 180nm | MWIR | 4260 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | 3.3 x 3.3 x 0.5mm |
| STO-NBP 4280 180nm | MWIR | 4280 ± 20 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4300 130nm | MWIR | 4300 ± 30 | 130 ± 20 | >=75% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4300 160nm | MWIR | 4300 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4300 180nm | MWIR | 4300 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4320 160nm | MWIR | 4320 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4330 130nm | MWIR | 4330 ± 30 | 130 ± 20 | >=80% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4330 180nm | MWIR | 4330 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4360 180nm | MWIR | 4360 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4380 180nm | MWIR | 4380 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4420 60nm | MWIR | 4420 ± 10 | 60 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4430 60nm | MWIR | 4430 ± 10 | 60 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4450 60nm | MWIR | 4450 ± 10 | 60 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4450 200nm | MWIR | 4450 ± 30 | 200 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4480 60nm | MWIR | 4480 ± 10 | 60 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4500 60nm | MWIR | 4500 ± 10 | 60 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4500 140nm | MWIR | 4500 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4500 200nm | MWIR | 4500 ± 30 | 200 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4520 140nm | MWIR | 4520 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4560 160nm | MWIR | 4560 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4600 160nm | MWIR | 4600 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4640 160nm | MWIR | 4640 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4650 160nm | MWIR | 4650 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4680 150nm | MWIR | 4680 ± 30 | 150 ± 20 | >=80% | 400-25000nm,T ≤ 1% | Sapphire | Dia. 25 x 0.8mm |
| STO-NBP 4690 160nm | MWIR | 4690 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4750 180nm | MWIR | 4750 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4770 150nm | MWIR | 4770 ± 30 | 150 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 5300 600nm | MWIR/LWIR transition | 5300 ± 40 | 600 ± 30 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.5mm |
| STO-NBP 7300 300nm | MWIR/LWIR transition | 7300 ± 40 | 300 ± 30 | >=70% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.5mm |
| STO-NBP 7350 200nm | MWIR/LWIR transition | 7350 ± 30 | 200 ± 30 | >=65% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 7410 200nm | MWIR/LWIR transition | 7410 ± 30 | 200 ± 30 | >=65% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 7470 200nm | MWIR/LWIR transition | 7470 ± 30 | 200 ± 30 | >=75% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 7625 200nm | MWIR/LWIR transition | 7625 ± 30 | 200 ± 30 | >=75% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 7650 200nm | MWIR/LWIR transition | 7650 ± 30 | 200 ± 30 | >=60% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 8420 200nm | LWIR | 8420 ± 40 | 200 ± 30 | >=60% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 9020 180nm | LWIR | 9020 ± 30 | 180 ± 30 | >=75% | 400-16000nm,T ≤ 1% | Float-zone silicon | Dia. 100 x 0.5mm |
| STO-NBP 9080 180nm | LWIR | 9080 ± 30 | 180 ± 30 | >=75% | 400-16000nm,T ≤ 1% | Float-zone silicon | Dia. 100 x 0.5mm |
| STO-NBP 9900 370nm | LWIR | 9900 ± 30 | 370 ± 20 | >=70% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10000 370nm | LWIR | 10000 ± 40 | 370 ± 30 | >=75% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10050 370nm | LWIR | 10050 ± 40 | 370 ± 30 | >=60% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10270 600nm | LWIR | 10270 ± 40 | 600 ± 30 | >=75% | 400-13500nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10460 370nm | LWIR | 10460 ± 40 | 370 ± 30 | >=75% | 400-14000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10500 600nm | LWIR | 10500 ± 50 | 600 ± 40 | >=75% | 400-13500nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10560 370nm | LWIR | 10560 ± 40 | 370 ± 30 | >=75% | 400-18000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10700 370nm | LWIR | 10700 ± 40 | 370 ± 30 | >=75% | 400-14000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 11500 600nm | LWIR | 11500 ± 50 | 600 ± 40 | >=65% | 400-14500nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 11700 600nm | LWIR | 11700 ± 50 | 600 ± 40 | >=65% | 400-14500nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 14500 1000nm | LWIR | 14500 ± 50 | 1000 ± 50 | >=70% | 400-19000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.5mm |
Filtros passa-banda largos cobrem janelas MWIR e LWIR amplas com bloqueio fora da banda para imagem térmica, gases e detecção IR.
| Modelo | Região IR | Faixa de transmissão | Transmitância média | Bloqueio | Dimensões | Substrato |
|---|---|---|---|---|---|---|
| STO-WBP 3100-3800nm Filter | MWIR | 3100-3800nm | >=85% | 400-25000nm, < =1% | Custom | Sapphire |
| STO-WBP 3250-3500nm Filter | MWIR | 3250-3500nm | >=88% | 400-6000nm, < =1% | Custom | Germanium |
| STO-WBP 3550-4150nm Filter | MWIR | 3550-4150nm | >=90% | 400-6000nm, < =1% | Custom | Germanium |
| STO-WBP 3670-4970nm Filter | MWIR | 3670-4970nm | >=90% | 400-6000nm, < =1% | Custom | Germanium |
| STO-WBP 4500-5000nm Filter | MWIR | 4500-5000nm | >=90% | 400-6000nm, < =1% | Custom | Germanium |
| STO-WBP 4750-5400nm Filter | MWIR/LWIR transition | 4750-5400nm | >=80% | 400-25000nm, < =1% | Custom | Sapphire |
| STO-WBP 8000-14000nm Filter | LWIR | 8000-14000nm | >75% | 0.4-7.5um, 15-21.5um, < =1% | Custom | Monocrystalline silicon |
| STO-WBP 8000-9450nm Filter | LWIR | 8000-9450nm | >=92% | 400-12000nm, < =1% | Custom | Germanium |
Filtros infravermelhos passa-longa transmitem comprimentos de onda maiores e bloqueiam os menores para isolamento do detector e caminhos de imagem térmica.
| Modelo | Região IR | Faixa de transmissão | Transmitância média | Bloqueio | Dimensões | Substrato |
|---|---|---|---|---|---|---|
| STOLWP 3000-5000nm Filter | MWIR | 3000-5000nm | >85% | 400-2900nm, < =1% | Custom | Sapphire |
| STOLWP 5500-14000nm | LWIR | 5500-14000nm | >80% | 400-5000nm, < =1% | Custom | Monocrystalline silicon |
| STOLWP 7000-14000nm Filter | LWIR | 7000-14000nm | >80% | 400-6500nm, < =1% | Custom | Monocrystalline silicon |
| STOLWP 7700-9000nm Filter | LWIR | 7700-9000nm | >80% | 400-7600nm, < =1% | Custom | Monocrystalline silicon |
| STOLWP 8000-12000nm Filter | LWIR | 8000-12000nm | >85% | 400-7500nm, < =1% | Custom | Germanium |
Revestimentos antirreflexo infravermelhos reduzem a reflexão superficial e melhoram a transmissão de ópticas de silício, safira e germânio.
| Revestimento | Região IR | Faixa de transmissão | Transmitância média | Dimensões | Substrato |
|---|---|---|---|---|---|
| 0.8-5µm AR | MWIR | 0.8-5um | >=86% | Custom | Sapphire |
| 2.9-14.5µm AR | LWIR | 2.9-14.5um | >=73% | Custom | Germanium |
| 3-5µm AR | MWIR | 3-5um | >=90% | Custom | Monocrystalline silicon |
| 7-12µm AR | LWIR | 7-12um | >=88% | Custom | Monocrystalline silicon |
| 8-12µm AR+DLC | LWIR | 8-12um | >=75% | Custom | Monocrystalline silicon |
| 8-14µm AR | LWIR | 8-14um | >=83% | Custom | Monocrystalline silicon |
Janelas IR metalizadas combinam uma abertura óptica revestida e bordas metalizadas para soldagem ou encapsulamento hermético de detectores e sistemas de imagem.
| Especificação | Região IR | Abertura útil | Área metalizada | Especificação espectral | Substrato | Dimensões externas |
|---|---|---|---|---|---|---|
| 16 x 16 x 0.8mm | MWIR | 13.2 x 13.2 | ≥13.7 x 13.7 | 3-5um, Tavg≥96% | Germanium | 16 x 16 |
| Dia. 12 x 1mm | MWIR | Dia. 10 | ≥Dia. 10.5 | 3-5um, Tavg≥96% | Monocrystalline silicon | Dia. 12 |
| Dia. 18 x 1mm | MWIR | Dia. 14 | ≥Dia. 14.5 | 3-5um, Tavg≥96% | Monocrystalline silicon | Dia. 18 |
| Dia. 30 x 1mm | MWIR | Dia. 26 | ≥Dia. 26.5 | 3-5um, Tavg≥96% | Sapphire | Dia. 30 |
| 10 x 10 x 1mm | LWIR | 8.5 x 8.5 x 0.9 | ≥8.9 x 8.9 | 8-12um, Tavg≥82% | Monocrystalline silicon | 10 x 10 x 1 |
| Dia. 2.5 x 0.28mm | SWIR | Dia. 1.6 | ≥Dia. 1.8 | 1250-1650nm, Tavg>99% | Sapphire | Dia. 2.5 |
Modelos passa-banda IR adicionais com FWHM de até 10 nm. O resumo mantém os critérios ópticos visíveis; as dimensões físicas são verificadas na cotação.
| Modelo | Faixa espectral | Classe de largura de banda | CWL (nm) | FWHM (nm) | Transmitância (T) | Resumo do bloqueio | Substrato | Espessura do substrato (mm) |
|---|---|---|---|---|---|---|---|---|
| STO-BP2475±5 | SWIR | ultra-narrow | 2475 ± 5 | 10 ± 5 | T>=60% | 600-3000 nm; T < 1% | Borosilicate glass | 2 |
| STO-BP2490±5 | SWIR | ultra-narrow | 2490 ± 5 | 10 ± 5 | T>=60% | 600-3000 nm; T < 1% | Borosilicate glass | 2 |
Modelos passa-banda IR adicionais com FWHM acima de 10 nm e até 20 nm, agrupados para agilizar a seleção de comprimento de onda e largura de banda.
| Modelo | Faixa espectral | Classe de largura de banda | CWL (nm) | FWHM (nm) | Transmitância (T) | Resumo do bloqueio | Substrato | Espessura do substrato (mm) |
|---|---|---|---|---|---|---|---|---|
| STO-BP1440±20 | SWIR | narrow | 1440 ± 5 | 20 ± 10 | T>=70% | 400-2200 nm; T < 1% | White glass | 3 |
| STO-BP1645±5 | SWIR | narrow | 1645 ± 5 | 20 ± 5 | T>=90% | 800-2000 nm; T < 1% | Borosilicate glass | 0.5 |
| STO-BP1663±5 | SWIR | narrow | 1663 ± 5 | 20 ± 5 | T>=80% | 800-2000 nm; T < 1% | Borosilicate glass | 0.5 |
| STO-BP1697 | SWIR | narrow | 1697 ± 2 | 15 ± 2 | T>=85% | 800-2000 nm; T < 1% | Borosilicate glass | 0.5 |
| STO-BP1745±15 | SWIR | narrow | 1740 ± 5 | 20 ± 5 | T=55-65% | 400-2200 nm; T < 1.5% | White glass | 3 |
Modelos passa-banda IR adicionais com FWHM acima de 20 nm para seleção espectral mais ampla.
| Modelo | Faixa espectral | Classe de largura de banda | CWL (nm) | FWHM (nm) | Transmitância (T) | Resumo do bloqueio | Substrato | Espessura do substrato (mm) |
|---|---|---|---|---|---|---|---|---|
| STO-BP900±30 | NIR | standard | 900 ± 30 | 70 ± 30 | T>=90% | 650-1250 nm; T < 1% | Sapphire | 3.5 |
| STO-BP1380±30 | SWIR | standard | 1380 ± 30 | 70 ± 30 | T>=85% | 500-2000 nm; T < 1% | Sapphire | 3.5 |
| STO-BP1600±16 | SWIR | standard | 1600 ± 16 | 150 ± 20 | T>=80% | 400-3000 nm; T < 1% | Corning 7980 | 2 |
| STO-BP1900±20 | SWIR | standard | 1900 ± 20 | 50 ± 15 | T>=80% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP1940±18 | SWIR | standard | 1940 ± 18 | 45 ± 10 | T>=80% | 400-3000 nm; T < 1% | White glass | 1, 2 |
| STO-BP2010±20 | SWIR | standard | 2010 ± 20 | 180 ± 30 | T>=80% | 500-3000 nm; T < 1% | Sapphire | 3.5 |
| STO-BP2017±10 | SWIR | standard | 2017 ± 10 | 35 ± 10 | T>=55% | 400-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP2050±20 | SWIR | standard | 2050 ± 20 | 200 ± 30 | T>=80% | 500-3000 nm; T < 1% | Sapphire | 3.5 |
| STO-BP2120±20 | SWIR | standard | 2120 ± 20 | 50 ± 10 | T>=80% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP2220±20 | SWIR | standard | 2220 ± 20 | 45 ± 10 | T>=75% | 400-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP2240±20 | SWIR | standard | 2240 ± 20 | 30 ± 10 | T>=80% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP2250±10 | SWIR | standard | 2250 ± 10 | 30 ± 10 | T>=85% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP2300±20 | SWIR | standard | 2300 ± 20 | 90 ± 10 | T>=90% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP2310±20 | SWIR | standard | 2310 ± 20 | 90 ± 10 | T>=90% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP2400±24 | SWIR | standard | 2400 ± 24 | 70 ± 30 | T>=75% | 500-3000 nm; T < 1% | Sapphire | 3.5 |
| STO-BP2435±10 | SWIR | standard | 2435 ± 10 | 60 ± 15 | T>=70% | 400-20000 nm; T < 1% | Sapphire | 1 |
| STO-BP2435±20 | SWIR | standard | 2435 ± 20 | 60 ± 15 | T>=70% | 400-20000 nm; T < 1% | Sapphire | 1 |
| STO-BP2460±20 | SWIR | standard | 2460 ± 20 | 50 ± 10 | T>=80% | 1500-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP2470±30 | SWIR | standard | 2470 ± 30 | 50 ± 20 | T>=75% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2500±25 | MWIR | standard | 2500 ± 25 | 70 ± 30 | T>=80% | 500-3000 nm; T < 1% | Sapphire | 1, 3.5 |
| STO-BP2520±10 | MWIR | standard | 2520 ± 10 | 50 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2530±30 | MWIR | standard | 2530 ± 30 | 50 ± 20 | T>=75% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2550±50 | MWIR | standard | 2550 ± 50 | 70 ± 30 | T>=75% | 500-3000 nm; T < 1% | Sapphire | 1, 3.5 |
| STO-BP2560±30 | MWIR | standard | 2560 ± 30 | 50 ± 20 | T>=75% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2570±30 | MWIR | standard | 2570 ± 30 | 50 ± 20 | T>=75% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2580±30 | MWIR | standard | 2580 ± 30 | 50 ± 20 | T>=75% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2600±10 | MWIR | standard | 2600 ± 10 | 50 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2600±30 | MWIR | standard | 2600 ± 30 | 50 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2610±30 | MWIR | standard | 2610 ± 30 | 50 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2720 | MWIR | standard | 2720 ± 50 | 140 ± 20 | T>=80% | 100-30000 nm; T < 1% | Fused silica | 1 |
| STO-BP2730±30 | MWIR | standard | 2730 ± 30 | 210 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 1 |
| STO-BP2750±50 | MWIR | standard | 2750 ± 50 | 140 ± 20 | T>=80% | 200-30000 nm; T < 1% | Fused silica | 1 |
| STO-BP2850±28 | MWIR | standard | 2850 ± 28 | 86 ± 20 | T>=80% | 1500-5500 nm; T < 1% | Silicon | 0.5, 6.35 |
| STO-BP2900±20 | MWIR | standard | 2900 ± 20 | 50 ± 10 | T>=70% | 1500-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP3030±40 | MWIR | standard | 3030 ± 40 | 145 ± 30 | T>=85% | 400-11000 nm | Silicon | 0.5 |
| STO-BP3050±50 | MWIR | standard | 3050 ± 50 | 100 ± 20 | T>=80% | 300-20000 nm; T < 1% | Sapphire | 1 |
| STO-BP3085±30 | MWIR | standard | 3085 ± 30 | 100 ± 20 | T>=80% | 300-30000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-BP3130±40 | MWIR | standard | 3130 ± 40 | 145 ± 30 | T>=85% | 400-11000 nm | Silicon | 0.5 |
| STO-BP3150±20 | MWIR | standard | 3150 ± 20 | 60 ± 10 | T>=80% | 1500-5500 nm; T < 1% | Fused silica | 0.5 |
| STO-BP3250±25 | MWIR | standard | 3250 ± 25 | 210 ± 10 | T>=80% | 400-3800 nm; T < 1% | Silicon | 0.25 |
| STO-BP3250±50 | MWIR | standard | 3250 ± 50 | 180 ± 20 | T>=80% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3275±20 | MWIR | standard | 3275 ± 10 | 30 ± 10 | T>=70% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP3280±30 | MWIR | standard | 3280 ± 30 | 210 ± 15 | T>=75% | 400-3800 nm; T < 1% | Silicon | 0.25 |
| STO-BP3315±10 | MWIR | standard | 3315 ± 10 | 210 ± 10 | T>=80% | 400-3800 nm; T < 1% | Silicon | 0.25 |
| STO-BP3320±50单 | MWIR | standard | 3320 ± 50 | 190 ± 20 | T>=60% | 800-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3330±15 | MWIR | standard | 3330 ± 15 | 160 ± 20 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3360±20 | MWIR | standard | 3360 ± 20 | 70 ± 10 | T>=80% | 1500-6500 nm; T < 1% | Fused silica | 0.5 |
| STO-BP3370±35 | MWIR | standard | 3370 ± 35 | 660 ± 70 | T>=80% | 400-3800 nm; T < 1% | Silicon | 0.25, 0.38 |
| STO-BP3370±50 | MWIR | standard | 3370 ± 50 | 400 ± 30 | T>=80% | 1000-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3375±20 | MWIR | standard | 3375 ± 20 | 180 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-BP3375±40 | MWIR | standard | 3375 ± 40 | 660 ± 70 | T>=85% | 400-7000 nm; T < 1% | Silicon | 0.25 |
| STO-BP3390±35 | MWIR | standard | 3390 ± 35 | 210 ± 10 | T>=80% | 400-7000 nm; T < 1% | Silicon | 0.25 |
| STO-BP3416±20 | MWIR | standard | 3416 ± 20 | 120 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3430±40 | MWIR | standard | 3430 ± 40 | 120 ± 20 | T>=75% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3440±30 | MWIR | standard | 3440 ± 30 | 120 ± 10 | T>=80% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3580±40 | MWIR | standard | 3580 ± 40 | 160 ± 20 | T>=80% | 400-20000 nm; T < 1% | Sapphire | 0.5 |
| STO-BP3615±20 | MWIR | standard | 3615 ± 20 | 160 ± 20 | T>=80% | 400-20000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-BP3630±50 | MWIR | standard | 3630 ± 50 | 145 ± 20 | T>=80% | 400-15000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-BP3660±20 | MWIR | standard | 3660 ± 20 | 40 ± 10 | T>=80% | 800-6000 nm; T < 1% | Silicon | 0.5, 0.916 |
| STO-BP3680±40 | MWIR | standard | 3680 ± 40 | 162 ± 24 | T>=85% | 400-11000 nm | Silicon | 0.5 |
| STO-BP3770±20 | MWIR | standard | 3770 ± 20 | 50 ± 10 | T>=80% | 400-13600 nm; T < 1% | Sapphire | 0.5 |
| STO-BP3940±60 | MWIR | standard | 3940 ± 60 | 90 ± 20 | T>=80% | 1000-9000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3950±39 | MWIR | standard | 3950 ± 39 | 200 ± 20 | T>=85% | 400-8000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3990±50 | MWIR | standard | 3990 ± 50 | 180 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4020±40 | MWIR | standard | 4020 ± 40 | 180 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4050±50 | MWIR | standard | 4050 ± 50 | 100 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4060±50 | MWIR | standard | 4060 ± 50 | 100 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4073±40 | MWIR | standard | 4073 ± 40 | 125 ± 50 | T>=85% | 400-11000 nm | Silicon | 0.5 |
| STO-BP4260±50 | MWIR | standard | 4260 ± 50 | 180 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4320±50 | MWIR | standard | 4320 ± 50 | 600 ± 40 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4380±50 | MWIR | standard | 4380 ± 50 | 150 ± 20 | T>=80% | 1000-9000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4490±70 | MWIR | standard | 4490 ± 70 | 180 ± 20 | T>=70% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4515±20 | MWIR | standard | 4515 ± 20 | 90 ± 20 | T>=75% | 200-30000 nm; T < 1% | Sapphire | 1 |
| STO-BP4530±45 | MWIR | standard | 4530 ± 45 | 350 ± 20 | T>=80% | 400-20000 nm; T < 1% | Sapphire | 0.3, 0.5 |
| STO-BP4560±40 | MWIR | standard | 4560 ± 40 | 310 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4580±60 | MWIR | standard | 4580 ± 60 | 140 ± 20 | T>=70% | 400-10000 nm; T < 1% | Silicon | 1 |
| STO-BP4680±50 | MWIR | standard | 4680 ± 50 | 180 ± 20 | T>=75% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP4680±55 | MWIR | standard | 4680 ± 55 | 180 ± 20 | T>=70% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP4680±60 | MWIR | standard | 4680 ± 60 | 180 ± 20 | T>=75% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP4710±20 | MWIR | standard | 4710 ± 20 | 140 ± 20 | T>=75% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP4710±40 | MWIR | standard | 4710 ± 40 | 180 ± 20 | T>=75% | 400-20000 nm; T < 1% | Sapphire | 1 |
| STO-BP4760±50 | MWIR | standard | 4760 ± 50 | 285 ± 70 | T>=80% | 400-11000 nm | Silicon | 0.5 |
| STO-BP4830±40 | MWIR | standard | 4830 ± 40 | 220 ± 20 | T>=75% | 400-11000 nm; T < 1% | Germanium | 1 |
| STO-BP5000±50 | MWIR/LWIR transition | standard | 5000 ± 50 | 150 ± 20 | T>=85% | 1000-10000 nm; T < 1% | Silicon | 1.5 |
| STO-BP5010±50 | MWIR/LWIR transition | standard | 5010 ± 50 | 220 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP5070±40 | MWIR/LWIR transition | standard | 5070 ± 50 | 100 ± 20 | T>=75% | 400-20000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-BP5120±50 | MWIR/LWIR transition | standard | 5120 ± 50 | 320 ± 20 | T>=70% | 400-5500 nm; T < 1% | Silicon | 1 |
| STO-BP5200±50 | MWIR/LWIR transition | standard | 5200 ± 50 | 610 ± 40 | T>=80% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP5250±50 | MWIR/LWIR transition | standard | 5250 ± 50 | 90 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-BP5380±30 | MWIR/LWIR transition | standard | 5380 ± 30 | 100 ± 20 | T>=65% | 400-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP5450±30 | MWIR/LWIR transition | standard | 5450 ± 30 | 100 ± 20 | T>=65% | 400-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP5480±30 | MWIR/LWIR transition | standard | 5480 ± 30 | 100 ± 20 | T>=65% | 400-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP5600±60 | MWIR/LWIR transition | standard | 5600 ± 60 | 120 ± 20 | T>=80% | 1000-10000 nm | Silicon | 1.5 |
| STO-BP5850±50 | MWIR/LWIR transition | standard | 5850 ± 50 | 200 ± 20 | T>=70% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP5850±60 | MWIR/LWIR transition | standard | 5850 ± 60 | 160 ± 20 | T>=75% | 1000-10000 nm; T < 1% | Silicon | 1.5 |
| STO-BP5950±50 | MWIR/LWIR transition | standard | 5950 ± 50 | 200 ± 20 | T>=70% | 1000-10000 nm; T < 1% | Silicon | 0.5 |
| STO-BP6050±50 | MWIR/LWIR transition | standard | 6050 ± 50 | 200 ± 20 | T>=75% | 1000-10000 nm; T < 1% | Silicon | 1.5 |
| STO-BP6150±60 | MWIR/LWIR transition | standard | 6150 ± 60 | 200 ± 20 | T>=70% | 1000-10000 nm; T < 1% | Silicon | 1.5 |
| STO-BP6220±30 | MWIR/LWIR transition | standard | 6220 ± 62 | 140 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP6235±30 | MWIR/LWIR transition | standard | 6235 ± 30 | 110 ± 20 | T>=60% | 400-11000 nm; T < 1% | Germanium | 0.9, 1 |
| STO-BP6240±40 | MWIR/LWIR transition | standard | 6240 ± 40 | 90 ± 20 | T>=70% | 400-11000 nm; T < 1% | Germanium | 1 |
| STO-BP6250±30 | MWIR/LWIR transition | standard | 6250 ± 30 | 120 ± 20 | T>=70% | 400-15000 nm; T < 1% | Silicon | 1 |
| STO-BP6820±68 | MWIR/LWIR transition | standard | 6820 ± 68 | 100 ± 20 | T>=75% | 400-10600 nm; T < 1% | Silicon | 1 |
| STO-BP6910±20 | MWIR/LWIR transition | standard | 6910 ± 30 | 90 ± 20 | T>=65% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP7400±50 | MWIR/LWIR transition | standard | 7400 ± 50 | 360 ± 20 | T>=80% | 400-10600 nm; T < 1% | Silicon | 0.5 |
| STO-BP7500±50 | MWIR/LWIR transition | standard | 7500 ± 50 | 2500 ± 100 | T>=90% | 400-17100 nm; T < 1% | Germanium | 0.6 |
| STO-BP7530±30 | MWIR/LWIR transition | standard | 7530 ± 30 | 180 ± 30 | T>=80% | 400-10600 nm; T < 1% | Silicon | 0.5, 1 |
| STO-BP7690±50 | MWIR/LWIR transition | standard | 7690 ± 50 | 340 ± 30 | T>=70% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-BP7700±50 | MWIR/LWIR transition | standard | 7700 ± 50 | 450 ± 30 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-BP7720±50 | MWIR/LWIR transition | standard | 7720 ± 50 | 180 ± 30 | T>=80% | 400-10600 nm; T < 1% | Silicon | 0.5, 1 |
| STO-BP7760±50 | MWIR/LWIR transition | standard | 7760 ± 50 | 500 ± 30 | T>=80% | 200-13500 nm; T < 1% | Silicon | 0.5 |
| STO-BP7780±20 | MWIR/LWIR transition | standard | 7780 ± 20 | 180 ± 30 | T>=80% | 400-10600 nm; T < 1% | Silicon | 0.5, 1 |
| STO-BP7800±50 | MWIR/LWIR transition | standard | 7800 ± 50 | 450 ± 30 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-BP7890±80 | MWIR/LWIR transition | standard | 7890 ± 80 | 500 ± 30 | T>=80% | 200-13500 nm; T < 1% | Silicon | 0.5 |
| STO-BP7950±50 | MWIR/LWIR transition | standard | 7950 ± 50 | 450 ± 30 | T>=75% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-BP7950±80 | MWIR/LWIR transition | standard | 7950 ± 80 | 250 ± 20 | T>75% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP8010±20 | LWIR | standard | 8010 ± 20 | 200 ± 20 | T>90% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP8060±60 | LWIR | standard | 8060 ± 60 | 250 ± 20 | T>80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP8120±30 | LWIR | standard | 8120 ± 30 | 250 ± 20 | T>90% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP8340±30 | LWIR | standard | 8340 ± 30 | 250 ± 20 | T>75% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP8350±100 | LWIR | standard | 8350 ± 100 | 45 ± 10 | T>70% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP8400±100 | LWIR | standard | 8400 ± 100 | 50 ± 20 | T>70% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP8500±100 | LWIR | standard | 8500 ± 100 | 50 ± 10 | T>70% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP8550±100 | LWIR | standard | 8550 ± 100 | 45 ± 10 | T>70% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP8700±100 | LWIR | standard | 8700 ± 100 | 210 ± 30 | T>=75% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP8800±100 | LWIR | standard | 8800 ± 100 | 210 ± 30 | T>=75% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP10100±100 | LWIR | standard | 10100 ± 100 | 660 ± 40 | T>=85% | 400-14000 nm; T < 1% | Germanium | 1 |
| STO-BP10220±100 | LWIR | standard | 10220 ± 100 | 660 ± 40 | T>=85% | 400-14000 nm; T < 1% | Germanium | 1 |
| STO-BP10580±50 | LWIR | standard | 10580 ± 50 | 250 ± 20 | T>=70% | 400-18000 nm; T < 1% | Silicon | 0.5 |
| STO-BP10860±150 | LWIR | standard | 10860 ± 150 | 640 ± 50 | T>=70% | 400-14000 nm; T < 1% | Silicon | 0.5 |
| STO-BP11100±150 | LWIR | standard | 11100 ± 150 | 640 ± 50 | T>=70% | 400-14000 nm; T < 1% | Silicon | 0.5 |
| STO-BP11200±150 | LWIR | standard | 11200 ± 150 | 640 ± 50 | T>=70% | 400-14000 nm; T < 1% | Silicon | 0.5 |
| STO-BP11500±50 | LWIR | standard | 11500 ± 50 | 550 ± 50 | T>=65% | 400-18000 nm; T < 1% | Silicon | 0.5 |
| STO-BP11580±60 | LWIR | standard | 11580 ± 60 | 550 ± 50 | T>=70% | 400-18000 nm; T < 1% | Silicon | 0.5 |
| STO-BP12600±100 | LWIR | standard | 12600 ± 100 | 800 ± 40 | T>=85% | 400-15000 nm; T < 1% | Germanium | 1 |
| STO-BP12750±100 | LWIR | standard | 12750 ± 100 | 800 ± 40 | T>=85% | 400-15000 nm; T < 1% | Germanium | 1 |
| STO-BP13000±100 | LWIR | standard | 13000 ± 100 | 4000 ± 100 | T>=85% | 1200-20000 nm; T < 1% | Germanium | 0.75, 0.9 |
| STO-BP13250±100 | LWIR | standard | 13250 ± 100 | 850 ± 50 | T>=85% | 400-15000 nm; T < 1% | Germanium | 1 |
| STO-BP13650±100 | LWIR | standard | 13650 ± 100 | 850 ± 50 | T>=80% | 400-15000 nm; T < 1% | Germanium | 0.5 |
| STO-BP15000±200 | LWIR | standard | 15000 ± 200 | 2200 ± 50 | T>=65% | 2000-25000 nm; T < 1% | Germanium | 2.2 |
| STO-BP16000±200 | LWIR | standard | 16000 ± 200 | 2400 ± 50 | T>=70% | 2000-25000 nm; T < 1% | Germanium | 1 |
| STO-BP16200±200 | LWIR | standard | 16200 ± 200 | 2400 ± 50 | T>=70% | 2000-25000 nm; T < 1% | Germanium | 1 |
Modelos passa-banda largos adicionais para detecção, imagem e caminhos de detectores MWIR e LWIR.
| Modelo | Faixa espectral | Banda de passagem (nm) | Faixa de transmissão (nm) | Transmitância (T) | Resumo do bloqueio | Substrato | Espessura do substrato (mm) |
|---|---|---|---|---|---|---|---|
| STO-WBP1000~3000 | SWIR | 970 ± 100 – 2470 ± 100 | 1100-2300 | T>=90% | 200-3560 nm; T < 1% | Glass ceramic | 1 |
| STO-WBP1520~1850 | SWIR | 1520 ± 50 – 1850 ± 50 | 1600-1750 | T>=80% | 400-3300 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP1550~1750 | SWIR | 1550 ± 50 – 1750 ± 50 | 1600-1700 | T>=80% | 1500-2800 nm; T < 1% | Silicon | 1.2 |
| STO-WBP1550~5050 | MWIR | 1550 ± 50 – 5050 ± 50 | 1600-5000 | T>=80% | 1500-5580 nm; T < 1% | Silicon | 1.2 |
| STO-WBP1650~2350 | SWIR | 1650 ± 50 – 2350 ± 50 | 1700-2250 | T>=80% | 400-4000 nm; T < 10% | Silicon | 0.5 |
| STO-WBP2050~2350 | SWIR | 2050 ± 50 – 2350 ± 50 | 2150-2250 | T>=80% | 1500-2800 nm; T < 1% | Silicon | 0.5, 1, 1.2 |
| STO-WBP2050~2500 | SWIR | 2050 ± 50 – 2500 ± 50 | 2150-2450 | T>=80% | 1500-5000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2080~2350 | SWIR | 2080 ± 50 – 2350 ± 50 | 2135-2330 | T>=80% | 1500-2800 nm; T < 1% | Silicon | 1.2 |
| STO-WBP2080~2430 | SWIR | 2080 ± 50 – 2430 ± 50 | 2180-2330 | T>=80% | 1500-2800 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP2170~3670 | MWIR | 2170 ± 50 – 3670 ± 50 | 2300-3600 | T>=85% | 1500-5000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2300~3600 | MWIR | 2200 ± 50 – 3750 ± 50 | 2300-3600 | T>=85% | 1500-5000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2300~3700 | MWIR | 2250 ± 30 – 3770 ± 30 | 2300-3700 | T>=90% | 1500-5000 nm; T < 1% | Silicon | 1 |
| STO-WBP2400~3150 | MWIR | 2400 ± 50 – 3150 ± 50 | 2500-3000 | T>=90% | 400-10500 nm; T < 1% | Sapphire | 1, 5 |
| STO-WBP2450~3200 | MWIR | 2450 ± 20 – 3200 ± 20 | 2500-3140 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 2.5 |
| STO-WBP2450~4600 | MWIR | 2450 ± 50 – 4600 ± 50 | 2550-4500 | T>=90% | 400-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP2450~5150 | MWIR | 2450 ± 50 – 5150 ± 50 | 2640-5040 | T>=90% | 400-7040 nm; T < 1% | Silicon | 1 |
| STO-WBP2490~5240 | MWIR | 2490 ± 50 – 5240 ± 50 | 2640-5040 | T>=90% | 400-7040 nm; T < 1% | Silicon | 1 |
| STO-WBP2600~5000 | MWIR | 2490 ± 50 – 5240 ± 50 | 2640-5040 | T>=90% | 400-7040 nm; T < 1% | Germanium | 0.5, 0.9, 1 |
| STO-WBP2500-5000 | MWIR | 2500 ± 50 – 5000 ± 50 | 2700-4900 | T>=90% | 200-10000 nm; T < 1% | Germanium | 0.9, 1.8 |
| STO-WBP2500~5100 | MWIR | 2500 ± 50 – 5100 ± 50 | 2650-4950 | T>=90% | 1500-10500 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP2550~3150 | MWIR | 2550 ± 50 – 3150 ± 50 | 2700-3100 | T>=85% | 1500-5000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2550~3250 | MWIR | 2550 ± 50 – 3250 ± 50 | 2700-3100 | T>=90% | 430-10030 nm; T < 1% | Silicon | 0.5, 2.5 |
| STO-WBP2600~3300 | MWIR | 2600 ± 50 – 3300 ± 50 | 2850-3000 | T>=85% | 400-10000 nm; T < 1% | Germanium | 0.7 |
| STO-WBP2650~5050 | MWIR | 2600 ± 100 – 5050 ± 50 | 2750-4950 | T>=90% | 1500-8000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP2650~3000 | MWIR | 2650 ± 40 – 3000 ± 40 | 2700-2950 | T>=85% | 1000-6000 nm; T < 1% | Germanium | 1.8 |
| STO-WBP2700-3550 | MWIR | 2700 ± 50 – 3550 ± 50 | 2800-3450 | T>=90% | 300-20000 nm; T < 1% | Sapphire | 1 |
| STO-WBP2700-3600 | MWIR | 2700 ± 50 – 3600 ± 50 | 2800-3500 | T>=90% | 300-20000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-WBP2700~3150 | MWIR | 2700 ± 50 – 3150 ± 50 | 2800-3050 | T>=80% | 1500-5000 nm; T < 1% | Germanium | 1 |
| STO-WBP2720~2980 | MWIR | 2720 ± 20 – 2980 ± 20 | 2780-2920 | T>=80% | 1500-5000 nm; T < 1% | Germanium | 1 |
| STO-WBP2730~3010 | MWIR | 2730 ± 20 – 3010 ± 20 | 2800-2900 | T>=85% | 1500-5000 nm; T < 1% | Germanium | 1 |
| STO-WBP2750~4850 | MWIR | 2750 ± 50 – 4850 ± 50 | 3000-4600 | T>=85% | 1000-5100 nm; T < 1% | Germanium | 0.3, 0.4, 1 |
| STO-WBP2750~5100 | MWIR | 2750 ± 50 – 5100 ± 50 | 2900-5000 | T>=90% | 1500-10500 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP2790~3070 | MWIR | 2790 ± 20 – 3070 ± 20 | 2900-3000 | T>=80% | 1500-5000 nm; T < 1% | Germanium | 0.9, 1 |
| STO-WBP2800~3050 | MWIR | 2800 ± 50 – 3050 ± 50 | 2900-3000 | T>=90% | 1500-6500 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2800~5150 | MWIR | 2800 ± 50 – 5150 ± 50 | 2950-5000 | T>=90% | 1500-10500 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP2800~5200单 | MWIR | 2800 ± 100 – 5200 ± 100 | 2900-5100 | T>=55% | 2580-8000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2800~5250 | MWIR | 2800 ± 50 – 5250 ± 50 | 2950-5100 | T>=90% | 1500-10500 nm; T < 1% | Germanium | 0.3 |
| STO-WBP2900~4140 | MWIR | 2900 ± 50 – 4140 ± 50 | 3100-4040 | T>=90% | 700-8040 nm; T < 1% | Germanium | 0.3 |
| STO-WBP2900~4450 | MWIR | 2900 ± 50 – 4450 ± 50 | 3050-4350 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP2900~4550 | MWIR | 2900 ± 50 – 4550 ± 50 | 3050-4450 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP2900~4850 | MWIR | 2900 ± 50 – 4850 ± 50 | 3050-4750 | T>=90% | 400-11000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP2900~5100 | MWIR | 2900 ± 50 – 5100 ± 50 | 3000-5000 | T>=90% | 1000-10500 nm; T < 1% | Germanium | 0.3, 0.4, 0.7 |
| STO-WBP2950~3250 | MWIR | 2950 ± 50 – 3250 ± 50 | 3000-3200 | T>=85% | 200-20000 nm; T < 1% | Sapphire | 1 |
| STO-WBP2950~3600 | MWIR | 2950 ± 50 – 3600 ± 50 | 3150-3400 | T>=85% | 1000-10500 nm; T < 1% | Germanium | 0.6, 0.9 |
| STO-WBP2950~3650 | MWIR | 2950 ± 50 – 3650 ± 50 | 3150-3450 | T>=85% | 1000-10500 nm; T < 1% | Germanium | 0.6, 0.9 |
| STO-WBP2950~4950 | MWIR | 2950 ± 50 – 4950 ± 50 | 3100-4800 | T>=90% | 400-11000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP3000~3300 | MWIR | 3000 ± 20 – 3300 ± 20 | 3050-3250 | T>=85% | 200-20000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-WBP3000~3700 | MWIR | 3000 ± 50 – 3700 ± 50 | 3100-3600 | T>=90% | 200-10000 nm; T < 1% | Germanium | 1.8 |
| STO-WBP3000~3800 | MWIR | 3000 ± 100 – 3800 ± 100 | 3100-3700 | T>=80% | 400-14000 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3000~3875 | MWIR | 3000 ± 100 – 3875 ± 75 | 3250-3650 | T>=80% | 500-5500 nm; T < 1% | Sapphire | 0.3, 0.5 |
| STO-WBP3000~4260 | MWIR | 3000 ± 50 – 4260 ± 50 | 3250-3900 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3000~4300 | MWIR | 3000 ± 50 – 4300 ± 50 | 3250-3900 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3000~5300 | MWIR | 3000 ± 50 – 5300 ± 50 | 3150-5150 | T>=85% | 1500-15500 nm; T < 1% | Sapphire | 0.3, 0.75, 1 |
| STO-WBP3000~5400 | MWIR | 3000 ± 50 – 5400 ± 50 | 3100-5300 | T>=90% | 1500-2800 nm; T < 1% | Germanium | 0.7, 1 |
| STO-WBP3020~3320 | MWIR | 3020 ± 20 – 3320 ± 20 | 3050-3250 | T>=85% | 200-20000 nm; T < 1% | Sapphire | 1 |
| STO-WBP3040~4320 | MWIR | 3040 ± 50 – 4320 ± 50 | 3250-4050 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3050~4200 | MWIR | 3050 ± 50 – 4200 ± 50 | 3250-3900 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3050~5000 | MWIR | 3050 ± 50 – 5000 ± 50 | 3200-4850 | T>=85% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3050~5450 | MWIR | 3050 ± 50 – 5450 ± 50 | 3200-5300 | T>=85% | 1500-15500 nm; T < 1% | Sapphire | 0.3, 0.75, 1 |
| STO-WBP3100~3700 | MWIR | 3100 ± 150 – 3700 ± 150 | 3200-3600 | T>=90% | 400-20000 nm; T < 1% | Sapphire | 1 |
| STO-WBP3100~4100 | MWIR | 3100 ± 50 – 4100 ± 50 | 3300-3900 | T>=90% | 900-8000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3100~4150 | MWIR | 3100 ± 50 – 4150 ± 50 | 3250-4050 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.4 |
| STO-WBP3100~4200 | MWIR | 3100 ± 50 – 4200 ± 50 | 3250-4050 | T>=85% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3100~4250 | MWIR | 3100 ± 50 – 4250 ± 50 | 3250-3900 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3130~3400 | MWIR | 3130 ± 50 – 3400 ± 50 | 3250-3350 | T>=75% | 500-3700 nm; T < 1% | Germanium | 0.9 |
| STO-WBP3150~3560 | MWIR | 3150 ± 50 – 3560 ± 50 | 3300-3500 | T>=85% | 400-10000 nm; T < 1% | Sapphire | 0.3 |
| STO-WBP3150~3600 | MWIR | 3150 ± 50 – 3600 ± 50 | 3250-3520 | T>=90% | 1500-6000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3150~3650 | MWIR | 3150 ± 50 – 3650 ± 50 | 3250-3500 | T>=90% | 1500-6000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3150~4100 | MWIR | 3150 ± 50 – 4100 ± 50 | 3250-4000 | T>=80% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3150~4200 | MWIR | 3150 ± 50 – 4200 ± 50 | 3300-4100 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3150~5150 | MWIR | 3150 ± 50 – 5150 ± 50 | 3300-5000 | T>=85% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3180-3420 | MWIR | 3180 ± 50 – 3420 ± 50 | 3200-3380 | T>=85% | 450-5600 nm; T < 1% | Zinc selenide | 1.5, 2 |
| STO-WBP3180~3420 | MWIR | 3180 ± 50 – 3420 ± 50 | 3200-3400 | T>=80% | 400-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3200~3500 | MWIR | 3200 ± 50 – 3500 ± 50 | 3250-3450 | T>=85% | 500-3700 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3200~3550 | MWIR | 3200 ± 50 – 3550 ± 50 | 3280-3480 | T>=90% | 500-7000 nm; T < 1% | Germanium | 0.7, 0.9 |
| STO-WBP3200~4000 | MWIR | 3200 ± 50 – 4000 ± 50 | 3350-3850 | T>=90% | 500-10000 nm; T < 1% | Silicon | 4 |
| STO-WBP3200~4100 | MWIR | 3200 ± 50 – 4100 ± 50 | 3300-4000 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3200~5200 | MWIR | 3200 ± 100 – 5200 ± 100 | 3300-5050 | T>=80% | 1500-7000 nm; T < 1% | Silicon | 0.3 |
| STO-WBP3170~3430 | MWIR | 3220 ± 20 – 3480 ± 20 | 3300-3430 | T>=85% | 450-6050 nm; T < 1% | Germanium | 0.3, 0.9, 1 |
| STO-WBP3230~3500 | MWIR | 3230 ± 50 – 3500 ± 50 | 3250-3480 | T>=80% | 400-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3230~3520 | MWIR | 3230 ± 30 – 3520 ± 30 | 3300-3430 | T>=85% | 450-6050 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3250~4200 | MWIR | 3250 ± 50 – 4200 ± 50 | 3400-4100 | T>=85% | 1500-10600 nm; T < 1% | Germanium | 0.3, 0.4, 1 |
| STO-WBP3270~3470 | MWIR | 3270 ± 50 – 3470 ± 50 | 3320-3420 | T>=80% | 200-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3300~4250 | MWIR | 3300 ± 50 – 4250 ± 50 | 3450-4150 | T>=85% | 1500-10600 nm; T < 1% | Germanium | 0.4 |
| STO-WBP3300~4900 | MWIR | 3300 ± 50 – 4900 ± 50 | 3400-4800 | T>=90% | 500-8000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3400~3600 | MWIR | 3325 ± 25 – 3675 ± 25 | 3450-3550 | T>=90% | 900-6000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3350~4250 | MWIR | 3350 ± 50 – 4250 ± 50 | 3550-4150 | T>=90% | 430-10030 nm; T < 1% | Silicon | 2.5 |
| STO-WBP3350~4500 | MWIR | 3350 ± 50 – 4500 ± 50 | 3500-4350 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.7 |
| STO-WBP3350~4750 | MWIR | 3350 ± 50 – 4750 ± 50 | 3450-4650 | T>=90% | 1500-8000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3400~4000 | MWIR | 3400 ± 50 – 4000 ± 50 | 3500-3850 | T>=90% | 200-10000 nm; T < 1% | Germanium | 1.8 |
| STO-WBP3400~4100 | MWIR | 3400 ± 100 – 4100 ± 100 | 3550-4000 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.4 |
| STO-WBP3400~4200 | MWIR | 3400 ± 100 – 4200 ± 100 | 3550-4100 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.5, 1 |
| STO-WBP3400~4300 | MWIR | 3400 ± 50 – 4300 ± 50 | 3500-4200 | T>=80% | 1500-7000 nm; T < 1% | Sapphire | 2.5 |
| STO-WBP3400~4800 | MWIR | 3400 ± 50 – 4800 ± 50 | 3500-4700 | T>=90% | 1500-8000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3400~4850 | MWIR | 3400 ± 50 – 4850 ± 50 | 3400-4500 | T>=90% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3400~4950 | MWIR | 3400 ± 50 – 4950 ± 50 | 3700-4700 | T>=90% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3400~5000 | MWIR | 3400 ± 50 – 5000 ± 50 | 3500-4900 | T>=90% | 1500-10600 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3400~5100 | MWIR | 3400 ± 50 – 5100 ± 50 | 3600-5000 | T>=90% | 1500-10600 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3420~3910 | MWIR | 3420 ± 50 – 3910 ± 50 | 3500-3830 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP3425~4850 | MWIR | 3425 ± 75 – 4850 ± 50 | 3650-4750 | T>=85% | 1500-7000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3440~4890 | MWIR | 3440 ± 50 – 4890 ± 50 | 3500-4830 | T>=90% | 540-10040 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3450~4000 | MWIR | 3450 ± 50 – 4000 ± 50 | 3500-3900 | T>=85% | 1500-6000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3450~4050 | MWIR | 3450 ± 50 – 4050 ± 50 | 3600-3900 | T>=90% | 200-10000 nm; T < 1% | Germanium | 1.8 |
| STO-WBP3470~4950 | MWIR | 3470 ± 50 – 4950 ± 50 | 3570-4850 | T>=90% | 500-10070 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3480~4880 | MWIR | 3480 ± 50 – 4880 ± 50 | 3700-4800 | T>=80% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3490~3850 | MWIR | 3490 ± 50 – 3850 ± 50 | 3550-3750 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP3490~3950 | MWIR | 3490 ± 50 – 3950 ± 50 | 3650-3800 | T>=80% | 400-10000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP3490~4050 | MWIR | 3490 ± 50 – 4050 ± 50 | 3650-3950 | T>=80% | 400-10000 nm; T < 1% | Silicon | 1 |
| STO-WBP3500~4150 | MWIR | 3500 ± 50 – 4150 ± 50 | 3600-4050 | T>=90% | 1500-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3500~4900 | MWIR | 3500 ± 50 – 4900 ± 50 | 3600-4800 | T>=70% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3500~4950 | MWIR | 3500 ± 50 – 4950 ± 50 | 3560-4900 | T>=90% | 540-10040 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3500~5300 | MWIR | 3500 ± 50 – 5300 ± 50 | 3600-5100 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3500~5600 | MWIR | 3500 ± 50 – 5600 ± 50 | 3600-5500 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3525~4925 | MWIR | 3525 ± 100 – 4950 ± 100 | 3700-4800 | T>=90% | 1500-9000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP3530~3950 | MWIR | 3530 ± 50 – 3950 ± 50 | 3610-3870 | T>=75% | 400-5580 nm; T < 1% | Silicon | 0.5, 1.2 |
| STO-WBP3500~3970 | MWIR | 3545 ± 20 – 4015 ± 20 | 3610-3955 | T>=80% | 450-5600 nm; T < 1% | Zinc selenide | 2 |
| STO-WBP3550~4100 | MWIR | 3550 ± 50 – 4100 ± 50 | 3650-4000 | T>=93% | 1500-6000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3550~4250 | MWIR | 3550 ± 50 – 4250 ± 50 | 3600-4200 | T>=90% | 500-6500 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3550~4750 | MWIR | 3550 ± 50 – 4750 ± 50 | 3650-4650 | T>=90% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3550~4950 | MWIR | 3550 ± 50 – 4950 ± 50 | 3700-4800 | T>=90% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3550~4990 | MWIR | 3550 ± 50 – 4990 ± 50 | 3600-4800 | T>=85% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3550~5000 | MWIR | 3550 ± 50 – 5000 ± -100 | 3700-4600 | T>=90% | 1500-10500 nm; T < 1% | Sapphire | 0.3, 0.5 |
| STO-WBP3600-4000 | MWIR | 3600 ± 50 – 4000 ± 50 | 3620-3890 | T>=75% | 450-5600 nm; T < 1% | Zinc selenide | 1.5, 2 |
| STO-WBP3600~4000 | MWIR | 3600 ± 50 – 4000 ± 50 | 3680-3900 | T>=75% | 400-5580 nm; T < 1% | Silicon | 1.2 |
| STO-WBP3600~4300 | MWIR | 3600 ± 50 – 4300 ± 50 | 3700-4200 | T>=85% | 1500-6000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3600~4850 | MWIR | 3600 ± 50 – 4850 ± 50 | 3700-4700 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3, 1 |
| STO-WBP3600~5000 | MWIR | 3600 ± 50 – 5000 ± 50 | 3700-4700 | T>=90% | 400-9000 nm; T < 1% | Germanium | 0.8 |
| STO-WBP3600~5100 | MWIR | 3600 ± 100 – 5100 ± 100 | 3800-5000 | T>=90% | 200-10500 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3600~5300 | MWIR | 3600 ± 50 – 5300 ± 50 | 3700-5200 | T>=90% | 930-10050 nm; T < 1% | Germanium | 0.5 |
| STO-WBP3600~5450 | MWIR | 3600 ± 50 – 5450 ± 50 | 3800-5250 | T>=80% | 400-6000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP3600~5550 | MWIR | 3600 ± 50 – 5550 ± 50 | 3700-5400 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3605~5275 | MWIR | 3605 ± 25 – 5275 ± 25 | 3730-5150 | T>=90% | 930-10050 nm; T < 1% | Germanium | 0.5 |
| STO-WBP3650~4265 | MWIR | 3650 ± 50 – 4265 ± 50 | 3750-4150 | T>=90% | 500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3650~5050 | MWIR | 3650 ± 50 – 5050 ± 50 | 3800-4900 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3650~5100 | MWIR | 3650 ± 50 – 5100 ± 50 | 3740-5000 | T>=93% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3650~5150 | MWIR | 3650 ± 70 – 5150 ± 70 | 3800-5000 | T>=90% | 200-10500 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3650~5350 | MWIR | 3650 ± 50 – 5350 ± 50 | 3800-5200 | T>=90% | 400-11000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3650~5550 | MWIR | 3650 ± 50 – 5550 ± 50 | 3750-5300 | T>=85% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3650~5600 | MWIR | 3650 ± 50 – 5600 ± 50 | 3750-5400 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3650~5750 | MWIR | 3650 ± 50 – 5750 ± 50 | 3750-5450 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~4500 | MWIR | 3650 ± 50 – 4600 ± 50 | 3700-4500 | T>=90% | 1500-7000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP3660~4250 | MWIR | 3660 ± 50 – 4250 ± 50 | 3750-4150 | T>=90% | 500-7000 nm; T < 1% | Germanium | 0.9, 1 |
| STO-WBP3800~4850 | MWIR | 3675 ± 25 – 4975 ± 25 | 3800-4850 | T>=90% | 500-6500 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3680~5160 | MWIR | 3700 ± 100 – 5200 ± 100 | 3800-4700 | T>=90% | 400-14000 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3700~4550 | MWIR | 3700 ± 50 – 4550 ± 50 | 3800-4450 | T>=90% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3700~4700 | MWIR | 3700 ± 50 – 4700 ± 50 | 3800-4600 | T>=85% | 500-8000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~4990 | MWIR | 3700 ± 50 – 4990 ± 40 | 3800-4750 | T>=85% | 1000-6500 nm; T < 1% | Germanium | 0.3, 0.38, 0.7 |
| STO-WBP3700~5020 | MWIR | 3700 ± 50 – 5020 ± 50 | 3800-4920 | T>=90% | 500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~5150 | MWIR | 3700 ± 50 – 5150 ± 50 | 3750-4900 | T>=92% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~5200 | MWIR | 3700 ± 60 – 5200 ± 60 | 3850-5050 | T>=90% | 200-10500 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3700~5600 | MWIR | 3700 ± 50 – 5600 ± 50 | 3850-5450 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~5750 | MWIR | 3700 ± 50 – 5750 ± 50 | 3850-5500 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~5800 | MWIR | 3700 ± 50 – 5800 ± 50 | 3850-5600 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 1 |
| STO-WBP3710~5030 | MWIR | 3710 ± 30 – 5030 ± 30 | 3800-4900 | T>=90% | 1800-7000 nm; T < 1% | Silicon | 1 |
| STO-WBP3730~4850 | MWIR | 3730 ± 50 – 4850 ± 50 | 3900-4700 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3730~4900 | MWIR | 3730 ± 50 – 4900 ± 50 | 3850-4750 | T>=90% | 1000-6500 nm; T < 1% | Germanium | 0.3, 0.4 |
| STO-WBP3730~4960 | MWIR | 3730 ± 50 – 4960 ± 50 | 3850-4600 | T>=85% | 1000-6500 nm; T < 1% | Germanium | 0.9 |
| STO-WBP3740~4840 | MWIR | 3740 ± 50 – 4840 ± 50 | 3740-4840 | T>=90% | 540-8040 nm | Germanium | 0.3 |
| STO-WBP3740~4860 | MWIR | 3740 ± 40 – 4860 ± 40 | 3850-4700 | T>=85% | 1000-10000 nm; T < 1% | Germanium | 0.3, 0.38, 0.4 |
| STO-WBP3740~4950 | MWIR | 3740 ± 50 – 4950 ± 50 | 3900-4800 | T>=90% | 540-8040 nm | Germanium | 0.3 |
| STO-WBP3750~4500 | MWIR | 3750 ± 50 – 4500 ± 50 | 3850-4400 | T>=85% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3750~4850 | MWIR | 3750 ± 50 – 4850 ± 50 | 3900-4700 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3750~4900 | MWIR | 3750 ± 50 – 4900 ± 50 | 3900-4700 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3750~5020 | MWIR | 3750 ± 50 – 5020 ± 50 | 3850-4920 | T>=90% | 500-7000 nm; T < 1% | Germanium | 0.3, 1 |
| STO-WBP3750~5050 | MWIR | 3750 ± 50 – 5050 ± 50 | 3900-4900 | T>=85% | 1000-6500 nm; T < 1% | Germanium | 0.8 |
| STO-WBP3750~5650 | MWIR | 3750 ± 50 – 5650 ± 50 | 4000-5300 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.7 |
| STO-WBP3750~5700 | MWIR | 3750 ± 50 – 5700 ± 50 | 4000-5500 | T>=85% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3750~5800 | MWIR | 3750 ± 50 – 5800 ± 50 | 3800-5600 | T>=80% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3800~4100 | MWIR | 3800 ± 50 – 4100 ± 50 | 3850-4050 | T>=90% | 500-8000 nm; T < 1% | Germanium | 0.6 |
| STO-WBP3800~4700 | MWIR | 3800 ± 50 – 4700 ± 50 | 3800-4900 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3800~5500 | MWIR | 3800 ± 100 – 5500 ± 100 | 3900-5400 | T>=80% | 400-14000 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3900~5150 | MWIR | 3900 ± 100 – 5150 ± 50 | 4400-4800 | T>=85% | 500-6500 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3900~5600 | MWIR | 3900 ± 100 – 5600 ± 100 | 4000-5500 | T>=80% | 400-14000 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3900~5650 | MWIR | 3900 ± 100 – 5650 ± 100 | 4100-5400 | T>=80% | 400-14000 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP4000~4650 | MWIR | 4000 ± 50 – 4650 ± 50 | 4120-4480 | T>=85% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4000~5000 | MWIR | 4000 ± 200 – 5000 ± 200 | 4200-4900 | T>=85% | 400-20000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-WBP4000~5200 | MWIR | 4000 ± 50 – 5200 ± 50 | 4100-5000 | T>=90% | 200-10000 nm; T < 1% | Germanium | 0.9, 1.8 |
| STO-WBP4100~4650 | MWIR | 4100 ± 50 – 4650 ± 50 | 4200-4550 | T>=80% | 1500-7000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP4120~4360 | MWIR | 4120 ± 60 – 4360 ± 60 | 4220-4320 | T>=85% | 300-6500 nm; T < 1% | Silicon | 1 |
| STO-WBP4140~4370 | MWIR | 4140 ± 30 – 4370 ± 30 | 4200-4300 | T>=75% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4140~4440 | MWIR | 4140 ± 30 – 4440 ± 30 | 4200-4400 | T>=80% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4150~4650 | MWIR | 4150 ± 50 – 4650 ± 50 | 4250-4550 | T>=90% | 1500-6000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP4200~4450 | MWIR | 4200 ± 20 – 4450 ± 20 | 4250-4400 | T>=85% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4200~4750 | MWIR | 4200 ± 50 – 4750 ± 50 | 4250-4650 | T>=80% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4200~5000 | MWIR | 4200 ± 50 – 5000 ± 50 | 4350-4800 | T>=85% | 500-10000 nm; T < 1% | Silicon | 4 |
| STO-WBP4212~4457 | MWIR | 4212 ± 40 – 4457 ± 40 | 4260-4400 | T>=80% | 300-6500 nm; T < 1% | Silicon | 0.95 |
| STO-WBP4230~4520 | MWIR | 4230 ± 20 – 4520 ± 20 | 4350-4450 | T>=80% | 1500-5000 nm; T < 1% | Germanium | 1 |
| STO-WBP4250~4800 | MWIR | 4250 ± 50 – 4800 ± 50 | 4350-4700 | T>=80% | 1500-7000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP4250~5300 | MWIR | 4250 ± 50 – 5300 ± 50 | 4400-5000 | T>=85% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4290~4580 | MWIR | 4290 ± 20 – 4580 ± 20 | 4400-4500 | T>=80% | 1500-5000 nm; T < 1% | Germanium | 0.9, 1 |
| STO-WBP4300~4500 | MWIR | 4300 ± 30 – 4500 ± 30 | 4350-4450 | T>=90% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4400~4700 | MWIR | 4400 ± 50 – 4700 ± 50 | 4570-4600 | T>=80% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4420~4720 | MWIR | 4420 ± 50 – 4720 ± 50 | 4470-4670 | T>=80% | 520-8020 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4450~4750 | MWIR | 4450 ± 70 – 4750 ± 70 | 4570-4620 | T>=70% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4450~4950 | MWIR | 4450 ± 50 – 4950 ± 50 | 4550-4900 | T>=90% | 1500-6000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4450~5150 | MWIR | 4450 ± 50 – 5150 ± 50 | 4550-5050 | T>=85% | 1000-9400 nm; T < 1% | Germanium | 0.8, 1 |
| STO-WBP4500~4800 | MWIR | 4500 ± 50 – 4800 ± 50 | 4640-4740 | T>=85% | 400-10000 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP4500~4900 | MWIR | 4500 ± 50 – 4900 ± 50 | 4600-4800 | T>=85% | 1500-11000 nm; T < 1% | Silicon | 0.8 |
| STO-WBP4520~4720 | MWIR | 4520 ± 50 – 4720 ± 50 | 4570-4670 | T>=80% | 520-8020 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP4520~4820 | MWIR | 4520 ± 50 – 4820 ± 50 | 4570-4770 | T>=80% | 520-8020 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4550~5200 | MWIR | 4550 ± 50 – 5300 ± 50 | 4600-5150 | T>=85% | 1000-9400 nm; T < 1% | Germanium | 0.8, 1 |
| STO-WBP4600~4900 | MWIR | 4600 ± 50 – 4900 ± 50 | 4700-4800 | T>=80% | 400-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4650~4950 | MWIR | 4650 ± 50 – 4950 ± 50 | 4700-4800 | T>=80% | 400-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4650~4980 | MWIR | 4650 ± 50 – 4980 ± 50 | 4700-4800 | T>=80% | 400-10000 nm; T < 1% | Germanium | 1 |
| STO-WBP4650~5300 | MWIR | 4650 ± 50 – 5300 ± 50 | 4800-5200 | T>=80% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4750~5150 | MWIR | 4750 ± 50 – 5150 ± 50 | 4800-5000 | T>=80% | 1000-8000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4800~5000 | MWIR | 4800 ± 50 – 5000 ± 50 | 4850-4950 | T>=80% | 400-5500 nm; T < 1% | Silicon | 1.2 |
| STO-WBP4800~5100 | MWIR | 4800 ± 50 – 5100 ± 50 | 4850-5050 | T>=80% | 400-5500 nm; T < 1% | Silicon | 1 |
| STO-WBP4800~5200 | MWIR/LWIR transition | 4800 ± 50 – 5200 ± 50 | 4860-5140 | T>=90% | 1000-8000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4900~5100 | MWIR/LWIR transition | 4900 ± 50 – 5100 ± 50 | 4950-5050 | T>=80% | 400-5500 nm; T < 1% | Silicon | 1 |
| STO-WBP4920~5800 | MWIR/LWIR transition | 4920 ± 50 – 5800 ± 50 | 5100-5600 | T>=85% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4950~9250 | MWIR/LWIR transition | 4950 ± 50 – 9250 ± 50 | 5100-9100 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP5000~5800 | MWIR/LWIR transition | 5000 ± 50 – 5800 ± 50 | 5100-5600 | T>=80% | 400-10000 nm; T < 1% | Germanium | 1 |
| STO-WBP5010~5880 | MWIR/LWIR transition | 5010 ± 50 – 5880 ± 50 | 5110-5780 | T>=80% | 400-10000 nm; T < 1% | Germanium | 1 |
| STO-WBP5030~9280 | MWIR/LWIR transition | 5030 ± 50 – 9280 ± 50 | 5180-9130 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP5050~9160 | MWIR/LWIR transition | 5050 ± 50 – 9160 ± 50 | 5300-8750 | T>=85% | 620-10120 nm; T < 1% | Germanium | 2 |
| STO-WBP5090~9450 | MWIR/LWIR transition | 5090 ± 90 – 9450 ± 90 | 5240-9300 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP5100~5850 | MWIR/LWIR transition | 5100 ± 50 – 5850 ± 50 | 5300-5700 | T>=75% | 400-10000 nm; T < 1% | Germanium | 0.9, 1 |
| STO-WBP5100~9350 | MWIR/LWIR transition | 5100 ± 50 – 9350 ± 50 | 6100-9200 | T>=85% | 620-10120 nm; T < 1% | Germanium | 2 |
| STO-WBP5150~6000 | MWIR/LWIR transition | 5150 ± 50 – 6000 ± 50 | 5050-5900 | T>=80% | 500-10120 nm; T < 1% | Germanium | 2 |
| STO-WBP5150~9450 | MWIR/LWIR transition | 5150 ± 50 – 9450 ± 50 | 5400-9100 | T>=85% | 620-10120 nm; T < 1% | Germanium | 2 |
| STO-WBP5240~9440 | MWIR/LWIR transition | 5240 ± 70 – 9440 ± 70 | 6000-9000 | T>=80% | 580-10080 nm; T < 1% | Germanium | 2 |
| STO-WBP5400~7400 | MWIR/LWIR transition | 5400 ± 50 – 7400 ± 50 | 5500-7300 | T>=90% | 1500-10000 nm; T < 1% | Germanium | 1.5 |
| STO-WBP5450~7600 | MWIR/LWIR transition | 5450 ± 50 – 7600 ± 50 | 5600-7400 | T>=90% | 1500-10000 nm; T < 1% | Germanium | 1.5 |
| STO-WBP5510~6700 | MWIR/LWIR transition | 5510 ± 60 – 6700 ± 60 | 5700-6500 | T>=75% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP5550~7550 | MWIR/LWIR transition | 5550 ± 50 – 7550 ± 50 | 5750-7250 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.5 |
| STO-WBP5550~7600 | MWIR/LWIR transition | 5550 ± 50 – 7600 ± 50 | 5750-7300 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.5 |
| STO-WBP5550~7650 | MWIR/LWIR transition | 5550 ± 50 – 7650 ± 50 | 5700-7450 | T>=90% | 1500-10000 nm; T < 1% | Germanium | 1.5 |
| STO-WBP5550~7700 | MWIR/LWIR transition | 5550 ± 50 – 7700 ± 50 | 5700-7500 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 1.5 |
| STO-WBP5600~6800 | MWIR/LWIR transition | 5600 ± 30 – 6800 ± 30 | 5700-6680 | T>=75% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP6000~12100 | LWIR | 6000 ± 200 – 12100 ± 200 | 6200-11800 | T>=90% | 1000-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP6200~10200 | LWIR | 6200 ± 100 – 10200 ± 100 | 7000-9400 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP6220~7530 | MWIR/LWIR transition | 6220 ± 50 – 7530 ± 50 | 6450-7450 | T>=90% | 2000-15000 nm; T < 3% | Germanium | 3 |
| STO-WBP6300~7600 | MWIR/LWIR transition | 6300 ± 50 – 7600 ± 50 | 6450-7450 | T>=90% | 2000-15000 nm; T < 3% | Germanium | 3 |
| STO-WBP6300~9900 | LWIR | 6300 ± 100 – 9900 ± 100 | 7000-9400 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP6400~10100 | LWIR | 6400 ± 100 – 10100 ± 100 | 7000-9400 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.8 |
| STO-WBP6420~10100 | LWIR | 6420 ± 50 – 10100 ± 50 | 7000-9400 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP6450~10750 | LWIR | 6450 ± 100 – 10750 ± 100 | 6600-10600 | T>=90% | 1500-14000 nm; T < 1% | Germanium | 1 |
| STO-WBP6450~7750 | MWIR/LWIR transition | 6450 ± 50 – 7750 ± 50 | 6650-7550 | T>=90% | 2000-15000 nm; T < 3% | Germanium | 3 |
| STO-WBP6550~8250 | MWIR/LWIR transition | 6550 ± 100 – 8250 ± 100 | 6700-8100 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP6600~8300 | MWIR/LWIR transition | 6600 ± 100 – 8300 ± 100 | 6750-8150 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP6650~8750 | MWIR/LWIR transition | 6650 ± 50 – 8750 ± 50 | 6800-8500 | T>=75% | 1500-11000 nm; T < 3% | Germanium | 0.3 |
| STO-WBP6650~9760 | LWIR | 6650 ± 50 – 9760 ± 50 | 7000-9400 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP6800~8100 | MWIR/LWIR transition | 6800 ± 80 – 8100 ± 80 | 7100-7800 | T>=90% | 200-12000 nm; T < 1% | Silicon | 1 |
| STO-WBP6800~8300 | MWIR/LWIR transition | 6800 ± 100 – 8300 ± 100 | 6950-8150 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP7100~8400 | MWIR/LWIR transition | 7100 ± 80 – 8400 ± 80 | 7400-8100 | T>=90% | 200-12000 nm; T < 1% | Silicon | 1 |
| STO-WBP7200~8500 | MWIR/LWIR transition | 7200 ± 80 – 8500 ± 80 | 7500-8200 | T>=90% | 200-12000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP7200~9400 | LWIR | 7200 ± 50 – 9400 ± 50 | 7300-9100 | T>=90% | 6400-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7250~7850 | MWIR/LWIR transition | 7250 ± 100 – 7850 ± 100 | 7350-7750 | T>=80% | 3300-20000 nm; T < 1% | Germanium | 1, 2 |
| STO-WBP7350~8080 | MWIR/LWIR transition | 7350 ± 50 – 8080 ± 50 | 7510-7980 | T>=90% | 400-12000 nm; T < 3% | Germanium | 0.3 |
| STO-WBP7400~8400 | MWIR/LWIR transition | 7400 ± 50 – 8400 ± 50 | 7600-8200 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7400~8430 | MWIR/LWIR transition | 7400 ± 70 – 8430 ± 70 | 7600-8100 | T>=85% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7400~8500 | MWIR/LWIR transition | 7400 ± 50 – 8500 ± 50 | 7600-8200 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7400~9500 | LWIR | 7400 ± 50 – 9500 ± 50 | 7500-9400 | T>=90% | 1500-13000 nm; T < 1% | Germanium | 0.6 |
| STO-WBP7450~10200 | LWIR | 7450 ± 50 – 10200 ± 50 | 7600-10000 | T>=85% | 1000-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7450~13600 | LWIR | 7450 ± 50 – 13600 ± 100 | 7700-13300 | T>=75% | 2000-19000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP7450~8500 | MWIR/LWIR transition | 7450 ± 50 – 8500 ± 50 | 7600-8100 | T>=75% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7450~9650 | LWIR | 7450 ± 50 – 9650 ± 50 | 7700-9400 | T>=85% | 1500-12000 nm; T < 1% | Germanium | 0.3, 0.6 |
| STO-WBP7400~9900 | LWIR | 7460 ± 50 – 9960 ± 50 | 7660-9760 | T>=90% | 460-16060 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7460~9630 | LWIR | 7460 ± 50 – 9630 ± 50 | 7550-9600 | T>=90% | 1500-13000 nm; T < 1% | Germanium | 1 |
| STO-WBP7480~9380 | LWIR | 7480 ± 70 – 9380 ± 70 | 7700-9100 | T>=80% | 500-10080 nm; T < 1% | Germanium | 2 |
| STO-WBP7500~7900 | MWIR/LWIR transition | 7500 ± 70 – 7900 ± 70 | 7600-7800 | T>=85% | 400-12075 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7500~8400 | MWIR/LWIR transition | 7500 ± 50 – 8400 ± 50 | 7700-8100 | T>=85% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7500~8500 | LWIR | 7500 ± 50 – 8500 ± 50 | 7700-8200 | T>=85% | 200-16000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP7500~8550 | LWIR | 7500 ± 50 – 8550 ± 50 | 7700-8200 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7500~8600 | LWIR | 7500 ± 50 – 8600 ± 50 | 7700-8300 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7500~9300 | LWIR | 7500 ± 50 – 9300 ± 50 | 7700-9000 | T>=85% | 1000-13900 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7500~9400 | LWIR | 7500 ± 50 – 9400 ± 50 | 8000-9000 | T>=85% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7550~13700 | LWIR | 7550 ± 50 – 13700 ± 100 | 7750-13400 | T>=85% | 2000-19000 nm; T < 1% | Germanium | 0.7, 1 |
| STO-WBP7550~13950 | LWIR | 7550 ± 100 – 13950 ± 100 | 7750-13400 | T>=80% | 2000-19000 nm; T < 1% | Germanium | 1 |
| STO-WBP7550~8600 | LWIR | 7550 ± 70 – 8600 ± 70 | 7800-8300 | T>=85% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7550~9800 | LWIR | 7550 ± 50 – 9800 ± 50 | 7700-9550 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP7575~7975 | MWIR/LWIR transition | 7575 ± 50 – 7975 ± 50 | 7675-7875 | T>=85% | 400-12075 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~10100 | LWIR | 7600 ± 70 – 10100 ± 100 | 7770-9900 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~10160 | LWIR | 7600 ± 100 – 10160 ± 100 | 7800-9800 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~8100 | MWIR/LWIR transition | 7600 ± 100 – 8100 ± 100 | 7700-8000 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~8600 | LWIR | 7600 ± 50 – 8600 ± 50 | 7800-8300 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7600~9300 | LWIR | 7600 ± 50 – 9300 ± 50 | 7700-9000 | T>=85% | 1000-13900 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~9500 | LWIR | 7600 ± 50 – 9500 ± 50 | 8000-9200 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~9600 | LWIR | 7600 ± 50 – 9600 ± 50 | 7800-9300 | T>=85% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~9700 | LWIR | 7600 ± 50 – 9700 ± 50 | 8000-9500 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~9730 | LWIR | 7600 ± 50 – 9730 ± 50 | 7800-9500 | T>=85% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~9950 | LWIR | 7600 ± 50 – 9950 ± 50 | 7900-9600 | T>=85% | 6400-13000 nm; T < 1% | Germanium | 0.6 |
| STO-WBP7630~8070 | MWIR/LWIR transition | 7630 ± 70 – 8070 ± 70 | 7730-7970 | T>=85% | 400-12075 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7650~10400 | LWIR | 7650 ± 50 – 10400 ± 50 | 7800-10250 | T>=85% | 1000-12000 nm; T < 1% | Germanium | 0.38 |
| STO-WBP7650~13900 | LWIR | 7650 ± 50 – 13900 ± 100 | 7800-13400 | T>=85% | 2000-19000 nm; T < 1% | Germanium | 0.7, 1 |
| STO-WBP7650~14100 | LWIR | 7650 ± 50 – 14100 ± 100 | 7750-13400 | T>=85% | 2000-19000 nm; T < 1% | Germanium | 0.4, 0.7, 1 |
| STO-WBP7650~8690 | LWIR | 7650 ± 70 – 8690 ± 70 | 7900-8400 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7650~9870 | LWIR | 7650 ± 50 – 9870 ± 50 | 8000-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7700~13500 | LWIR | 7700 ± 200 – 13500 ± 500 | 7900-13000 | T>=85% | 2000-19000 nm; T < 1% | Germanium | 1 |
| STO-WBP7700~14250 | LWIR | 7700 ± 100 – 14250 ± 100 | 7750-13400 | T>=85% | 2000-19000 nm | Germanium | 0.4, 1 |
| STO-WBP7700~8200 | MWIR/LWIR transition | 7700 ± 100 – 8200 ± 100 | 7810-8110 | T>=80% | 1500-13000 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP7700~9400 | LWIR | 7700 ± 50 – 9400 ± 50 | 7850-9200 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7700~9600 | LWIR | 7700 ± 100 – 9600 ± 100 | 7950-9450 | T>=90% | 400-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7700~9650 | LWIR | 7700 ± 50 – 9650 ± 50 | 8000-9400 | T>=85% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7700~9850 | LWIR | 7700 ± 100 – 9850 ± 100 | 7870-9570 | T>=85% | 1500-14070 nm; T < 1% | Germanium | 0 |
| STO-WBP7700~9900 | LWIR | 7700 ± 50 – 9900 ± 50 | 8000-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7700~9980 | LWIR | 7700 ± 50 – 9980 ± 50 | 8000-9700 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP7730~10250 | LWIR | 7730 ± 70 – 10250 ± 100 | 7900-10050 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7730~9950 | LWIR | 7730 ± 50 – 9950 ± 50 | 8100-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~10000 | LWIR | 7750 ± 50 – 10000 ± 50 | 8100-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~10050 | LWIR | 7750 ± 50 – 10050 ± 50 | 7700-10000 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~10100 | LWIR | 7750 ± 50 – 10100 ± 100 | 7700-10000 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3, 0.6 |
| STO-WBP7750~10250 | LWIR | 7750 ± 50 – 10250 ± 50 | 7800-9800 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~10300 | LWIR | 7750 ± 50 – 10300 ± 50 | 7900-10150 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~10500 | LWIR | 7750 ± 100 – 10500 ± 100 | 7950-10300 | T>=90% | 500-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~9700 | LWIR | 7750 ± 50 – 9700 ± 50 | 8100-9500 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~9980 | LWIR | 7750 ± 50 – 9980 ± 50 | 8000-9700 | T>=80% | 1500-12000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP7770~10580 | LWIR | 7770 ± 50 – 10580 ± 50 | 7950-10400 | T>=90% | 500-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7780~9280 | LWIR | 7780 ± 100 – 9280 ± 100 | 8100-9000 | T>=90% | 3030-14140 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7780~9480 | LWIR | 7780 ± 100 – 9480 ± 100 | 8100-9000 | T>=90% | 3030-14140 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7800~10050 | LWIR | 7800 ± 50 – 10050 ± 50 | 8100-9700 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7800~10100 | LWIR | 7800 ± 50 – 10100 ± 50 | 7900-10000 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7800~10350 | LWIR | 7800 ± 70 – 10350 ± 100 | 7970-10150 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7800~10600 | LWIR | 7800 ± 100 – 10600 ± 100 | 8000-10400 | T>=85% | 1000-12000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP7800~12100 | LWIR | 7800 ± 100 – 12100 ± 100 | 8100-11900 | T>=85% | 1000-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP7800~12200 | LWIR | 7800 ± 75 – 12200 ± 75 | 8100-11950 | T>=85% | 1000-15000 nm; T < 1% | Germanium | 0.5, 0.9 |
| STO-WBP7800~14200 | LWIR | 7800 ± 100 – 14200 ± 100 | 8300-13500 | T>=85% | 1500-19000 nm; T < 1% | Germanium | 0.7 |
| STO-WBP7800~9650 | LWIR | 7800 ± 50 – 9650 ± 50 | 8200-9300 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP7800~9700 | LWIR | 7800 ± 50 – 9700 ± 50 | 8100-9500 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850-13650 | LWIR | 7850 ± 50 – 13650 ± 50 | 8100-13300 | T>=70% | 1500-20000 nm; T < 1.5% | Silicon | 1 |
| STO-WBP7850~10450 | LWIR | 7850 ± 50 – 10450 ± 50 | 8000-10100 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~10600 | LWIR | 7850 ± 50 – 10600 ± 50 | 8000-10350 | T>=85% | 1000-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~10650 | LWIR | 7850 ± 100 – 10650 ± 100 | 8050-10450 | T>=90% | 500-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~13750 | LWIR | 7850 ± 50 – 13750 ± 50 | 8100-13300 | T>=70% | 1500-20000 nm; T < 1.5% | Silicon | 0.5 |
| STO-WBP7850~13900 | LWIR | 7850 ± 100 – 13900 ± 400 | 8200-13400 | T>=80% | 2000-19000 nm; T < 1% | Germanium | 1 |
| STO-WBP7850~9650 | LWIR | 7850 ± 50 – 9650 ± 50 | 7900-9400 | T>=90% | 400-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~9700 | LWIR | 7850 ± 50 – 9700 ± 50 | 8300-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~9750 | LWIR | 7850 ± 50 – 9750 ± 50 | 7950-9450 | T>=90% | 400-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~9850 | LWIR | 7850 ± 50 – 9850 ± 50 | 7900-9400 | T>=90% | 400-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7800~10200 | LWIR | 7880 ± 100 – 10300 ± 100 | 8080-10100 | T>=90% | 406-14140 nm; T < 1% | Germanium | 0.5 |
| STO-WBP7880~10400 | LWIR | 7880 ± 100 – 10400 ± 100 | 8100-10100 | T>=90% | 406-14140 nm; T < 1% | Germanium | 0.5 |
| STO-WBP7900~12000 | LWIR | 7900 ± 100 – 12000 ± 100 | 8100-11800 | T>=90% | 400-20000 nm; T < 1% | Germanium | 1 |
| STO-WBP7900~12200 | LWIR | 7900 ± 100 – 12200 ± 100 | 8150-11900 | T>=85% | 1000-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP7900~9800 | LWIR | 7900 ± 50 – 9800 ± 50 | 8300-9300 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7920~10350 | LWIR | 7920 ± 70 – 10350 ± 100 | 8090-10150 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7920~10500 | LWIR | 7920 ± 70 – 10500 ± 100 | 8090-10300 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7950~10050 | LWIR | 7950 ± 50 – 10050 ± 50 | 8300-9700 | T>=92% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7950~10400 | LWIR | 7950 ± 50 – 10400 ± 50 | 8500-10100 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP7950~13850 | LWIR | 7950 ± 50 – 13850 ± 50 | 8300-13300 | T>=75% | 1500-20000 nm; T < 1.5% | Silicon | 0.4 |
| STO-WBP7950~9850 | LWIR | 7950 ± 50 – 9850 ± 50 | 8200-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7980~9680 | LWIR | 7980 ± 100 – 9680 ± 100 | 8030-9530 | T>=90% | 3030-14140 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8000~10100 | LWIR | 8000 ± 100 – 10100 ± 100 | 8200-9900 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8000~10700 | LWIR | 8000 ± 200 – 10700 ± 200 | 8600-10000 | T>=90% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP8000~11300 | LWIR | 8000 ± 50 – 11300 ± 50 | 8300-11200 | T>=90% | 400-12200 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8000~11400 | LWIR | 8000 ± 50 – 11400 ± 50 | 8300-11000 | T>=90% | 400-12200 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8000~12000 | LWIR | 8000 ± 100 – 12000 ± 100 | 8200-11800 | T>=90% | 400-20000 nm; T < 1% | Germanium | 1 |
| STO-WBP8000~12200 | LWIR | 8000 ± 100 – 12200 ± 100 | 8300-11800 | T>=90% | 1000-15000 nm; T < 1% | Germanium | 0.5, 0.9 |
| STO-WBP8000~12400 | LWIR | 8000 ± 100 – 12400 ± 100 | 8300-12000 | T>=90% | 1000-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8000~13900 | LWIR | 8000 ± 50 – 13900 ± 50 | 8300-13600 | T>=75% | 1500-20000 nm; T < 1.5% | Silicon | 1 |
| STO-WBP8050~13850 | LWIR | 8050 ± 50 – 13850 ± 50 | 8500-13300 | T>=70% | 1500-20000 nm; T < 1.5% | Silicon | 1 |
| STO-WBP8080~9880 | LWIR | 8080 ± 100 – 9880 ± 100 | 8500-9500 | T>=90% | 3030-14140 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8100~11700 | LWIR | 8100 ± 100 – 11700 ± 100 | 8400-11400 | T>=90% | 400-12200 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8100~12800 | LWIR | 8100 ± 100 – 12800 ± 100 | 8300-12600 | T>=85% | 1000-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8100~9000 | LWIR | 8100 ± 100 – 9000 ± 100 | 8250-8850 | T>=85% | 490-10090 nm; T < 1% | Germanium | 0.9, 1 |
| STO-WBP8200-10100 | LWIR | 8200 ± 400 – 10100 ± 420 | 8800-9500 | T>=88% | 2000-12000 nm; T < 1% | Germanium | 0.5, 0.6 |
| STO-WBP8200-12000 | LWIR | 8200 ± 100 – 12000 ± 100 | 8400-11800 | T>=90% | 400-20000 nm; T < 1% | Germanium | 1 |
| STO-WBP8200~10900 | LWIR | 8200 ± 200 – 10900 ± 200 | 8600-10000 | T>=90% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP8230~12400 | LWIR | 8230 ± 150 – 12400 ± 200 | 8800-11000 | T>=75% | 7000-15000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP8200~9000 | LWIR | 8240 ± 50 – 9140 ± 50 | 8340-9040 | T>=90% | 490-10090 nm; T < 1% | Germanium | 1 |
| STO-WBP8300-8900 | LWIR | 8300 ± 100 – 8900 ± 100 | 8400-8700 | T>=85% | 1570-14070 nm; T < 1% | Germanium | 0 |
| STO-WBP8300~13000 | LWIR | 8300 ± 160 – 13000 ± 160 | 8800-12500 | T>=75% | 7000-15000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP8300~9200 | LWIR | 8300 ± 100 – 9200 ± 100 | 8430-9090 | T>=85% | 490-10090 nm; T < 1% | Germanium | 1 |
| STO-WBP8300~9300 | LWIR | 8300 ± 100 – 9300 ± 100 | 8500-9100 | T>=85% | 490-10090 nm; T < 1% | Germanium | 1 |
| STO-WBP8400~13000 | LWIR | 8400 ± 150 – 13000 ± 150 | 8900-12500 | T>=75% | 7000-15000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP8400~14700 | LWIR | 8400 ± 200 – 14700 ± 300 | 9000-13000 | T>=75% | 400-20000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP8500-12250 | LWIR | 8500 ± 100 – 12250 ± 100 | 8700-12100 | T>=85% | 1500-15500 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8500-9050 | LWIR | 8500 ± 100 – 9050 ± 100 | 8650-8900 | T>=85% | 1570-14070 nm; T < 1% | Germanium | 0 |
| STO-WBP8550-12350 | LWIR | 8550 ± 50 – 12350 ± 50 | 8700-12200 | T>=85% | 1500-15500 nm; T < 1% | Germanium | 0.3, 0.5 |
| STO-WBP8600-12500 | LWIR | 8600 ± 150 – 12500 ± 150 | 8980-12000 | T>=85% | 1500-15500 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP8700-9400 | LWIR | 8700 ± 100 – 9400 ± 100 | 8900-9300 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8770-9550 | LWIR | 8770 ± 50 – 9550 ± 50 | 9000-9400 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8800-9700 | LWIR | 8850 ± 50 – 9650 ± 50 | 9000-9500 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8900-9500 | LWIR | 8900 ± 100 – 9500 ± 100 | 9000-9400 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8900-9600 | LWIR | 8900 ± 100 – 9600 ± 100 | 9000-9500 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8900-9700 | LWIR | 8900 ± 100 – 9700 ± 100 | 9100-9500 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8900-9800 | LWIR | 8900 ± 100 – 9800 ± 100 | 9100-9500 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP9000-9850 | LWIR | 9000 ± 100 – 9850 ± 100 | 9100-9500 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP9600-14800 | LWIR | 9600 ± 100 – 14800 ± 100 | 9900-14400 | T>=85% | 400-20000 nm; T < 1% | Zinc selenide | 0.3 |
| STO-WBP9800-15100 | LWIR | 9800 ± 100 – 15100 ± 100 | 11000-14700 | T>=85% | 400-20000 nm; T < 1% | Zinc selenide | 0.3 |
| STO-WBP10100-11100 | LWIR | 10100 ± 100 – 11100 ± 100 | 10350-10850 | T>=90% | 7600-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10160-11180 | LWIR | 10160 ± 50 – 11180 ± 50 | 10310-11030 | T>=90% | 2000-15000 nm; T < 1% | Germanium | 3 |
| STO-WBP10200-11600 | LWIR | 10200 ± 100 – 11600 ± 100 | 10600-11300 | T>=85% | 7000-14000 nm; T < 1% | Germanium | 1 |
| STO-WBP10240-10840 | LWIR | 10240 ± 50 – 10840 ± 50 | 10340-10740 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10240-11260 | LWIR | 10240 ± 50 – 11260 ± 50 | 10400-11100 | T>=90% | 2000-15000 nm; T < 1% | Germanium | 3 |
| STO-WBP10290-11490 | LWIR | 10290 ± 100 – 11490 ± 100 | 10490-11290 | T>=80% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP10300-11400 | LWIR | 10300 ± 100 – 11400 ± 100 | 10500-11100 | T>=80% | 7000-14000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP10300-11500 | LWIR | 10300 ± 120 – 11500 ± 120 | 10800-11300 | T>=85% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP10250-10850 | LWIR | 10340 ± 50 – 10940 ± 50 | 10440-10840 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10340-10840 | LWIR | 10340 ± 50 – 10840 ± 50 | 10440-10740 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10340-11040 | LWIR | 10340 ± 50 – 11040 ± 50 | 10440-10940 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10360-10860 | LWIR | 10360 ± 50 – 10860 ± 50 | 10460-10760 | T>=90% | 1060-14060 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10400-11300 | LWIR | 10400 ± 100 – 11300 ± 100 | 10700-11100 | T>=90% | 7000-14000 nm; T < 1% | Germanium | 1 |
| STO-WBP10440-11040 | LWIR | 10440 ± 50 – 11040 ± 50 | 10600-10900 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10540-11140 | LWIR | 10540 ± 50 – 11140 ± 50 | 10700-11000 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10600-11450 | LWIR | 10600 ± 100 – 11450 ± 100 | 10700-11350 | T>=85% | 7500-14000 nm; T < 1% | Germanium | 0.7 |
| STO-WBP10600-11800 | LWIR | 10600 ± 100 – 11800 ± 100 | 10980-11750 | T>=80% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP11300-15600 | LWIR | 11300 ± 100 – 15600 ± 100 | 11500-15000 | T>=70% | 10080-16080 nm; T < 1% | Wedge germanium | 2 |
| STO-WBP11400-12380 | LWIR | 11400 ± 60 – 12380 ± 60 | 11550-12230 | T>=85% | 2000-15000 nm; T < 1% | Germanium | 3 |
| STO-WBP11400-12600 | LWIR | 11490 ± 100 – 12690 ± 100 | 12000-12490 | T>=85% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP11500-12500 | LWIR | 11500 ± 50 – 12500 ± 50 | 11650-12350 | T>=85% | 2000-15000 nm; T < 1% | Germanium | 3 |
| STO-WBP11570-12570 | LWIR | 11570 ± 50 – 12570 ± 50 | 11770-12370 | T>=85% | 2000-15000 nm; T < 1% | Germanium | 3 |
Modelos passa-longa adicionais que transmitem energia infravermelha de comprimentos de onda maiores e bloqueiam os menores.
| Modelo | Faixa espectral | Comprimento de onda de corte (cut-on) (nm) | Transmitância (T) | Faixa de transmissão (nm) | Resumo do bloqueio | Substrato | Espessura do substrato (mm) |
|---|---|---|---|---|---|---|---|
| STO-LP1500 | SWIR | 1500 ± 100 | T>=85% | 1600-5300 | 400-1400 nm; T < 1% | Sapphire | 0.3 |
| STO-LP1700 | SWIR | 1700 ± 100 | T>=80% | 1750-3400 | 800-1600 nm; T < 1% | Silicon | 0.5 |
| STO-LP1800 | SWIR | 1800 ± 50 | T>=80% | 1850-3400 | 800-1600 nm; T < 1% | Silicon | 0.5 |
| STO-LP2200 | SWIR | 2200 ± 100 | T>=90% | 2700-3500 | 400-1800 nm; T < 1% | Silicon | 0.762 |
| STO-LP2250 | SWIR | 2250 ± 50 | T>=90% | 2400-3600 | 1500-2100 nm; T < 1% | Silicon | 1 |
| STO-LP2900 | MWIR | 2900 ± 50 | T>=90% | 3050-5100 | 1300-2600 nm; T < 1% | Zinc selenide | 0.5 |
| CUT3200 | MWIR | 3400 ± 10 | T>=90% | 3480-5350 | 1500-3266 nm; T < 1% | Germanium | 0.3 |
| CUT3500 | MWIR | 3670 ± 50 | T>=90% | 3800-5600 | 1500-3500 nm; T < 1% | Germanium | 1, 2.5 |
| STO-LP3710+DLC | MWIR | 3710 ± 50 | T>=70% | 4000-5500 | 1500-3400 nm; T < 1% | Silicon | 0.5 |
| STO-LP3730 | MWIR | 3730 ± 50 | T>=90% | 4400-4900 | 1700-3700反射; T < 1% | Germanium | 0.5, 0.7 |
| STO-LP3760 | MWIR | 3760 ± 60 | T>=90% | 3960-4800 | 1600-3480 nm; T < 1% | Germanium | 0.5 |
| STO-LP3850 | MWIR | 3850 ± 50 | T>=90% | 4000-5000 | 1500-3500 nm; T < 1% | Germanium | 0.5 |
| STO-LP4730 | MWIR | 4730 ± 200 | T>=80% | 4900-5150 | 400-4200 nm; T < 1% | Sapphire | 1 |
| STO-LP5800 | MWIR/LWIR transition | 5800 ± 150 | T>=80% | 6000-13000 | 2000-5500 nm; T < 1% | Silicon | 0.5 |
| STO-LP6200 | MWIR/LWIR transition | 6200 ± 100 | T>=90% | 6400-12600 | 2000-6000 nm; T < 1% | Germanium | 0.9, 3, 3.5 |
| STO-LP6300 | MWIR/LWIR transition | 6300 ± 100 | T>=90% | 6550-14500 | 1500-6100 nm; T < 1% | Germanium | 0.3 |
| STO-LP6400 | MWIR/LWIR transition | 6400 ± 100 | T>=90% | 6500-12600 | 2000-6000 nm; T < 1% | Germanium | 0.9, 3 |
| STO-LP6500 | MWIR/LWIR transition | 6500 ± 50 | T>=85% | 6800-11000 | 1500-6200 nm; T < 1% | Germanium | 0.9, 2.8, 3 |
| STO-LP7250 | MWIR/LWIR transition | 7250 ± 50 | T>=90% | 7450-11000 | 1400-7000 nm; T < 1% | Germanium | 2.5 |
| STO-LP7570 | MWIR/LWIR transition | 7570 ± 70 | T>=90% | 7770-12600 | 1010-7320 nm; T < 1% | Germanium | 0.3 |
| STO-LP7675 | MWIR/LWIR transition | 7675 ± 75 | T>=90% | 8000-14000 | 1500-7550 nm; T < 1% | Germanium | 0.3 |
| STO-LP7770 | MWIR/LWIR transition | 7770 ± 70 | T>=90% | 7870-12600 | 1010-7320 nm; T < 1% | Germanium | 0.3 |
| STO-LP7950 | MWIR/LWIR transition | 7950 ± 150 | T>=85% | 8050-14000 | 190-7800 nm; T < 1% | Germanium | 1 |
| STO-LP9000 | LWIR | 9000 ± 300 | T>=90% | 9500-12500 | 400-8500 nm; T < 1% | Germanium | 0.5 |
| STO-LP10000 | LWIR | 10000 ± 70 | T>=90% | 10150-14300 | 1500-9800 nm; T < 1% | Zinc selenide | 0.5 |
| STO-LP10015 | LWIR | 10015 ± 100 | T>=85% | 10450-14500 | 1500-9800 nm; T < 1% | Germanium | 0.3 |
| STO-LP10600 | LWIR | 10600 ± 100 | T>=80% | 11000-14000 | 1500-10000 nm; T < 1% | Germanium | 2.7 |
| STO-LP10900 | LWIR | 10900 ± 100 | T>=80% | 11200-15400 | 1500-10750 nm; T < 1% | Germanium | 1 |
| STO-LP11050 | LWIR | 11050 ± 50 | T>=80% | 11200-15400 | 1500-10750 nm; T < 1% | Germanium | 0.8, 0.9 |
| STO-LP11190 | LWIR | 11190 ± 100 | T>=80% | 11500-15700 | 1500-10750 nm; T < 1% | Germanium | 0.8, 1 |
| STO-LP11600 | LWIR | 11600 ± 100 | T>=85% | 11800-12200 | 7000-11200 nm; T < 1% | Germanium | 0.9 |
| STO-LP11700 | LWIR | 11700 ± 100 | T>=80% | 11900-12300 | 7000-11200 nm; T < 1% | Germanium | 0.8, 0.9, 1, 2.7 |
Faixas adicionais de revestimentos antirreflexo infravermelhos. Dimensões e materiais permanecem como referência para a cotação, salvo confirmação na fonte.
| Modelo de revestimento | Faixa espectral | Faixa de transmissão (nm) | Transmitância média | Espessura do substrato (mm) |
|---|---|---|---|---|
| STO-AR1000~2600 | SWIR | 1000-2600 | T>=90% | 1, 1.6, 6 |
| STO-AR1000~5100 | MWIR | 1000-5100 | T>=80% | 0.5, 1 |
| STO-AR1200~5500 | MWIR | 1200-5500 | T>=85% | 0.5 |
| STO-AR1250-1650 | SWIR | 1250-1650 | T>=99% | 0.3 |
| STO-AR1500~1600 | SWIR | 1500-1600 | T>=97% | 0.3, 1 |
| STO-AR1580~6900 | MWIR | 1580-6900 | T>=85% | 0.5, 1 |
| STO-AR1600~5300 | MWIR | 1600-5300 | T>=90% | 0.5, 1 |
| STO-AR1800~10000 | MWIR/LWIR transition | 1800-10000 | T>=90% | 1.2 |
| STO-AR1800~6000 | MWIR | 1500-5000 | T>=95% | 0.5 |
| STO-AR2000~12000 | MWIR/LWIR transition | 2000-12000 | T>=85% | 0.5 |
| STO-AR2000~14000 | LWIR | 2000-14000 | T>=80% | 0.5 |
| STO-AR2000~5600 | MWIR | 2000-5600 | T>=85% | 0.3, 1 |
| STO-AR2000~6000 | MWIR | 2000-6000 | T>=90% | 1, 5 |
| STO-AR2100~5500 | MWIR | 2100-5500 | T>=90% | 0.9, 1 |
| STO-AR2300~12600 | MWIR/LWIR transition | 2300-12600 | T>=90% | 1, 1.6 |
| STO-AR2300~5500 | MWIR | 2300-5500 | T>=92% | 1 |
| STO-AR2400~14000 | LWIR | 2400-14000 | T>=80% | 0.8, 2 |
| STO-AR2500~12000 | MWIR/LWIR transition | 2500-12000 | T>=90% | 1, 1.6 |
| STO-AR2500~12600 | MWIR/LWIR transition | 2500-12600 | T>=90% | 1.6 |
| STO-AR2500~14000 | LWIR | 2500-14000 | T>=85% | 0.5 |
| STO-AR2500~3300 | MWIR | 2500-3300 | T>=90% | 0.65, 1, 3 |
| STO-AR2500~4600 | MWIR | 2500-4600 | T>=90% | 0.5 |
| STO-AR2500~4700 | MWIR | 2500-4700 | T>=90% | 0.7, 0.8, 2.9, 12 |
| STO-AR2500~6000 | MWIR | 2500-6000 | T>=85% | 0.5 |
| STO-AR2600~5200 | MWIR | 2600-5200 | T>=90% | 0.5, 4 |
| STO-AR2680~4520 | MWIR | 2680-4520 | T>=90% | 0.5, 2.8, 3 |
| STO-AR2700~5300 | MWIR | 2700-5300 | T>=95% | 0.5 |
| STO-AR2700~9100 | MWIR/LWIR transition | 2700-9100 | T>=90% | 0.5, 5 |
| STO-AR2800~4900 | MWIR | 2800-4900 | T>=90% | 0.9 |
| STO-AR2800~5500 | MWIR | 2800-5500 | T>=90% | 0.5 |
| STO-AR2850~4850 | MWIR | 2850-4850 | T>=90% | 0.5 |
| STO-AR2900~5400 | MWIR | 2900-5400 | T>=90% | 6 |
| STO-AR3000~11000 | MWIR/LWIR transition | 3000-11000 | T>=90% | 0.38, 1.6 |
| STO-AR3000~12600 | MWIR/LWIR transition | 3000-12600 | T>=90% | 0.4, 0.9, 1.6 |
| STO-AR3000~14000 | LWIR | 3000-14000 | T>=90% | 0.3, 0.6, 0.7, 0.75, 0.8, 0.9, 1 |
| STO-AR3100~3600 | MWIR | 3100-3600 | T>=90% | 1 |
| STO-AR3200~3600 | MWIR | 3200-3600 | T>=85% | 0.45, 0.9 |
| STO-AR3200~5500 | MWIR | 3200-5500 | T>=85% | 0.9, 1 |
| STO-AR3400~12500 | MWIR/LWIR transition | 3400-12500 | T>=90% | 1 |
| STO-AR3500~10000 | MWIR/LWIR transition | 3500-10000 | T>=90% | 0.5, 1 |
| STO-AR3500~5000 | MWIR | 3500-5000 | T>=95% | 0.5, 1, 1.6 |
| STO-AR3600~4800 | MWIR | 3600-4800 | T>=95% | 0.5, 1 |
| STO-AR3600~5000 | MWIR | 3600-5000 | T>=95% | 0.5 |
| STO-AR3700~4800 | MWIR | 3700-4800 | T>=90% | 0.5, 1 |
| STO-AR3700~5000 | MWIR | 3700-5000 | T>=95% | 0.9 |
| STO-AR400~1700 | NIR | 400-1700 | T>=90% | 0.85, 1 |
| STO-AR400~3000 | SWIR | 400-3000 | T>=85% | 1.5 |
| STO-AR400~880 | NIR | 400-880 | T>=90% | 0.5 |
| STO-AR420~780 | NIR | 420-780 | T>=90% | 1 |
| STO-AR4300 | IR | 4300 | T>=90% | 1 |
| STO-AR4500~13000 | LWIR | 4500-13000 | T>=90% | 0.8, 1 |
| STO-AR5500~11000 | LWIR | 5500-11000 | T>=90% | 0.8, 2.5 |
| STO-AR5500~14000 | LWIR | 5500-14000 | T>=80% | 0.5 |
| STO-AR6000~10500 | LWIR | 6000-10500 | T>=90% | 0.9, 1 |
| STO-AR6000~11000 | LWIR | 6000-11000 | T>=90% | 2.5 |
| STO-AR6000~13000 | LWIR | 6000-13000 | T>=90% | 1 |
| STO-AR6000~18000 | LWIR | 6000-18000 | T>=48% | 0.8, 1 |
| STO-AR6200~12600 | LWIR | 6200-12600 | T>=90% | 0.5, 0.6, 0.9, 3, 6 |
| STO-AR6500~11000 | LWIR | 6500-11000 | T>=95% | 1 |
| STO-AR7000~12500 | LWIR | 7000-12500 | T>=95% | 0.4, 2.5, 2.8 |
| STO-AR7000~12600 | LWIR | 7000-12600 | T>=90% | 0.7, 0.9, 1, 3 |
| STO-AR7000~14000 | LWIR | 7000-14000 | T>=90% | 1 |
| STO-AR7000~14500 | LWIR | 7000-14500 | T>=90% | 0.8, 1 |
| STO-AR7000~14600 | LWIR | 7000-14600 | T>=90% | 0.9, 1, 3 |
| STO-AR7000~16000 | LWIR | 7000-16000 | T>=90% | 0.8, 0.9, 1, 3.5 |
| STO-AR7400~10700 | LWIR | 7400-10700 | T>=95% | 2.6, 3 |
| STO-AR7400~10900 | LWIR | 7400-10900 | T>=94% | 0.8, 2.9 |
| STO-AR7400~12800 | LWIR | 7400-12800 | T>=90% | 0.9, 1 |
| STO-AR7500~10100 | LWIR | 7500-10100 | T>=90% | 0.7, 0.9, 1, 2.9, 8.7 |
| STO-AR7500~10500 | LWIR | 7500-10500 | T>=93% | 0.7, 1 |
| STO-AR7500~10700 | LWIR | 7500-10700 | T>=90% | 1 |
| STO-AR7500~11000 | LWIR | 7500-11000 | T>=90% | 2.5, 2.8 |
| STO-AR7500~13000 | LWIR | 7500-13000 | T>=90% | 0.9, 5 |
| STO-AR7500~13500 | LWIR | 7500-13500 | T>=90% | 0.8 |
| STO-AR7500~9700 | LWIR | 7500-9700 | T>=85% | 0.75 |
| STO-AR7600~12700 | LWIR | 7600-12700 | T>=93% | 1 |
| STO-AR7700~11000 | LWIR | 7700-11000 | T>=95% | 0.9, 3 |
| STO-AR7700~9300 | LWIR | 7700-9300 | T>=93% | 0.3, 0.75 |
| STO-AR7800~10000 | LWIR | 7800-10000 | T>=95% | 0.9, 1 |
| STO-AR8000~10000 | LWIR | 8000-10000 | T>=92% | 0.9, 2.7, 2.8, 3 |
| STO-AR8000~13500 | LWIR | 8000-13500 | T>=90% | 3 |
| STO-AR8000~15000 | LWIR | 8000-15000 | T>=93% | 2 |
| STO-AR800~4000 | SWIR | 800-4000 | T>=80% | 1 |
| STO-AR9000~16500 | LWIR | 9000-16500 | T>=90% | 1.6 |
| STO-AR900~1700 | SWIR | 900-1700 | T>=90% | 1.6 |
| STO-AR9500~17000 | LWIR | 9500-17000 | T>=80% | 0.7, 1.6 |
Combine os filtros IR com o material do detector, transmissão do substrato e temperatura de trabalho. As bandas IR não são intercambiáveis.
O material pode limitar a faixa espectral utilizável antes do revestimento. Confirme primeiro o substrato em aplicações IR.
Em aplicações térmicas ou de detecção de gases, especifique banda de absorção desejada, faixa de bloqueio e ambiente de operação.
A página cobre filtros de infravermelho próximo, de ondas curtas, médias e longas quando há dados disponíveis.
Os materiais têm faixas de transmissão distintas; o substrato deve ser compatível com a banda infravermelha desejada.
Sim. Bandas espectrais, dimensões, substratos e revestimentos personalizados podem ser discutidos para sistemas IR.
Qualidade e conformidade
Para programas OEM, instrumentos de laboratório e sistemas industriais, a OPTOStokes apresenta qualidade, conformidade dos materiais e suporte técnico desde a avaliação do fornecedor.
Controle de processos, registros de inspeção e revestimentos repetíveis para produção de componentes ópticos.
A documentação de conformidade pode ser preparada para projetos qualificados e cadeias de fornecimento regulamentadas.
Os requisitos de comprimento de onda, FWHM, substrato, AOI, dimensões e montagem podem ser avaliados com a equipe técnica.
Informe comprimento de onda, bloqueio, transmitância e requisitos do desenho para uma cotação objetiva.
Nossa equipe técnica ajuda a escolher a solução óptica adequada.