NIR, SWIR, MWIR e LWIR sono ambiti di progettazione distinti
Abbina i filtri IR al materiale del rivelatore, alla trasmissione del substrato e alla temperatura di esercizio. Le diverse bande IR non sono intercambiabili.
OPTOStokes è il marchio di filtri ottici di Optofilters.com e fornisce filtri disponibili a magazzino e con rivestimenti personalizzati per applicazioni UV, VIS, NIR e IR.
Esplora i filtri IR per NIR, SWIR, MWIR e LWIR in base a regione spettrale, substrato, banda di rivestimento e tipo. Confronta le specifiche prima di scegliere filtri per imaging termico, rilevamento di gas o spettroscopia IR.
Scegli prima la regione infrarossa, poi verifica sensibilità del rilevatore, trasmissione del substrato, banda del rivestimento, esposizione ambientale e requisiti di montaggio. I filtri IR spesso richiedono materiali diversi da quelli usati per la luce visibile.
I filtri IR OPTOStokes coprono applicazioni nel vicino infrarosso (750-1100 nm), infrarosso a onde corte (SWIR 1,1-2,5 µm), infrarosso a onde medie (MWIR 3-5 µm) e infrarosso a onde lunghe (LWIR 8-14 µm). I filtri passa-banda e passa-lungo IR di questa sezione sono destinati a telecamere termiche, spettroscopia IR, rilevamento di gas e sistemi di comunicazione a infrarossi.
Visualizza tutti i filtri passa-banda IR
| Modello | Lunghezza d'onda centrale (nm) | Trasmittanza | FWHM (nm) | Densità ottica |
|---|---|---|---|---|
| STO-BP680 | 680 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 300-1100 nm |
| STO-BP1120 | 1120 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 300-1200 nm |
| STO-BP1150 | 1150 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 300-1200 nm |
| STO-BP1173 | 1173 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 300-1200 nm |
| STO-BP1250 | 1250 ± 2 | T≥70% | 10-20 | OD ≥ 3 at 700-1800 nm |
| STO-BP1285 | 1285 ± 2 | T≥70% | 10-20 | OD ≥ 3 at 1000-1700 nm |
| STO-BP1455 | 1455 ± 2 | T≥50% | 10-20 | OD ≥ 3 at 1200-1800 nm |
| STO-BP1535 | 1535 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 600-2000 nm |
| STO-BP1545 | 1545 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 600-2000 nm |
| STO-BP1550 | 1550 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 600-2000 nm |
| STO-BP1555 | 1555 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 600-2000 nm |
| STO-BP1570 | 1570 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 1250-1700 nm |
| STO-BP1615 | 1615 ± 2 | T≥90% | 10-20 | OD ≥ 3 at 1450-1900 nm |
| STO-BP1620 | 1620 ± 2 | T≥70% | 10-20 | OD ≥ 3 at 1450-1900 nm |
| STO-BP1625 | 1625 ± 2 | T≥70% | 10-20 | OD ≥ 3 at 1450-1900 nm |
| STO-BP1655 | 1655 ± 5 | T≥70% | 10-20 | OD ≥ 3 at 1350-2200 nm |
| STO-BP1660 | 1660 ± 5 | T≥70% | 10-20 | OD ≥ 3 at 1350-2200 nm |
| STO-BP1680 | 1680 ± 10 | T≥90% | 10-20 | OD ≥ 3 at 800-3000 nm |
| STO-BP1685 | 1685 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 1550-2000 nm |
| STO-BP1695 | 1695 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 1550-2000 nm |
| STO-BP1935 | 1935 ± 2 | T≥60% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP1940 | 1940 ± 2 | T≥60% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP2050 | 2050 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP2180 | 2180 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP2230 | 2230 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP2270 | 2270 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP2340 | 2340 ± 2 | T≥80% | 10-20 | OD ≥ 3 at 800-2000 nm |
| STO-BP1100 | 1100 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1120 | 1120 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1125 | 1125 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1150 | 1150 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1173 | 1173 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1200 | 1200 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1235 | 1235 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1245 | 1245 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1250 | 1250 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1290 | 1290 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1300 | 1300 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1320 | 1320 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1340 | 1340 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1380 | 1380 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1430 | 1430 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1445 | 1445 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1450 | 1450 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1530 | 1530 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1535 | 1535 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1540 | 1540 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1550 | 1550 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1570 | 1570 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1575 | 1575 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1600 | 1600 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 350-1700 nm |
| STO-BP1610 | 1610 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 350-1700 nm |
| STO-BP1630 | 1630 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 350-1700 nm |
| STO-BP1650 | 1650 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1654 | 1654 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 350-1700 nm |
| STO-BP1660 | 1660 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 800-3000 nm |
| STO-BP1680 | 1680 ± 5 | T≥90% | 20-60 | OD ≥ 3 at 800-3000 nm |
| STO-BP1700 | 1700 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 800-2000 nm |
| STO-BP1714 | 1714 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 800-2000 nm |
| STO-BP1716 | 1716 ± 5 | T≥90% | 90-100 | OD ≥ 3 at 800-2000 nm |
| STO-BP1780 | 1780 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1800 | 1800 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1810 | 1810 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1818 | 1818 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1830 | 1830 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1920 | 1920 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1930 | 1930 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1935 | 1935 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1940 | 1940 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1945 | 1945 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| STO-BP1950 | 1950 ± 5 | T≥90% | 40-70 | OD ≥ 3 at 200-3000 nm |
| Modello | Cut-on (nm) | Trasmittanza | Intervallo di trasmissione (nm) | Densità ottica |
|---|---|---|---|---|
| STO-LP900 | 900 ± 5 | T≥90% | 910-1100 | OD ≥ 3 at 350-880 nm |
| STO-LP910 | 910 ± 5 | T≥90% | 920-1100 | OD ≥ 3 at 350-890 nm |
| STO-LP920 | 920 ± 5 | T≥90% | 930-1100 | OD ≥ 3 at 350-900 nm |
| STO-LP920 | 920 ± 10 | T≥90% | 940-1700 | OD ≥ 3 at 350-890 nm |
| STO-LP930 | 930 ± 5 | T≥90% | 940-1100 | OD ≥ 3 at 350-910 nm |
| STO-LP940 | 940 ± 5 | T≥90% | 950-1100 | OD ≥ 3 at 350-920 nm |
| STO-LP950 | 950 ± 5 | T≥90% | 970-1100 | OD ≥ 3 at 350-930 nm |
| STO-LP970 | 970 ± 5 | T≥90% | 980-1100 | OD ≥ 3 at 350-940 nm |
| STO-LP1000 | 1000 ± 10 | T≥90% | 1020-2000 | OD ≥ 3 at 350-970 nm |
| STO-LP1010 | 1010 ± 10 | T≥90% | 1030-1200 | OD ≥ 3 at 350-990 nm |
| STO-LP1060 | 1060 ± 10 | T≥88% | 1085-1100 | OD ≥ 3 at 350-1035 nm |
| STO-LP1150 | 1150 ± 10 | T≥90% | 1180-1700 | OD ≥ 3 at 700-1120 nm |
| STO-LP1170 | 1170 ± 10 | T≥90% | 1200-1700 | OD ≥ 3 at 700-1135 nm |
| STO-LP1200 | 1200 ± 10 | T≥90% | 1230-1800 | OD ≥ 3 at 350-1175 nm |
| STO-LP1250 | 1250 ± 10 | T≥90% | 1260-1750 | OD ≥ 3 at 350-1215 nm |
| STO-LP1270 | 1270 ± 10 | T≥90% | 1300-1800 | OD ≥ 3 at 350-1240 nm |
| STO-LP1380 | 1380 ± 10 | T≥90% | 1400-2150 | OD ≥ 3 at 700-1360 nm |
| STO-LP1400 | 1400 ± 10 | T≥90% | 1420-1100 | OD ≥ 3 at 350-1380 nm |
| STO-LP1450 | 1450 ± 10 | T≥90% | 1480-1800 | OD ≥ 3 at 350-1420 nm |
| STO-LP1470 | 1470 ± 10 | T≥90% | 1500-1800 | OD ≥ 3 at 350-1400 nm |
| STO-LP1600 | 1600 ± 10 | T≥90% | 1625-2300 | OD ≥ 3 at 350-1540 nm |
I filtri passa-banda stretti per infrarosso medio e lontano utilizzano substrati di silicio, zaffiro, germanio, fluoruro di calcio e seleniuro di zinco per le bande strumentali MWIR e LWIR. Sono disponibili dimensioni personalizzate per moduli di rilevamento e sistemi di misura termica.
| Modello | Regione IR | Lunghezza d'onda centrale (nm) | FWHM (nm) | Trasmittanza di picco | Blocco | Substrato | Dimensione |
|---|---|---|---|---|---|---|---|
| STO-NBP 2750 500nm | MWIR | 2750 ± 50 | 500 ± 60 | >=80% | 400-7000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 2775 250nm | MWIR | 2775 ± 30 | 250 ± 20 | >=80% | 400-7000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 2850 400nm | MWIR | 2850 ± 40 | 400 ± 30 | >=80% | 400-7000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3040 140nm | MWIR | 3040 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3040 140nm | MWIR | 3040 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 3060 140nm | MWIR | 3060 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3060 140nm | MWIR | 3060 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 3080 140nm | MWIR | 3080 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 3090 140nm | MWIR | 3090 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3280 160nm | MWIR | 3280 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3300 160nm | MWIR | 3300 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3300 160nm | MWIR | 3300 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 3310 60nm | MWIR | 3310 ± 10 | 60 ± 20 | >=80% | 400-4700nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3330 60nm | MWIR | 3330 ± 10 | 60 ± 20 | >=80% | 400-4700nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3330 160nm | MWIR | 3330 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3375 160nm | MWIR | 3375 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3375 160nm | MWIR | 3375 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 3400 120nm | MWIR | 3400 ± 30 | 120 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3400 180nm | MWIR | 3400 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3420 180nm | MWIR | 3420 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3440 120nm | MWIR | 3440 ± 30 | 120 ± 20 | >=80% | 400-25000nm,T ≤ 1% | Sapphire | Dia. 25 x 0.8mm |
| STO-NBP 3440 160nm | MWIR | 3440 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3460 150nm | MWIR | 3460 ± 30 | 150 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3800 300nm | MWIR | 3800 ± 40 | 300 ± 30 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3900 90nm | MWIR | 3900 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3920 90nm | MWIR | 3920 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3950 90nm | MWIR | 3950 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 3950 90nm | MWIR | 3950 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | 3.3 x 3.3 x 0.5mm |
| STO-NBP 3970 90nm | MWIR | 3970 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4000 90nm | MWIR | 4000 ± 20 | 90 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4050 180nm | MWIR | 4050 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4100 180nm | MWIR | 4100 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4200 180nm | MWIR | 4200 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4230 160nm | MWIR | 4230 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4260 180nm | MWIR | 4260 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4260 180nm | MWIR | 4260 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | 2.9 x 2.9 x 0.5mm |
| STO-NBP 4260 180nm | MWIR | 4260 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | 3.3 x 3.3 x 0.5mm |
| STO-NBP 4280 180nm | MWIR | 4280 ± 20 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4300 130nm | MWIR | 4300 ± 30 | 130 ± 20 | >=75% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4300 160nm | MWIR | 4300 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4300 180nm | MWIR | 4300 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4320 160nm | MWIR | 4320 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4330 130nm | MWIR | 4330 ± 30 | 130 ± 20 | >=80% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4330 180nm | MWIR | 4330 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4360 180nm | MWIR | 4360 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4380 180nm | MWIR | 4380 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4420 60nm | MWIR | 4420 ± 10 | 60 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4430 60nm | MWIR | 4430 ± 10 | 60 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4450 60nm | MWIR | 4450 ± 10 | 60 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4450 200nm | MWIR | 4450 ± 30 | 200 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4480 60nm | MWIR | 4480 ± 10 | 60 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4500 60nm | MWIR | 4500 ± 10 | 60 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4500 140nm | MWIR | 4500 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4500 200nm | MWIR | 4500 ± 30 | 200 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4520 140nm | MWIR | 4520 ± 30 | 140 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.6mm |
| STO-NBP 4560 160nm | MWIR | 4560 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4600 160nm | MWIR | 4600 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4640 160nm | MWIR | 4640 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4650 160nm | MWIR | 4650 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4680 150nm | MWIR | 4680 ± 30 | 150 ± 20 | >=80% | 400-25000nm,T ≤ 1% | Sapphire | Dia. 25 x 0.8mm |
| STO-NBP 4690 160nm | MWIR | 4690 ± 30 | 160 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4750 180nm | MWIR | 4750 ± 30 | 180 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 4770 150nm | MWIR | 4770 ± 30 | 150 ± 20 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 5300 600nm | MWIR/LWIR transition | 5300 ± 40 | 600 ± 30 | >=80% | 400-11000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.5mm |
| STO-NBP 7300 300nm | MWIR/LWIR transition | 7300 ± 40 | 300 ± 30 | >=70% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.5mm |
| STO-NBP 7350 200nm | MWIR/LWIR transition | 7350 ± 30 | 200 ± 30 | >=65% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 7410 200nm | MWIR/LWIR transition | 7410 ± 30 | 200 ± 30 | >=65% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 7470 200nm | MWIR/LWIR transition | 7470 ± 30 | 200 ± 30 | >=75% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 7625 200nm | MWIR/LWIR transition | 7625 ± 30 | 200 ± 30 | >=75% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 7650 200nm | MWIR/LWIR transition | 7650 ± 30 | 200 ± 30 | >=60% | 400-12000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 8420 200nm | LWIR | 8420 ± 40 | 200 ± 30 | >=60% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 9020 180nm | LWIR | 9020 ± 30 | 180 ± 30 | >=75% | 400-16000nm,T ≤ 1% | Float-zone silicon | Dia. 100 x 0.5mm |
| STO-NBP 9080 180nm | LWIR | 9080 ± 30 | 180 ± 30 | >=75% | 400-16000nm,T ≤ 1% | Float-zone silicon | Dia. 100 x 0.5mm |
| STO-NBP 9900 370nm | LWIR | 9900 ± 30 | 370 ± 20 | >=70% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10000 370nm | LWIR | 10000 ± 40 | 370 ± 30 | >=75% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10050 370nm | LWIR | 10050 ± 40 | 370 ± 30 | >=60% | 400-16000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10270 600nm | LWIR | 10270 ± 40 | 600 ± 30 | >=75% | 400-13500nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10460 370nm | LWIR | 10460 ± 40 | 370 ± 30 | >=75% | 400-14000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10500 600nm | LWIR | 10500 ± 50 | 600 ± 40 | >=75% | 400-13500nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10560 370nm | LWIR | 10560 ± 40 | 370 ± 30 | >=75% | 400-18000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 10700 370nm | LWIR | 10700 ± 40 | 370 ± 30 | >=75% | 400-14000nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 11500 600nm | LWIR | 11500 ± 50 | 600 ± 40 | >=65% | 400-14500nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 11700 600nm | LWIR | 11700 ± 50 | 600 ± 40 | >=65% | 400-14500nm,T ≤ 1% | Monocrystalline silicon | Dia. 100 x 0.5mm |
| STO-NBP 14500 1000nm | LWIR | 14500 ± 50 | 1000 ± 50 | >=70% | 400-19000nm,T ≤ 1% | Monocrystalline silicon | Dia. 25 x 0.5mm |
I filtri passa-banda larghi per infrarosso coprono finestre MWIR e LWIR estese e offrono blocco fuori banda per termografia, analisi dei gas e rilevamento a infrarossi.
| Modello | Regione IR | Intervallo di trasmissione (nm) | Trasmittanza media | Blocco | Dimensione | Substrato |
|---|---|---|---|---|---|---|
| STO-WBP 3100-3800nm Filter | MWIR | 3100-3800nm | >=85% | 400-25000nm, < =1% | Custom | Sapphire |
| STO-WBP 3250-3500nm Filter | MWIR | 3250-3500nm | >=88% | 400-6000nm, < =1% | Custom | Germanium |
| STO-WBP 3550-4150nm Filter | MWIR | 3550-4150nm | >=90% | 400-6000nm, < =1% | Custom | Germanium |
| STO-WBP 3670-4970nm Filter | MWIR | 3670-4970nm | >=90% | 400-6000nm, < =1% | Custom | Germanium |
| STO-WBP 4500-5000nm Filter | MWIR | 4500-5000nm | >=90% | 400-6000nm, < =1% | Custom | Germanium |
| STO-WBP 4750-5400nm Filter | MWIR/LWIR transition | 4750-5400nm | >=80% | 400-25000nm, < =1% | Custom | Sapphire |
| STO-WBP 8000-14000nm Filter | LWIR | 8000-14000nm | >75% | 0.4-7.5um, 15-21.5um, < =1% | Custom | Monocrystalline silicon |
| STO-WBP 8000-9450nm Filter | LWIR | 8000-9450nm | >=92% | 400-12000nm, < =1% | Custom | Germanium |
I filtri longpass per infrarosso trasmettono le regioni a lunghezza d’onda maggiore e bloccano l’energia a lunghezza d’onda minore, per isolare il rilevatore e realizzare percorsi di termografia.
| Modello | Regione IR | Intervallo di trasmissione (nm) | Trasmittanza media | Blocco | Dimensione | Substrato |
|---|---|---|---|---|---|---|
| STOLWP 3000-5000nm Filter | MWIR | 3000-5000nm | >85% | 400-2900nm, < =1% | Custom | Sapphire |
| STOLWP 5500-14000nm | LWIR | 5500-14000nm | >80% | 400-5000nm, < =1% | Custom | Monocrystalline silicon |
| STOLWP 7000-14000nm Filter | LWIR | 7000-14000nm | >80% | 400-6500nm, < =1% | Custom | Monocrystalline silicon |
| STOLWP 7700-9000nm Filter | LWIR | 7700-9000nm | >80% | 400-7600nm, < =1% | Custom | Monocrystalline silicon |
| STOLWP 8000-12000nm Filter | LWIR | 8000-12000nm | >85% | 400-7500nm, < =1% | Custom | Germanium |
I rivestimenti antiriflesso per infrarosso riducono la riflessione superficiale e aumentano la trasmissione del sistema su ottiche in silicio, zaffiro e germanio.
| Rivestimento | Regione IR | Intervallo di trasmissione (nm) | Trasmittanza media | Dimensione | Substrato |
|---|---|---|---|---|---|
| 0.8-5µm AR | MWIR | 0.8-5um | >=86% | Custom | Sapphire |
| 2.9-14.5µm AR | LWIR | 2.9-14.5um | >=73% | Custom | Germanium |
| 3-5µm AR | MWIR | 3-5um | >=90% | Custom | Monocrystalline silicon |
| 7-12µm AR | LWIR | 7-12um | >=88% | Custom | Monocrystalline silicon |
| 8-12µm AR+DLC | LWIR | 8-12um | >=75% | Custom | Monocrystalline silicon |
| 8-14µm AR | LWIR | 8-14um | >=83% | Custom | Monocrystalline silicon |
Le finestre IR metallizzate hanno un’apertura ottica rivestita e bordi metallizzati, adatti alla saldatura o all’incapsulamento ermetico in gruppi di rilevamento e imaging.
| Specifiche | Regione IR | Apertura libera | Area metallizzata | Specifiche spettrali | Substrato | Dimensioni esterne |
|---|---|---|---|---|---|---|
| 16 x 16 x 0.8mm | MWIR | 13.2 x 13.2 | ≥13.7 x 13.7 | 3-5um, Tavg≥96% | Germanium | 16 x 16 |
| Dia. 12 x 1mm | MWIR | Dia. 10 | ≥Dia. 10.5 | 3-5um, Tavg≥96% | Monocrystalline silicon | Dia. 12 |
| Dia. 18 x 1mm | MWIR | Dia. 14 | ≥Dia. 14.5 | 3-5um, Tavg≥96% | Monocrystalline silicon | Dia. 18 |
| Dia. 30 x 1mm | MWIR | Dia. 26 | ≥Dia. 26.5 | 3-5um, Tavg≥96% | Sapphire | Dia. 30 |
| 10 x 10 x 1mm | LWIR | 8.5 x 8.5 x 0.9 | ≥8.9 x 8.9 | 8-12um, Tavg≥82% | Monocrystalline silicon | 10 x 10 x 1 |
| Dia. 2.5 x 0.28mm | SWIR | Dia. 1.6 | ≥Dia. 1.8 | 1250-1650nm, Tavg>99% | Sapphire | Dia. 2.5 |
Ulteriori modelli di filtri passa-banda IR con FWHM fino a 10 nm. Il riepilogo mantiene visibili i parametri ottici e rimanda le dimensioni fisiche alla verifica in fase di preventivo.
| Modello | Intervallo spettrale | Classe di larghezza di banda | CWL (nm) | FWHM (nm) | Trasmittanza | Blocco | Substrato | Spessore del substrato (mm) |
|---|---|---|---|---|---|---|---|---|
| STO-BP2475±5 | SWIR | ultra-narrow | 2475 ± 5 | 10 ± 5 | T>=60% | 600-3000 nm; T < 1% | Borosilicate glass | 2 |
| STO-BP2490±5 | SWIR | ultra-narrow | 2490 ± 5 | 10 ± 5 | T>=60% | 600-3000 nm; T < 1% | Borosilicate glass | 2 |
Ulteriori modelli di filtri passa-banda IR con FWHM superiore a 10 nm e fino a 20 nm, raggruppati per selezionare rapidamente lunghezza d'onda e larghezza di banda.
| Modello | Intervallo spettrale | Classe di larghezza di banda | CWL (nm) | FWHM (nm) | Trasmittanza | Blocco | Substrato | Spessore del substrato (mm) |
|---|---|---|---|---|---|---|---|---|
| STO-BP1440±20 | SWIR | narrow | 1440 ± 5 | 20 ± 10 | T>=70% | 400-2200 nm; T < 1% | White glass | 3 |
| STO-BP1645±5 | SWIR | narrow | 1645 ± 5 | 20 ± 5 | T>=90% | 800-2000 nm; T < 1% | Borosilicate glass | 0.5 |
| STO-BP1663±5 | SWIR | narrow | 1663 ± 5 | 20 ± 5 | T>=80% | 800-2000 nm; T < 1% | Borosilicate glass | 0.5 |
| STO-BP1697 | SWIR | narrow | 1697 ± 2 | 15 ± 2 | T>=85% | 800-2000 nm; T < 1% | Borosilicate glass | 0.5 |
| STO-BP1745±15 | SWIR | narrow | 1740 ± 5 | 20 ± 5 | T=55-65% | 400-2200 nm; T < 1.5% | White glass | 3 |
Ulteriori modelli di filtri passa-banda IR con FWHM superiore a 20 nm per una selezione spettrale più ampia.
| Modello | Intervallo spettrale | Classe di larghezza di banda | CWL (nm) | FWHM (nm) | Trasmittanza | Blocco | Substrato | Spessore del substrato (mm) |
|---|---|---|---|---|---|---|---|---|
| STO-BP900±30 | NIR | standard | 900 ± 30 | 70 ± 30 | T>=90% | 650-1250 nm; T < 1% | Sapphire | 3.5 |
| STO-BP1380±30 | SWIR | standard | 1380 ± 30 | 70 ± 30 | T>=85% | 500-2000 nm; T < 1% | Sapphire | 3.5 |
| STO-BP1600±16 | SWIR | standard | 1600 ± 16 | 150 ± 20 | T>=80% | 400-3000 nm; T < 1% | Corning 7980 | 2 |
| STO-BP1900±20 | SWIR | standard | 1900 ± 20 | 50 ± 15 | T>=80% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP1940±18 | SWIR | standard | 1940 ± 18 | 45 ± 10 | T>=80% | 400-3000 nm; T < 1% | White glass | 1, 2 |
| STO-BP2010±20 | SWIR | standard | 2010 ± 20 | 180 ± 30 | T>=80% | 500-3000 nm; T < 1% | Sapphire | 3.5 |
| STO-BP2017±10 | SWIR | standard | 2017 ± 10 | 35 ± 10 | T>=55% | 400-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP2050±20 | SWIR | standard | 2050 ± 20 | 200 ± 30 | T>=80% | 500-3000 nm; T < 1% | Sapphire | 3.5 |
| STO-BP2120±20 | SWIR | standard | 2120 ± 20 | 50 ± 10 | T>=80% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP2220±20 | SWIR | standard | 2220 ± 20 | 45 ± 10 | T>=75% | 400-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP2240±20 | SWIR | standard | 2240 ± 20 | 30 ± 10 | T>=80% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP2250±10 | SWIR | standard | 2250 ± 10 | 30 ± 10 | T>=85% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP2300±20 | SWIR | standard | 2300 ± 20 | 90 ± 10 | T>=90% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP2310±20 | SWIR | standard | 2310 ± 20 | 90 ± 10 | T>=90% | 400-3000 nm; T < 1% | White glass | 1 |
| STO-BP2400±24 | SWIR | standard | 2400 ± 24 | 70 ± 30 | T>=75% | 500-3000 nm; T < 1% | Sapphire | 3.5 |
| STO-BP2435±10 | SWIR | standard | 2435 ± 10 | 60 ± 15 | T>=70% | 400-20000 nm; T < 1% | Sapphire | 1 |
| STO-BP2435±20 | SWIR | standard | 2435 ± 20 | 60 ± 15 | T>=70% | 400-20000 nm; T < 1% | Sapphire | 1 |
| STO-BP2460±20 | SWIR | standard | 2460 ± 20 | 50 ± 10 | T>=80% | 1500-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP2470±30 | SWIR | standard | 2470 ± 30 | 50 ± 20 | T>=75% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2500±25 | MWIR | standard | 2500 ± 25 | 70 ± 30 | T>=80% | 500-3000 nm; T < 1% | Sapphire | 1, 3.5 |
| STO-BP2520±10 | MWIR | standard | 2520 ± 10 | 50 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2530±30 | MWIR | standard | 2530 ± 30 | 50 ± 20 | T>=75% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2550±50 | MWIR | standard | 2550 ± 50 | 70 ± 30 | T>=75% | 500-3000 nm; T < 1% | Sapphire | 1, 3.5 |
| STO-BP2560±30 | MWIR | standard | 2560 ± 30 | 50 ± 20 | T>=75% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2570±30 | MWIR | standard | 2570 ± 30 | 50 ± 20 | T>=75% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2580±30 | MWIR | standard | 2580 ± 30 | 50 ± 20 | T>=75% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2600±10 | MWIR | standard | 2600 ± 10 | 50 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2600±30 | MWIR | standard | 2600 ± 30 | 50 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2610±30 | MWIR | standard | 2610 ± 30 | 50 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP2720 | MWIR | standard | 2720 ± 50 | 140 ± 20 | T>=80% | 100-30000 nm; T < 1% | Fused silica | 1 |
| STO-BP2730±30 | MWIR | standard | 2730 ± 30 | 210 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 1 |
| STO-BP2750±50 | MWIR | standard | 2750 ± 50 | 140 ± 20 | T>=80% | 200-30000 nm; T < 1% | Fused silica | 1 |
| STO-BP2850±28 | MWIR | standard | 2850 ± 28 | 86 ± 20 | T>=80% | 1500-5500 nm; T < 1% | Silicon | 0.5, 6.35 |
| STO-BP2900±20 | MWIR | standard | 2900 ± 20 | 50 ± 10 | T>=70% | 1500-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP3030±40 | MWIR | standard | 3030 ± 40 | 145 ± 30 | T>=85% | 400-11000 nm | Silicon | 0.5 |
| STO-BP3050±50 | MWIR | standard | 3050 ± 50 | 100 ± 20 | T>=80% | 300-20000 nm; T < 1% | Sapphire | 1 |
| STO-BP3085±30 | MWIR | standard | 3085 ± 30 | 100 ± 20 | T>=80% | 300-30000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-BP3130±40 | MWIR | standard | 3130 ± 40 | 145 ± 30 | T>=85% | 400-11000 nm | Silicon | 0.5 |
| STO-BP3150±20 | MWIR | standard | 3150 ± 20 | 60 ± 10 | T>=80% | 1500-5500 nm; T < 1% | Fused silica | 0.5 |
| STO-BP3250±25 | MWIR | standard | 3250 ± 25 | 210 ± 10 | T>=80% | 400-3800 nm; T < 1% | Silicon | 0.25 |
| STO-BP3250±50 | MWIR | standard | 3250 ± 50 | 180 ± 20 | T>=80% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3275±20 | MWIR | standard | 3275 ± 10 | 30 ± 10 | T>=70% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP3280±30 | MWIR | standard | 3280 ± 30 | 210 ± 15 | T>=75% | 400-3800 nm; T < 1% | Silicon | 0.25 |
| STO-BP3315±10 | MWIR | standard | 3315 ± 10 | 210 ± 10 | T>=80% | 400-3800 nm; T < 1% | Silicon | 0.25 |
| STO-BP3320±50单 | MWIR | standard | 3320 ± 50 | 190 ± 20 | T>=60% | 800-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3330±15 | MWIR | standard | 3330 ± 15 | 160 ± 20 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3360±20 | MWIR | standard | 3360 ± 20 | 70 ± 10 | T>=80% | 1500-6500 nm; T < 1% | Fused silica | 0.5 |
| STO-BP3370±35 | MWIR | standard | 3370 ± 35 | 660 ± 70 | T>=80% | 400-3800 nm; T < 1% | Silicon | 0.25, 0.38 |
| STO-BP3370±50 | MWIR | standard | 3370 ± 50 | 400 ± 30 | T>=80% | 1000-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3375±20 | MWIR | standard | 3375 ± 20 | 180 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-BP3375±40 | MWIR | standard | 3375 ± 40 | 660 ± 70 | T>=85% | 400-7000 nm; T < 1% | Silicon | 0.25 |
| STO-BP3390±35 | MWIR | standard | 3390 ± 35 | 210 ± 10 | T>=80% | 400-7000 nm; T < 1% | Silicon | 0.25 |
| STO-BP3416±20 | MWIR | standard | 3416 ± 20 | 120 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3430±40 | MWIR | standard | 3430 ± 40 | 120 ± 20 | T>=75% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3440±30 | MWIR | standard | 3440 ± 30 | 120 ± 10 | T>=80% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3580±40 | MWIR | standard | 3580 ± 40 | 160 ± 20 | T>=80% | 400-20000 nm; T < 1% | Sapphire | 0.5 |
| STO-BP3615±20 | MWIR | standard | 3615 ± 20 | 160 ± 20 | T>=80% | 400-20000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-BP3630±50 | MWIR | standard | 3630 ± 50 | 145 ± 20 | T>=80% | 400-15000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-BP3660±20 | MWIR | standard | 3660 ± 20 | 40 ± 10 | T>=80% | 800-6000 nm; T < 1% | Silicon | 0.5, 0.916 |
| STO-BP3680±40 | MWIR | standard | 3680 ± 40 | 162 ± 24 | T>=85% | 400-11000 nm | Silicon | 0.5 |
| STO-BP3770±20 | MWIR | standard | 3770 ± 20 | 50 ± 10 | T>=80% | 400-13600 nm; T < 1% | Sapphire | 0.5 |
| STO-BP3940±60 | MWIR | standard | 3940 ± 60 | 90 ± 20 | T>=80% | 1000-9000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3950±39 | MWIR | standard | 3950 ± 39 | 200 ± 20 | T>=85% | 400-8000 nm; T < 1% | Silicon | 0.5 |
| STO-BP3990±50 | MWIR | standard | 3990 ± 50 | 180 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4020±40 | MWIR | standard | 4020 ± 40 | 180 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4050±50 | MWIR | standard | 4050 ± 50 | 100 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4060±50 | MWIR | standard | 4060 ± 50 | 100 ± 20 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4073±40 | MWIR | standard | 4073 ± 40 | 125 ± 50 | T>=85% | 400-11000 nm | Silicon | 0.5 |
| STO-BP4260±50 | MWIR | standard | 4260 ± 50 | 180 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4320±50 | MWIR | standard | 4320 ± 50 | 600 ± 40 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4380±50 | MWIR | standard | 4380 ± 50 | 150 ± 20 | T>=80% | 1000-9000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4490±70 | MWIR | standard | 4490 ± 70 | 180 ± 20 | T>=70% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4515±20 | MWIR | standard | 4515 ± 20 | 90 ± 20 | T>=75% | 200-30000 nm; T < 1% | Sapphire | 1 |
| STO-BP4530±45 | MWIR | standard | 4530 ± 45 | 350 ± 20 | T>=80% | 400-20000 nm; T < 1% | Sapphire | 0.3, 0.5 |
| STO-BP4560±40 | MWIR | standard | 4560 ± 40 | 310 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP4580±60 | MWIR | standard | 4580 ± 60 | 140 ± 20 | T>=70% | 400-10000 nm; T < 1% | Silicon | 1 |
| STO-BP4680±50 | MWIR | standard | 4680 ± 50 | 180 ± 20 | T>=75% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP4680±55 | MWIR | standard | 4680 ± 55 | 180 ± 20 | T>=70% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP4680±60 | MWIR | standard | 4680 ± 60 | 180 ± 20 | T>=75% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP4710±20 | MWIR | standard | 4710 ± 20 | 140 ± 20 | T>=75% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP4710±40 | MWIR | standard | 4710 ± 40 | 180 ± 20 | T>=75% | 400-20000 nm; T < 1% | Sapphire | 1 |
| STO-BP4760±50 | MWIR | standard | 4760 ± 50 | 285 ± 70 | T>=80% | 400-11000 nm | Silicon | 0.5 |
| STO-BP4830±40 | MWIR | standard | 4830 ± 40 | 220 ± 20 | T>=75% | 400-11000 nm; T < 1% | Germanium | 1 |
| STO-BP5000±50 | MWIR/LWIR transition | standard | 5000 ± 50 | 150 ± 20 | T>=85% | 1000-10000 nm; T < 1% | Silicon | 1.5 |
| STO-BP5010±50 | MWIR/LWIR transition | standard | 5010 ± 50 | 220 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP5070±40 | MWIR/LWIR transition | standard | 5070 ± 50 | 100 ± 20 | T>=75% | 400-20000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-BP5120±50 | MWIR/LWIR transition | standard | 5120 ± 50 | 320 ± 20 | T>=70% | 400-5500 nm; T < 1% | Silicon | 1 |
| STO-BP5200±50 | MWIR/LWIR transition | standard | 5200 ± 50 | 610 ± 40 | T>=80% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP5250±50 | MWIR/LWIR transition | standard | 5250 ± 50 | 90 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-BP5380±30 | MWIR/LWIR transition | standard | 5380 ± 30 | 100 ± 20 | T>=65% | 400-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP5450±30 | MWIR/LWIR transition | standard | 5450 ± 30 | 100 ± 20 | T>=65% | 400-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP5480±30 | MWIR/LWIR transition | standard | 5480 ± 30 | 100 ± 20 | T>=65% | 400-15000 nm; T < 1% | Sapphire | 1 |
| STO-BP5600±60 | MWIR/LWIR transition | standard | 5600 ± 60 | 120 ± 20 | T>=80% | 1000-10000 nm | Silicon | 1.5 |
| STO-BP5850±50 | MWIR/LWIR transition | standard | 5850 ± 50 | 200 ± 20 | T>=70% | 400-11000 nm; T < 1% | Silicon | 1 |
| STO-BP5850±60 | MWIR/LWIR transition | standard | 5850 ± 60 | 160 ± 20 | T>=75% | 1000-10000 nm; T < 1% | Silicon | 1.5 |
| STO-BP5950±50 | MWIR/LWIR transition | standard | 5950 ± 50 | 200 ± 20 | T>=70% | 1000-10000 nm; T < 1% | Silicon | 0.5 |
| STO-BP6050±50 | MWIR/LWIR transition | standard | 6050 ± 50 | 200 ± 20 | T>=75% | 1000-10000 nm; T < 1% | Silicon | 1.5 |
| STO-BP6150±60 | MWIR/LWIR transition | standard | 6150 ± 60 | 200 ± 20 | T>=70% | 1000-10000 nm; T < 1% | Silicon | 1.5 |
| STO-BP6220±30 | MWIR/LWIR transition | standard | 6220 ± 62 | 140 ± 20 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP6235±30 | MWIR/LWIR transition | standard | 6235 ± 30 | 110 ± 20 | T>=60% | 400-11000 nm; T < 1% | Germanium | 0.9, 1 |
| STO-BP6240±40 | MWIR/LWIR transition | standard | 6240 ± 40 | 90 ± 20 | T>=70% | 400-11000 nm; T < 1% | Germanium | 1 |
| STO-BP6250±30 | MWIR/LWIR transition | standard | 6250 ± 30 | 120 ± 20 | T>=70% | 400-15000 nm; T < 1% | Silicon | 1 |
| STO-BP6820±68 | MWIR/LWIR transition | standard | 6820 ± 68 | 100 ± 20 | T>=75% | 400-10600 nm; T < 1% | Silicon | 1 |
| STO-BP6910±20 | MWIR/LWIR transition | standard | 6910 ± 30 | 90 ± 20 | T>=65% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP7400±50 | MWIR/LWIR transition | standard | 7400 ± 50 | 360 ± 20 | T>=80% | 400-10600 nm; T < 1% | Silicon | 0.5 |
| STO-BP7500±50 | MWIR/LWIR transition | standard | 7500 ± 50 | 2500 ± 100 | T>=90% | 400-17100 nm; T < 1% | Germanium | 0.6 |
| STO-BP7530±30 | MWIR/LWIR transition | standard | 7530 ± 30 | 180 ± 30 | T>=80% | 400-10600 nm; T < 1% | Silicon | 0.5, 1 |
| STO-BP7690±50 | MWIR/LWIR transition | standard | 7690 ± 50 | 340 ± 30 | T>=70% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-BP7700±50 | MWIR/LWIR transition | standard | 7700 ± 50 | 450 ± 30 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-BP7720±50 | MWIR/LWIR transition | standard | 7720 ± 50 | 180 ± 30 | T>=80% | 400-10600 nm; T < 1% | Silicon | 0.5, 1 |
| STO-BP7760±50 | MWIR/LWIR transition | standard | 7760 ± 50 | 500 ± 30 | T>=80% | 200-13500 nm; T < 1% | Silicon | 0.5 |
| STO-BP7780±20 | MWIR/LWIR transition | standard | 7780 ± 20 | 180 ± 30 | T>=80% | 400-10600 nm; T < 1% | Silicon | 0.5, 1 |
| STO-BP7800±50 | MWIR/LWIR transition | standard | 7800 ± 50 | 450 ± 30 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-BP7890±80 | MWIR/LWIR transition | standard | 7890 ± 80 | 500 ± 30 | T>=80% | 200-13500 nm; T < 1% | Silicon | 0.5 |
| STO-BP7950±50 | MWIR/LWIR transition | standard | 7950 ± 50 | 450 ± 30 | T>=75% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-BP7950±80 | MWIR/LWIR transition | standard | 7950 ± 80 | 250 ± 20 | T>75% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP8010±20 | LWIR | standard | 8010 ± 20 | 200 ± 20 | T>90% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP8060±60 | LWIR | standard | 8060 ± 60 | 250 ± 20 | T>80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP8120±30 | LWIR | standard | 8120 ± 30 | 250 ± 20 | T>90% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP8340±30 | LWIR | standard | 8340 ± 30 | 250 ± 20 | T>75% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-BP8350±100 | LWIR | standard | 8350 ± 100 | 45 ± 10 | T>70% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP8400±100 | LWIR | standard | 8400 ± 100 | 50 ± 20 | T>70% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP8500±100 | LWIR | standard | 8500 ± 100 | 50 ± 10 | T>70% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP8550±100 | LWIR | standard | 8550 ± 100 | 45 ± 10 | T>70% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP8700±100 | LWIR | standard | 8700 ± 100 | 210 ± 30 | T>=75% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP8800±100 | LWIR | standard | 8800 ± 100 | 210 ± 30 | T>=75% | 400-13600 nm; T < 1% | Silicon | 0.5 |
| STO-BP10100±100 | LWIR | standard | 10100 ± 100 | 660 ± 40 | T>=85% | 400-14000 nm; T < 1% | Germanium | 1 |
| STO-BP10220±100 | LWIR | standard | 10220 ± 100 | 660 ± 40 | T>=85% | 400-14000 nm; T < 1% | Germanium | 1 |
| STO-BP10580±50 | LWIR | standard | 10580 ± 50 | 250 ± 20 | T>=70% | 400-18000 nm; T < 1% | Silicon | 0.5 |
| STO-BP10860±150 | LWIR | standard | 10860 ± 150 | 640 ± 50 | T>=70% | 400-14000 nm; T < 1% | Silicon | 0.5 |
| STO-BP11100±150 | LWIR | standard | 11100 ± 150 | 640 ± 50 | T>=70% | 400-14000 nm; T < 1% | Silicon | 0.5 |
| STO-BP11200±150 | LWIR | standard | 11200 ± 150 | 640 ± 50 | T>=70% | 400-14000 nm; T < 1% | Silicon | 0.5 |
| STO-BP11500±50 | LWIR | standard | 11500 ± 50 | 550 ± 50 | T>=65% | 400-18000 nm; T < 1% | Silicon | 0.5 |
| STO-BP11580±60 | LWIR | standard | 11580 ± 60 | 550 ± 50 | T>=70% | 400-18000 nm; T < 1% | Silicon | 0.5 |
| STO-BP12600±100 | LWIR | standard | 12600 ± 100 | 800 ± 40 | T>=85% | 400-15000 nm; T < 1% | Germanium | 1 |
| STO-BP12750±100 | LWIR | standard | 12750 ± 100 | 800 ± 40 | T>=85% | 400-15000 nm; T < 1% | Germanium | 1 |
| STO-BP13000±100 | LWIR | standard | 13000 ± 100 | 4000 ± 100 | T>=85% | 1200-20000 nm; T < 1% | Germanium | 0.75, 0.9 |
| STO-BP13250±100 | LWIR | standard | 13250 ± 100 | 850 ± 50 | T>=85% | 400-15000 nm; T < 1% | Germanium | 1 |
| STO-BP13650±100 | LWIR | standard | 13650 ± 100 | 850 ± 50 | T>=80% | 400-15000 nm; T < 1% | Germanium | 0.5 |
| STO-BP15000±200 | LWIR | standard | 15000 ± 200 | 2200 ± 50 | T>=65% | 2000-25000 nm; T < 1% | Germanium | 2.2 |
| STO-BP16000±200 | LWIR | standard | 16000 ± 200 | 2400 ± 50 | T>=70% | 2000-25000 nm; T < 1% | Germanium | 1 |
| STO-BP16200±200 | LWIR | standard | 16200 ± 200 | 2400 ± 50 | T>=70% | 2000-25000 nm; T < 1% | Germanium | 1 |
Ulteriori modelli a banda larga per rilevamento, imaging e percorsi di rilevatori MWIR e LWIR.
| Modello | Intervallo spettrale | Banda passante (nm) | Intervallo di trasmissione (nm) | Trasmittanza | Blocco | Substrato | Spessore del substrato (mm) |
|---|---|---|---|---|---|---|---|
| STO-WBP1000~3000 | SWIR | 970 ± 100 – 2470 ± 100 | 1100-2300 | T>=90% | 200-3560 nm; T < 1% | Glass ceramic | 1 |
| STO-WBP1520~1850 | SWIR | 1520 ± 50 – 1850 ± 50 | 1600-1750 | T>=80% | 400-3300 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP1550~1750 | SWIR | 1550 ± 50 – 1750 ± 50 | 1600-1700 | T>=80% | 1500-2800 nm; T < 1% | Silicon | 1.2 |
| STO-WBP1550~5050 | MWIR | 1550 ± 50 – 5050 ± 50 | 1600-5000 | T>=80% | 1500-5580 nm; T < 1% | Silicon | 1.2 |
| STO-WBP1650~2350 | SWIR | 1650 ± 50 – 2350 ± 50 | 1700-2250 | T>=80% | 400-4000 nm; T < 10% | Silicon | 0.5 |
| STO-WBP2050~2350 | SWIR | 2050 ± 50 – 2350 ± 50 | 2150-2250 | T>=80% | 1500-2800 nm; T < 1% | Silicon | 0.5, 1, 1.2 |
| STO-WBP2050~2500 | SWIR | 2050 ± 50 – 2500 ± 50 | 2150-2450 | T>=80% | 1500-5000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2080~2350 | SWIR | 2080 ± 50 – 2350 ± 50 | 2135-2330 | T>=80% | 1500-2800 nm; T < 1% | Silicon | 1.2 |
| STO-WBP2080~2430 | SWIR | 2080 ± 50 – 2430 ± 50 | 2180-2330 | T>=80% | 1500-2800 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP2170~3670 | MWIR | 2170 ± 50 – 3670 ± 50 | 2300-3600 | T>=85% | 1500-5000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2300~3600 | MWIR | 2200 ± 50 – 3750 ± 50 | 2300-3600 | T>=85% | 1500-5000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2300~3700 | MWIR | 2250 ± 30 – 3770 ± 30 | 2300-3700 | T>=90% | 1500-5000 nm; T < 1% | Silicon | 1 |
| STO-WBP2400~3150 | MWIR | 2400 ± 50 – 3150 ± 50 | 2500-3000 | T>=90% | 400-10500 nm; T < 1% | Sapphire | 1, 5 |
| STO-WBP2450~3200 | MWIR | 2450 ± 20 – 3200 ± 20 | 2500-3140 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 2.5 |
| STO-WBP2450~4600 | MWIR | 2450 ± 50 – 4600 ± 50 | 2550-4500 | T>=90% | 400-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP2450~5150 | MWIR | 2450 ± 50 – 5150 ± 50 | 2640-5040 | T>=90% | 400-7040 nm; T < 1% | Silicon | 1 |
| STO-WBP2490~5240 | MWIR | 2490 ± 50 – 5240 ± 50 | 2640-5040 | T>=90% | 400-7040 nm; T < 1% | Silicon | 1 |
| STO-WBP2600~5000 | MWIR | 2490 ± 50 – 5240 ± 50 | 2640-5040 | T>=90% | 400-7040 nm; T < 1% | Germanium | 0.5, 0.9, 1 |
| STO-WBP2500-5000 | MWIR | 2500 ± 50 – 5000 ± 50 | 2700-4900 | T>=90% | 200-10000 nm; T < 1% | Germanium | 0.9, 1.8 |
| STO-WBP2500~5100 | MWIR | 2500 ± 50 – 5100 ± 50 | 2650-4950 | T>=90% | 1500-10500 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP2550~3150 | MWIR | 2550 ± 50 – 3150 ± 50 | 2700-3100 | T>=85% | 1500-5000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2550~3250 | MWIR | 2550 ± 50 – 3250 ± 50 | 2700-3100 | T>=90% | 430-10030 nm; T < 1% | Silicon | 0.5, 2.5 |
| STO-WBP2600~3300 | MWIR | 2600 ± 50 – 3300 ± 50 | 2850-3000 | T>=85% | 400-10000 nm; T < 1% | Germanium | 0.7 |
| STO-WBP2650~5050 | MWIR | 2600 ± 100 – 5050 ± 50 | 2750-4950 | T>=90% | 1500-8000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP2650~3000 | MWIR | 2650 ± 40 – 3000 ± 40 | 2700-2950 | T>=85% | 1000-6000 nm; T < 1% | Germanium | 1.8 |
| STO-WBP2700-3550 | MWIR | 2700 ± 50 – 3550 ± 50 | 2800-3450 | T>=90% | 300-20000 nm; T < 1% | Sapphire | 1 |
| STO-WBP2700-3600 | MWIR | 2700 ± 50 – 3600 ± 50 | 2800-3500 | T>=90% | 300-20000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-WBP2700~3150 | MWIR | 2700 ± 50 – 3150 ± 50 | 2800-3050 | T>=80% | 1500-5000 nm; T < 1% | Germanium | 1 |
| STO-WBP2720~2980 | MWIR | 2720 ± 20 – 2980 ± 20 | 2780-2920 | T>=80% | 1500-5000 nm; T < 1% | Germanium | 1 |
| STO-WBP2730~3010 | MWIR | 2730 ± 20 – 3010 ± 20 | 2800-2900 | T>=85% | 1500-5000 nm; T < 1% | Germanium | 1 |
| STO-WBP2750~4850 | MWIR | 2750 ± 50 – 4850 ± 50 | 3000-4600 | T>=85% | 1000-5100 nm; T < 1% | Germanium | 0.3, 0.4, 1 |
| STO-WBP2750~5100 | MWIR | 2750 ± 50 – 5100 ± 50 | 2900-5000 | T>=90% | 1500-10500 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP2790~3070 | MWIR | 2790 ± 20 – 3070 ± 20 | 2900-3000 | T>=80% | 1500-5000 nm; T < 1% | Germanium | 0.9, 1 |
| STO-WBP2800~3050 | MWIR | 2800 ± 50 – 3050 ± 50 | 2900-3000 | T>=90% | 1500-6500 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2800~5150 | MWIR | 2800 ± 50 – 5150 ± 50 | 2950-5000 | T>=90% | 1500-10500 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP2800~5200单 | MWIR | 2800 ± 100 – 5200 ± 100 | 2900-5100 | T>=55% | 2580-8000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP2800~5250 | MWIR | 2800 ± 50 – 5250 ± 50 | 2950-5100 | T>=90% | 1500-10500 nm; T < 1% | Germanium | 0.3 |
| STO-WBP2900~4140 | MWIR | 2900 ± 50 – 4140 ± 50 | 3100-4040 | T>=90% | 700-8040 nm; T < 1% | Germanium | 0.3 |
| STO-WBP2900~4450 | MWIR | 2900 ± 50 – 4450 ± 50 | 3050-4350 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP2900~4550 | MWIR | 2900 ± 50 – 4550 ± 50 | 3050-4450 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP2900~4850 | MWIR | 2900 ± 50 – 4850 ± 50 | 3050-4750 | T>=90% | 400-11000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP2900~5100 | MWIR | 2900 ± 50 – 5100 ± 50 | 3000-5000 | T>=90% | 1000-10500 nm; T < 1% | Germanium | 0.3, 0.4, 0.7 |
| STO-WBP2950~3250 | MWIR | 2950 ± 50 – 3250 ± 50 | 3000-3200 | T>=85% | 200-20000 nm; T < 1% | Sapphire | 1 |
| STO-WBP2950~3600 | MWIR | 2950 ± 50 – 3600 ± 50 | 3150-3400 | T>=85% | 1000-10500 nm; T < 1% | Germanium | 0.6, 0.9 |
| STO-WBP2950~3650 | MWIR | 2950 ± 50 – 3650 ± 50 | 3150-3450 | T>=85% | 1000-10500 nm; T < 1% | Germanium | 0.6, 0.9 |
| STO-WBP2950~4950 | MWIR | 2950 ± 50 – 4950 ± 50 | 3100-4800 | T>=90% | 400-11000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP3000~3300 | MWIR | 3000 ± 20 – 3300 ± 20 | 3050-3250 | T>=85% | 200-20000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-WBP3000~3700 | MWIR | 3000 ± 50 – 3700 ± 50 | 3100-3600 | T>=90% | 200-10000 nm; T < 1% | Germanium | 1.8 |
| STO-WBP3000~3800 | MWIR | 3000 ± 100 – 3800 ± 100 | 3100-3700 | T>=80% | 400-14000 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3000~3875 | MWIR | 3000 ± 100 – 3875 ± 75 | 3250-3650 | T>=80% | 500-5500 nm; T < 1% | Sapphire | 0.3, 0.5 |
| STO-WBP3000~4260 | MWIR | 3000 ± 50 – 4260 ± 50 | 3250-3900 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3000~4300 | MWIR | 3000 ± 50 – 4300 ± 50 | 3250-3900 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3000~5300 | MWIR | 3000 ± 50 – 5300 ± 50 | 3150-5150 | T>=85% | 1500-15500 nm; T < 1% | Sapphire | 0.3, 0.75, 1 |
| STO-WBP3000~5400 | MWIR | 3000 ± 50 – 5400 ± 50 | 3100-5300 | T>=90% | 1500-2800 nm; T < 1% | Germanium | 0.7, 1 |
| STO-WBP3020~3320 | MWIR | 3020 ± 20 – 3320 ± 20 | 3050-3250 | T>=85% | 200-20000 nm; T < 1% | Sapphire | 1 |
| STO-WBP3040~4320 | MWIR | 3040 ± 50 – 4320 ± 50 | 3250-4050 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3050~4200 | MWIR | 3050 ± 50 – 4200 ± 50 | 3250-3900 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3050~5000 | MWIR | 3050 ± 50 – 5000 ± 50 | 3200-4850 | T>=85% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3050~5450 | MWIR | 3050 ± 50 – 5450 ± 50 | 3200-5300 | T>=85% | 1500-15500 nm; T < 1% | Sapphire | 0.3, 0.75, 1 |
| STO-WBP3100~3700 | MWIR | 3100 ± 150 – 3700 ± 150 | 3200-3600 | T>=90% | 400-20000 nm; T < 1% | Sapphire | 1 |
| STO-WBP3100~4100 | MWIR | 3100 ± 50 – 4100 ± 50 | 3300-3900 | T>=90% | 900-8000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3100~4150 | MWIR | 3100 ± 50 – 4150 ± 50 | 3250-4050 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.4 |
| STO-WBP3100~4200 | MWIR | 3100 ± 50 – 4200 ± 50 | 3250-4050 | T>=85% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3100~4250 | MWIR | 3100 ± 50 – 4250 ± 50 | 3250-3900 | T>=80% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3130~3400 | MWIR | 3130 ± 50 – 3400 ± 50 | 3250-3350 | T>=75% | 500-3700 nm; T < 1% | Germanium | 0.9 |
| STO-WBP3150~3560 | MWIR | 3150 ± 50 – 3560 ± 50 | 3300-3500 | T>=85% | 400-10000 nm; T < 1% | Sapphire | 0.3 |
| STO-WBP3150~3600 | MWIR | 3150 ± 50 – 3600 ± 50 | 3250-3520 | T>=90% | 1500-6000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3150~3650 | MWIR | 3150 ± 50 – 3650 ± 50 | 3250-3500 | T>=90% | 1500-6000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3150~4100 | MWIR | 3150 ± 50 – 4100 ± 50 | 3250-4000 | T>=80% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3150~4200 | MWIR | 3150 ± 50 – 4200 ± 50 | 3300-4100 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3150~5150 | MWIR | 3150 ± 50 – 5150 ± 50 | 3300-5000 | T>=85% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3180-3420 | MWIR | 3180 ± 50 – 3420 ± 50 | 3200-3380 | T>=85% | 450-5600 nm; T < 1% | Zinc selenide | 1.5, 2 |
| STO-WBP3180~3420 | MWIR | 3180 ± 50 – 3420 ± 50 | 3200-3400 | T>=80% | 400-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3200~3500 | MWIR | 3200 ± 50 – 3500 ± 50 | 3250-3450 | T>=85% | 500-3700 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3200~3550 | MWIR | 3200 ± 50 – 3550 ± 50 | 3280-3480 | T>=90% | 500-7000 nm; T < 1% | Germanium | 0.7, 0.9 |
| STO-WBP3200~4000 | MWIR | 3200 ± 50 – 4000 ± 50 | 3350-3850 | T>=90% | 500-10000 nm; T < 1% | Silicon | 4 |
| STO-WBP3200~4100 | MWIR | 3200 ± 50 – 4100 ± 50 | 3300-4000 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3200~5200 | MWIR | 3200 ± 100 – 5200 ± 100 | 3300-5050 | T>=80% | 1500-7000 nm; T < 1% | Silicon | 0.3 |
| STO-WBP3170~3430 | MWIR | 3220 ± 20 – 3480 ± 20 | 3300-3430 | T>=85% | 450-6050 nm; T < 1% | Germanium | 0.3, 0.9, 1 |
| STO-WBP3230~3500 | MWIR | 3230 ± 50 – 3500 ± 50 | 3250-3480 | T>=80% | 400-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3230~3520 | MWIR | 3230 ± 30 – 3520 ± 30 | 3300-3430 | T>=85% | 450-6050 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3250~4200 | MWIR | 3250 ± 50 – 4200 ± 50 | 3400-4100 | T>=85% | 1500-10600 nm; T < 1% | Germanium | 0.3, 0.4, 1 |
| STO-WBP3270~3470 | MWIR | 3270 ± 50 – 3470 ± 50 | 3320-3420 | T>=80% | 200-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3300~4250 | MWIR | 3300 ± 50 – 4250 ± 50 | 3450-4150 | T>=85% | 1500-10600 nm; T < 1% | Germanium | 0.4 |
| STO-WBP3300~4900 | MWIR | 3300 ± 50 – 4900 ± 50 | 3400-4800 | T>=90% | 500-8000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3400~3600 | MWIR | 3325 ± 25 – 3675 ± 25 | 3450-3550 | T>=90% | 900-6000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3350~4250 | MWIR | 3350 ± 50 – 4250 ± 50 | 3550-4150 | T>=90% | 430-10030 nm; T < 1% | Silicon | 2.5 |
| STO-WBP3350~4500 | MWIR | 3350 ± 50 – 4500 ± 50 | 3500-4350 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.7 |
| STO-WBP3350~4750 | MWIR | 3350 ± 50 – 4750 ± 50 | 3450-4650 | T>=90% | 1500-8000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3400~4000 | MWIR | 3400 ± 50 – 4000 ± 50 | 3500-3850 | T>=90% | 200-10000 nm; T < 1% | Germanium | 1.8 |
| STO-WBP3400~4100 | MWIR | 3400 ± 100 – 4100 ± 100 | 3550-4000 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.4 |
| STO-WBP3400~4200 | MWIR | 3400 ± 100 – 4200 ± 100 | 3550-4100 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.5, 1 |
| STO-WBP3400~4300 | MWIR | 3400 ± 50 – 4300 ± 50 | 3500-4200 | T>=80% | 1500-7000 nm; T < 1% | Sapphire | 2.5 |
| STO-WBP3400~4800 | MWIR | 3400 ± 50 – 4800 ± 50 | 3500-4700 | T>=90% | 1500-8000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3400~4850 | MWIR | 3400 ± 50 – 4850 ± 50 | 3400-4500 | T>=90% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3400~4950 | MWIR | 3400 ± 50 – 4950 ± 50 | 3700-4700 | T>=90% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3400~5000 | MWIR | 3400 ± 50 – 5000 ± 50 | 3500-4900 | T>=90% | 1500-10600 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3400~5100 | MWIR | 3400 ± 50 – 5100 ± 50 | 3600-5000 | T>=90% | 1500-10600 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3420~3910 | MWIR | 3420 ± 50 – 3910 ± 50 | 3500-3830 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP3425~4850 | MWIR | 3425 ± 75 – 4850 ± 50 | 3650-4750 | T>=85% | 1500-7000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3440~4890 | MWIR | 3440 ± 50 – 4890 ± 50 | 3500-4830 | T>=90% | 540-10040 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3450~4000 | MWIR | 3450 ± 50 – 4000 ± 50 | 3500-3900 | T>=85% | 1500-6000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3450~4050 | MWIR | 3450 ± 50 – 4050 ± 50 | 3600-3900 | T>=90% | 200-10000 nm; T < 1% | Germanium | 1.8 |
| STO-WBP3470~4950 | MWIR | 3470 ± 50 – 4950 ± 50 | 3570-4850 | T>=90% | 500-10070 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3480~4880 | MWIR | 3480 ± 50 – 4880 ± 50 | 3700-4800 | T>=80% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3490~3850 | MWIR | 3490 ± 50 – 3850 ± 50 | 3550-3750 | T>=80% | 400-6000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP3490~3950 | MWIR | 3490 ± 50 – 3950 ± 50 | 3650-3800 | T>=80% | 400-10000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP3490~4050 | MWIR | 3490 ± 50 – 4050 ± 50 | 3650-3950 | T>=80% | 400-10000 nm; T < 1% | Silicon | 1 |
| STO-WBP3500~4150 | MWIR | 3500 ± 50 – 4150 ± 50 | 3600-4050 | T>=90% | 1500-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3500~4900 | MWIR | 3500 ± 50 – 4900 ± 50 | 3600-4800 | T>=70% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3500~4950 | MWIR | 3500 ± 50 – 4950 ± 50 | 3560-4900 | T>=90% | 540-10040 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3500~5300 | MWIR | 3500 ± 50 – 5300 ± 50 | 3600-5100 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3500~5600 | MWIR | 3500 ± 50 – 5600 ± 50 | 3600-5500 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3525~4925 | MWIR | 3525 ± 100 – 4950 ± 100 | 3700-4800 | T>=90% | 1500-9000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP3530~3950 | MWIR | 3530 ± 50 – 3950 ± 50 | 3610-3870 | T>=75% | 400-5580 nm; T < 1% | Silicon | 0.5, 1.2 |
| STO-WBP3500~3970 | MWIR | 3545 ± 20 – 4015 ± 20 | 3610-3955 | T>=80% | 450-5600 nm; T < 1% | Zinc selenide | 2 |
| STO-WBP3550~4100 | MWIR | 3550 ± 50 – 4100 ± 50 | 3650-4000 | T>=93% | 1500-6000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3550~4250 | MWIR | 3550 ± 50 – 4250 ± 50 | 3600-4200 | T>=90% | 500-6500 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3550~4750 | MWIR | 3550 ± 50 – 4750 ± 50 | 3650-4650 | T>=90% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3550~4950 | MWIR | 3550 ± 50 – 4950 ± 50 | 3700-4800 | T>=90% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3550~4990 | MWIR | 3550 ± 50 – 4990 ± 50 | 3600-4800 | T>=85% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3550~5000 | MWIR | 3550 ± 50 – 5000 ± -100 | 3700-4600 | T>=90% | 1500-10500 nm; T < 1% | Sapphire | 0.3, 0.5 |
| STO-WBP3600-4000 | MWIR | 3600 ± 50 – 4000 ± 50 | 3620-3890 | T>=75% | 450-5600 nm; T < 1% | Zinc selenide | 1.5, 2 |
| STO-WBP3600~4000 | MWIR | 3600 ± 50 – 4000 ± 50 | 3680-3900 | T>=75% | 400-5580 nm; T < 1% | Silicon | 1.2 |
| STO-WBP3600~4300 | MWIR | 3600 ± 50 – 4300 ± 50 | 3700-4200 | T>=85% | 1500-6000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3600~4850 | MWIR | 3600 ± 50 – 4850 ± 50 | 3700-4700 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3, 1 |
| STO-WBP3600~5000 | MWIR | 3600 ± 50 – 5000 ± 50 | 3700-4700 | T>=90% | 400-9000 nm; T < 1% | Germanium | 0.8 |
| STO-WBP3600~5100 | MWIR | 3600 ± 100 – 5100 ± 100 | 3800-5000 | T>=90% | 200-10500 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3600~5300 | MWIR | 3600 ± 50 – 5300 ± 50 | 3700-5200 | T>=90% | 930-10050 nm; T < 1% | Germanium | 0.5 |
| STO-WBP3600~5450 | MWIR | 3600 ± 50 – 5450 ± 50 | 3800-5250 | T>=80% | 400-6000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP3600~5550 | MWIR | 3600 ± 50 – 5550 ± 50 | 3700-5400 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3605~5275 | MWIR | 3605 ± 25 – 5275 ± 25 | 3730-5150 | T>=90% | 930-10050 nm; T < 1% | Germanium | 0.5 |
| STO-WBP3650~4265 | MWIR | 3650 ± 50 – 4265 ± 50 | 3750-4150 | T>=90% | 500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3650~5050 | MWIR | 3650 ± 50 – 5050 ± 50 | 3800-4900 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3650~5100 | MWIR | 3650 ± 50 – 5100 ± 50 | 3740-5000 | T>=93% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3650~5150 | MWIR | 3650 ± 70 – 5150 ± 70 | 3800-5000 | T>=90% | 200-10500 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3650~5350 | MWIR | 3650 ± 50 – 5350 ± 50 | 3800-5200 | T>=90% | 400-11000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3650~5550 | MWIR | 3650 ± 50 – 5550 ± 50 | 3750-5300 | T>=85% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3650~5600 | MWIR | 3650 ± 50 – 5600 ± 50 | 3750-5400 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3650~5750 | MWIR | 3650 ± 50 – 5750 ± 50 | 3750-5450 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~4500 | MWIR | 3650 ± 50 – 4600 ± 50 | 3700-4500 | T>=90% | 1500-7000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP3660~4250 | MWIR | 3660 ± 50 – 4250 ± 50 | 3750-4150 | T>=90% | 500-7000 nm; T < 1% | Germanium | 0.9, 1 |
| STO-WBP3800~4850 | MWIR | 3675 ± 25 – 4975 ± 25 | 3800-4850 | T>=90% | 500-6500 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3680~5160 | MWIR | 3700 ± 100 – 5200 ± 100 | 3800-4700 | T>=90% | 400-14000 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3700~4550 | MWIR | 3700 ± 50 – 4550 ± 50 | 3800-4450 | T>=90% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3700~4700 | MWIR | 3700 ± 50 – 4700 ± 50 | 3800-4600 | T>=85% | 500-8000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~4990 | MWIR | 3700 ± 50 – 4990 ± 40 | 3800-4750 | T>=85% | 1000-6500 nm; T < 1% | Germanium | 0.3, 0.38, 0.7 |
| STO-WBP3700~5020 | MWIR | 3700 ± 50 – 5020 ± 50 | 3800-4920 | T>=90% | 500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~5150 | MWIR | 3700 ± 50 – 5150 ± 50 | 3750-4900 | T>=92% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~5200 | MWIR | 3700 ± 60 – 5200 ± 60 | 3850-5050 | T>=90% | 200-10500 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3700~5600 | MWIR | 3700 ± 50 – 5600 ± 50 | 3850-5450 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~5750 | MWIR | 3700 ± 50 – 5750 ± 50 | 3850-5500 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3700~5800 | MWIR | 3700 ± 50 – 5800 ± 50 | 3850-5600 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 1 |
| STO-WBP3710~5030 | MWIR | 3710 ± 30 – 5030 ± 30 | 3800-4900 | T>=90% | 1800-7000 nm; T < 1% | Silicon | 1 |
| STO-WBP3730~4850 | MWIR | 3730 ± 50 – 4850 ± 50 | 3900-4700 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3730~4900 | MWIR | 3730 ± 50 – 4900 ± 50 | 3850-4750 | T>=90% | 1000-6500 nm; T < 1% | Germanium | 0.3, 0.4 |
| STO-WBP3730~4960 | MWIR | 3730 ± 50 – 4960 ± 50 | 3850-4600 | T>=85% | 1000-6500 nm; T < 1% | Germanium | 0.9 |
| STO-WBP3740~4840 | MWIR | 3740 ± 50 – 4840 ± 50 | 3740-4840 | T>=90% | 540-8040 nm | Germanium | 0.3 |
| STO-WBP3740~4860 | MWIR | 3740 ± 40 – 4860 ± 40 | 3850-4700 | T>=85% | 1000-10000 nm; T < 1% | Germanium | 0.3, 0.38, 0.4 |
| STO-WBP3740~4950 | MWIR | 3740 ± 50 – 4950 ± 50 | 3900-4800 | T>=90% | 540-8040 nm | Germanium | 0.3 |
| STO-WBP3750~4500 | MWIR | 3750 ± 50 – 4500 ± 50 | 3850-4400 | T>=85% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3750~4850 | MWIR | 3750 ± 50 – 4850 ± 50 | 3900-4700 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3750~4900 | MWIR | 3750 ± 50 – 4900 ± 50 | 3900-4700 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP3750~5020 | MWIR | 3750 ± 50 – 5020 ± 50 | 3850-4920 | T>=90% | 500-7000 nm; T < 1% | Germanium | 0.3, 1 |
| STO-WBP3750~5050 | MWIR | 3750 ± 50 – 5050 ± 50 | 3900-4900 | T>=85% | 1000-6500 nm; T < 1% | Germanium | 0.8 |
| STO-WBP3750~5650 | MWIR | 3750 ± 50 – 5650 ± 50 | 4000-5300 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.7 |
| STO-WBP3750~5700 | MWIR | 3750 ± 50 – 5700 ± 50 | 4000-5500 | T>=85% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3750~5800 | MWIR | 3750 ± 50 – 5800 ± 50 | 3800-5600 | T>=80% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP3800~4100 | MWIR | 3800 ± 50 – 4100 ± 50 | 3850-4050 | T>=90% | 500-8000 nm; T < 1% | Germanium | 0.6 |
| STO-WBP3800~4700 | MWIR | 3800 ± 50 – 4700 ± 50 | 3800-4900 | T>=90% | 1500-7000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP3800~5500 | MWIR | 3800 ± 100 – 5500 ± 100 | 3900-5400 | T>=80% | 400-14000 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3900~5150 | MWIR | 3900 ± 100 – 5150 ± 50 | 4400-4800 | T>=85% | 500-6500 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3900~5600 | MWIR | 3900 ± 100 – 5600 ± 100 | 4000-5500 | T>=80% | 400-14000 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP3900~5650 | MWIR | 3900 ± 100 – 5650 ± 100 | 4100-5400 | T>=80% | 400-14000 nm; T < 1% | Sapphire | 0.5 |
| STO-WBP4000~4650 | MWIR | 4000 ± 50 – 4650 ± 50 | 4120-4480 | T>=85% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4000~5000 | MWIR | 4000 ± 200 – 5000 ± 200 | 4200-4900 | T>=85% | 400-20000 nm; T < 1% | Sapphire | 0.5, 1 |
| STO-WBP4000~5200 | MWIR | 4000 ± 50 – 5200 ± 50 | 4100-5000 | T>=90% | 200-10000 nm; T < 1% | Germanium | 0.9, 1.8 |
| STO-WBP4100~4650 | MWIR | 4100 ± 50 – 4650 ± 50 | 4200-4550 | T>=80% | 1500-7000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP4120~4360 | MWIR | 4120 ± 60 – 4360 ± 60 | 4220-4320 | T>=85% | 300-6500 nm; T < 1% | Silicon | 1 |
| STO-WBP4140~4370 | MWIR | 4140 ± 30 – 4370 ± 30 | 4200-4300 | T>=75% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4140~4440 | MWIR | 4140 ± 30 – 4440 ± 30 | 4200-4400 | T>=80% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4150~4650 | MWIR | 4150 ± 50 – 4650 ± 50 | 4250-4550 | T>=90% | 1500-6000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP4200~4450 | MWIR | 4200 ± 20 – 4450 ± 20 | 4250-4400 | T>=85% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4200~4750 | MWIR | 4200 ± 50 – 4750 ± 50 | 4250-4650 | T>=80% | 1500-7000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4200~5000 | MWIR | 4200 ± 50 – 5000 ± 50 | 4350-4800 | T>=85% | 500-10000 nm; T < 1% | Silicon | 4 |
| STO-WBP4212~4457 | MWIR | 4212 ± 40 – 4457 ± 40 | 4260-4400 | T>=80% | 300-6500 nm; T < 1% | Silicon | 0.95 |
| STO-WBP4230~4520 | MWIR | 4230 ± 20 – 4520 ± 20 | 4350-4450 | T>=80% | 1500-5000 nm; T < 1% | Germanium | 1 |
| STO-WBP4250~4800 | MWIR | 4250 ± 50 – 4800 ± 50 | 4350-4700 | T>=80% | 1500-7000 nm; T < 1% | Germanium | 0.3, 0.9 |
| STO-WBP4250~5300 | MWIR | 4250 ± 50 – 5300 ± 50 | 4400-5000 | T>=85% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4290~4580 | MWIR | 4290 ± 20 – 4580 ± 20 | 4400-4500 | T>=80% | 1500-5000 nm; T < 1% | Germanium | 0.9, 1 |
| STO-WBP4300~4500 | MWIR | 4300 ± 30 – 4500 ± 30 | 4350-4450 | T>=90% | 1500-7000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4400~4700 | MWIR | 4400 ± 50 – 4700 ± 50 | 4570-4600 | T>=80% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4420~4720 | MWIR | 4420 ± 50 – 4720 ± 50 | 4470-4670 | T>=80% | 520-8020 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4450~4750 | MWIR | 4450 ± 70 – 4750 ± 70 | 4570-4620 | T>=70% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4450~4950 | MWIR | 4450 ± 50 – 4950 ± 50 | 4550-4900 | T>=90% | 1500-6000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4450~5150 | MWIR | 4450 ± 50 – 5150 ± 50 | 4550-5050 | T>=85% | 1000-9400 nm; T < 1% | Germanium | 0.8, 1 |
| STO-WBP4500~4800 | MWIR | 4500 ± 50 – 4800 ± 50 | 4640-4740 | T>=85% | 400-10000 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP4500~4900 | MWIR | 4500 ± 50 – 4900 ± 50 | 4600-4800 | T>=85% | 1500-11000 nm; T < 1% | Silicon | 0.8 |
| STO-WBP4520~4720 | MWIR | 4520 ± 50 – 4720 ± 50 | 4570-4670 | T>=80% | 520-8020 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP4520~4820 | MWIR | 4520 ± 50 – 4820 ± 50 | 4570-4770 | T>=80% | 520-8020 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4550~5200 | MWIR | 4550 ± 50 – 5300 ± 50 | 4600-5150 | T>=85% | 1000-9400 nm; T < 1% | Germanium | 0.8, 1 |
| STO-WBP4600~4900 | MWIR | 4600 ± 50 – 4900 ± 50 | 4700-4800 | T>=80% | 400-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4650~4950 | MWIR | 4650 ± 50 – 4950 ± 50 | 4700-4800 | T>=80% | 400-10000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP4650~4980 | MWIR | 4650 ± 50 – 4980 ± 50 | 4700-4800 | T>=80% | 400-10000 nm; T < 1% | Germanium | 1 |
| STO-WBP4650~5300 | MWIR | 4650 ± 50 – 5300 ± 50 | 4800-5200 | T>=80% | 1500-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4750~5150 | MWIR | 4750 ± 50 – 5150 ± 50 | 4800-5000 | T>=80% | 1000-8000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4800~5000 | MWIR | 4800 ± 50 – 5000 ± 50 | 4850-4950 | T>=80% | 400-5500 nm; T < 1% | Silicon | 1.2 |
| STO-WBP4800~5100 | MWIR | 4800 ± 50 – 5100 ± 50 | 4850-5050 | T>=80% | 400-5500 nm; T < 1% | Silicon | 1 |
| STO-WBP4800~5200 | MWIR/LWIR transition | 4800 ± 50 – 5200 ± 50 | 4860-5140 | T>=90% | 1000-8000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4900~5100 | MWIR/LWIR transition | 4900 ± 50 – 5100 ± 50 | 4950-5050 | T>=80% | 400-5500 nm; T < 1% | Silicon | 1 |
| STO-WBP4920~5800 | MWIR/LWIR transition | 4920 ± 50 – 5800 ± 50 | 5100-5600 | T>=85% | 400-10000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP4950~9250 | MWIR/LWIR transition | 4950 ± 50 – 9250 ± 50 | 5100-9100 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP5000~5800 | MWIR/LWIR transition | 5000 ± 50 – 5800 ± 50 | 5100-5600 | T>=80% | 400-10000 nm; T < 1% | Germanium | 1 |
| STO-WBP5010~5880 | MWIR/LWIR transition | 5010 ± 50 – 5880 ± 50 | 5110-5780 | T>=80% | 400-10000 nm; T < 1% | Germanium | 1 |
| STO-WBP5030~9280 | MWIR/LWIR transition | 5030 ± 50 – 9280 ± 50 | 5180-9130 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP5050~9160 | MWIR/LWIR transition | 5050 ± 50 – 9160 ± 50 | 5300-8750 | T>=85% | 620-10120 nm; T < 1% | Germanium | 2 |
| STO-WBP5090~9450 | MWIR/LWIR transition | 5090 ± 90 – 9450 ± 90 | 5240-9300 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP5100~5850 | MWIR/LWIR transition | 5100 ± 50 – 5850 ± 50 | 5300-5700 | T>=75% | 400-10000 nm; T < 1% | Germanium | 0.9, 1 |
| STO-WBP5100~9350 | MWIR/LWIR transition | 5100 ± 50 – 9350 ± 50 | 6100-9200 | T>=85% | 620-10120 nm; T < 1% | Germanium | 2 |
| STO-WBP5150~6000 | MWIR/LWIR transition | 5150 ± 50 – 6000 ± 50 | 5050-5900 | T>=80% | 500-10120 nm; T < 1% | Germanium | 2 |
| STO-WBP5150~9450 | MWIR/LWIR transition | 5150 ± 50 – 9450 ± 50 | 5400-9100 | T>=85% | 620-10120 nm; T < 1% | Germanium | 2 |
| STO-WBP5240~9440 | MWIR/LWIR transition | 5240 ± 70 – 9440 ± 70 | 6000-9000 | T>=80% | 580-10080 nm; T < 1% | Germanium | 2 |
| STO-WBP5400~7400 | MWIR/LWIR transition | 5400 ± 50 – 7400 ± 50 | 5500-7300 | T>=90% | 1500-10000 nm; T < 1% | Germanium | 1.5 |
| STO-WBP5450~7600 | MWIR/LWIR transition | 5450 ± 50 – 7600 ± 50 | 5600-7400 | T>=90% | 1500-10000 nm; T < 1% | Germanium | 1.5 |
| STO-WBP5510~6700 | MWIR/LWIR transition | 5510 ± 60 – 6700 ± 60 | 5700-6500 | T>=75% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP5550~7550 | MWIR/LWIR transition | 5550 ± 50 – 7550 ± 50 | 5750-7250 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.5 |
| STO-WBP5550~7600 | MWIR/LWIR transition | 5550 ± 50 – 7600 ± 50 | 5750-7300 | T>=90% | 1500-10600 nm; T < 1% | Germanium | 0.5 |
| STO-WBP5550~7650 | MWIR/LWIR transition | 5550 ± 50 – 7650 ± 50 | 5700-7450 | T>=90% | 1500-10000 nm; T < 1% | Germanium | 1.5 |
| STO-WBP5550~7700 | MWIR/LWIR transition | 5550 ± 50 – 7700 ± 50 | 5700-7500 | T>=85% | 1500-10000 nm; T < 1% | Germanium | 1.5 |
| STO-WBP5600~6800 | MWIR/LWIR transition | 5600 ± 30 – 6800 ± 30 | 5700-6680 | T>=75% | 1500-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP6000~12100 | LWIR | 6000 ± 200 – 12100 ± 200 | 6200-11800 | T>=90% | 1000-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP6200~10200 | LWIR | 6200 ± 100 – 10200 ± 100 | 7000-9400 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP6220~7530 | MWIR/LWIR transition | 6220 ± 50 – 7530 ± 50 | 6450-7450 | T>=90% | 2000-15000 nm; T < 3% | Germanium | 3 |
| STO-WBP6300~7600 | MWIR/LWIR transition | 6300 ± 50 – 7600 ± 50 | 6450-7450 | T>=90% | 2000-15000 nm; T < 3% | Germanium | 3 |
| STO-WBP6300~9900 | LWIR | 6300 ± 100 – 9900 ± 100 | 7000-9400 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP6400~10100 | LWIR | 6400 ± 100 – 10100 ± 100 | 7000-9400 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.8 |
| STO-WBP6420~10100 | LWIR | 6420 ± 50 – 10100 ± 50 | 7000-9400 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP6450~10750 | LWIR | 6450 ± 100 – 10750 ± 100 | 6600-10600 | T>=90% | 1500-14000 nm; T < 1% | Germanium | 1 |
| STO-WBP6450~7750 | MWIR/LWIR transition | 6450 ± 50 – 7750 ± 50 | 6650-7550 | T>=90% | 2000-15000 nm; T < 3% | Germanium | 3 |
| STO-WBP6550~8250 | MWIR/LWIR transition | 6550 ± 100 – 8250 ± 100 | 6700-8100 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP6600~8300 | MWIR/LWIR transition | 6600 ± 100 – 8300 ± 100 | 6750-8150 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP6650~8750 | MWIR/LWIR transition | 6650 ± 50 – 8750 ± 50 | 6800-8500 | T>=75% | 1500-11000 nm; T < 3% | Germanium | 0.3 |
| STO-WBP6650~9760 | LWIR | 6650 ± 50 – 9760 ± 50 | 7000-9400 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP6800~8100 | MWIR/LWIR transition | 6800 ± 80 – 8100 ± 80 | 7100-7800 | T>=90% | 200-12000 nm; T < 1% | Silicon | 1 |
| STO-WBP6800~8300 | MWIR/LWIR transition | 6800 ± 100 – 8300 ± 100 | 6950-8150 | T>=85% | 400-11000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP7100~8400 | MWIR/LWIR transition | 7100 ± 80 – 8400 ± 80 | 7400-8100 | T>=90% | 200-12000 nm; T < 1% | Silicon | 1 |
| STO-WBP7200~8500 | MWIR/LWIR transition | 7200 ± 80 – 8500 ± 80 | 7500-8200 | T>=90% | 200-12000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP7200~9400 | LWIR | 7200 ± 50 – 9400 ± 50 | 7300-9100 | T>=90% | 6400-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7250~7850 | MWIR/LWIR transition | 7250 ± 100 – 7850 ± 100 | 7350-7750 | T>=80% | 3300-20000 nm; T < 1% | Germanium | 1, 2 |
| STO-WBP7350~8080 | MWIR/LWIR transition | 7350 ± 50 – 8080 ± 50 | 7510-7980 | T>=90% | 400-12000 nm; T < 3% | Germanium | 0.3 |
| STO-WBP7400~8400 | MWIR/LWIR transition | 7400 ± 50 – 8400 ± 50 | 7600-8200 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7400~8430 | MWIR/LWIR transition | 7400 ± 70 – 8430 ± 70 | 7600-8100 | T>=85% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7400~8500 | MWIR/LWIR transition | 7400 ± 50 – 8500 ± 50 | 7600-8200 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7400~9500 | LWIR | 7400 ± 50 – 9500 ± 50 | 7500-9400 | T>=90% | 1500-13000 nm; T < 1% | Germanium | 0.6 |
| STO-WBP7450~10200 | LWIR | 7450 ± 50 – 10200 ± 50 | 7600-10000 | T>=85% | 1000-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7450~13600 | LWIR | 7450 ± 50 – 13600 ± 100 | 7700-13300 | T>=75% | 2000-19000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP7450~8500 | MWIR/LWIR transition | 7450 ± 50 – 8500 ± 50 | 7600-8100 | T>=75% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7450~9650 | LWIR | 7450 ± 50 – 9650 ± 50 | 7700-9400 | T>=85% | 1500-12000 nm; T < 1% | Germanium | 0.3, 0.6 |
| STO-WBP7400~9900 | LWIR | 7460 ± 50 – 9960 ± 50 | 7660-9760 | T>=90% | 460-16060 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7460~9630 | LWIR | 7460 ± 50 – 9630 ± 50 | 7550-9600 | T>=90% | 1500-13000 nm; T < 1% | Germanium | 1 |
| STO-WBP7480~9380 | LWIR | 7480 ± 70 – 9380 ± 70 | 7700-9100 | T>=80% | 500-10080 nm; T < 1% | Germanium | 2 |
| STO-WBP7500~7900 | MWIR/LWIR transition | 7500 ± 70 – 7900 ± 70 | 7600-7800 | T>=85% | 400-12075 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7500~8400 | MWIR/LWIR transition | 7500 ± 50 – 8400 ± 50 | 7700-8100 | T>=85% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7500~8500 | LWIR | 7500 ± 50 – 8500 ± 50 | 7700-8200 | T>=85% | 200-16000 nm; T < 1% | Silicon | 0.5, 1 |
| STO-WBP7500~8550 | LWIR | 7500 ± 50 – 8550 ± 50 | 7700-8200 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7500~8600 | LWIR | 7500 ± 50 – 8600 ± 50 | 7700-8300 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7500~9300 | LWIR | 7500 ± 50 – 9300 ± 50 | 7700-9000 | T>=85% | 1000-13900 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7500~9400 | LWIR | 7500 ± 50 – 9400 ± 50 | 8000-9000 | T>=85% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7550~13700 | LWIR | 7550 ± 50 – 13700 ± 100 | 7750-13400 | T>=85% | 2000-19000 nm; T < 1% | Germanium | 0.7, 1 |
| STO-WBP7550~13950 | LWIR | 7550 ± 100 – 13950 ± 100 | 7750-13400 | T>=80% | 2000-19000 nm; T < 1% | Germanium | 1 |
| STO-WBP7550~8600 | LWIR | 7550 ± 70 – 8600 ± 70 | 7800-8300 | T>=85% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7550~9800 | LWIR | 7550 ± 50 – 9800 ± 50 | 7700-9550 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP7575~7975 | MWIR/LWIR transition | 7575 ± 50 – 7975 ± 50 | 7675-7875 | T>=85% | 400-12075 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~10100 | LWIR | 7600 ± 70 – 10100 ± 100 | 7770-9900 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~10160 | LWIR | 7600 ± 100 – 10160 ± 100 | 7800-9800 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~8100 | MWIR/LWIR transition | 7600 ± 100 – 8100 ± 100 | 7700-8000 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~8600 | LWIR | 7600 ± 50 – 8600 ± 50 | 7800-8300 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7600~9300 | LWIR | 7600 ± 50 – 9300 ± 50 | 7700-9000 | T>=85% | 1000-13900 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~9500 | LWIR | 7600 ± 50 – 9500 ± 50 | 8000-9200 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~9600 | LWIR | 7600 ± 50 – 9600 ± 50 | 7800-9300 | T>=85% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~9700 | LWIR | 7600 ± 50 – 9700 ± 50 | 8000-9500 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~9730 | LWIR | 7600 ± 50 – 9730 ± 50 | 7800-9500 | T>=85% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7600~9950 | LWIR | 7600 ± 50 – 9950 ± 50 | 7900-9600 | T>=85% | 6400-13000 nm; T < 1% | Germanium | 0.6 |
| STO-WBP7630~8070 | MWIR/LWIR transition | 7630 ± 70 – 8070 ± 70 | 7730-7970 | T>=85% | 400-12075 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7650~10400 | LWIR | 7650 ± 50 – 10400 ± 50 | 7800-10250 | T>=85% | 1000-12000 nm; T < 1% | Germanium | 0.38 |
| STO-WBP7650~13900 | LWIR | 7650 ± 50 – 13900 ± 100 | 7800-13400 | T>=85% | 2000-19000 nm; T < 1% | Germanium | 0.7, 1 |
| STO-WBP7650~14100 | LWIR | 7650 ± 50 – 14100 ± 100 | 7750-13400 | T>=85% | 2000-19000 nm; T < 1% | Germanium | 0.4, 0.7, 1 |
| STO-WBP7650~8690 | LWIR | 7650 ± 70 – 8690 ± 70 | 7900-8400 | T>=80% | 200-16000 nm; T < 1% | Silicon | 1 |
| STO-WBP7650~9870 | LWIR | 7650 ± 50 – 9870 ± 50 | 8000-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7700~13500 | LWIR | 7700 ± 200 – 13500 ± 500 | 7900-13000 | T>=85% | 2000-19000 nm; T < 1% | Germanium | 1 |
| STO-WBP7700~14250 | LWIR | 7700 ± 100 – 14250 ± 100 | 7750-13400 | T>=85% | 2000-19000 nm | Germanium | 0.4, 1 |
| STO-WBP7700~8200 | MWIR/LWIR transition | 7700 ± 100 – 8200 ± 100 | 7810-8110 | T>=80% | 1500-13000 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP7700~9400 | LWIR | 7700 ± 50 – 9400 ± 50 | 7850-9200 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7700~9600 | LWIR | 7700 ± 100 – 9600 ± 100 | 7950-9450 | T>=90% | 400-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7700~9650 | LWIR | 7700 ± 50 – 9650 ± 50 | 8000-9400 | T>=85% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7700~9850 | LWIR | 7700 ± 100 – 9850 ± 100 | 7870-9570 | T>=85% | 1500-14070 nm; T < 1% | Germanium | 0 |
| STO-WBP7700~9900 | LWIR | 7700 ± 50 – 9900 ± 50 | 8000-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7700~9980 | LWIR | 7700 ± 50 – 9980 ± 50 | 8000-9700 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP7730~10250 | LWIR | 7730 ± 70 – 10250 ± 100 | 7900-10050 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7730~9950 | LWIR | 7730 ± 50 – 9950 ± 50 | 8100-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~10000 | LWIR | 7750 ± 50 – 10000 ± 50 | 8100-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~10050 | LWIR | 7750 ± 50 – 10050 ± 50 | 7700-10000 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~10100 | LWIR | 7750 ± 50 – 10100 ± 100 | 7700-10000 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3, 0.6 |
| STO-WBP7750~10250 | LWIR | 7750 ± 50 – 10250 ± 50 | 7800-9800 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~10300 | LWIR | 7750 ± 50 – 10300 ± 50 | 7900-10150 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~10500 | LWIR | 7750 ± 100 – 10500 ± 100 | 7950-10300 | T>=90% | 500-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~9700 | LWIR | 7750 ± 50 – 9700 ± 50 | 8100-9500 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7750~9980 | LWIR | 7750 ± 50 – 9980 ± 50 | 8000-9700 | T>=80% | 1500-12000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP7770~10580 | LWIR | 7770 ± 50 – 10580 ± 50 | 7950-10400 | T>=90% | 500-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7780~9280 | LWIR | 7780 ± 100 – 9280 ± 100 | 8100-9000 | T>=90% | 3030-14140 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7780~9480 | LWIR | 7780 ± 100 – 9480 ± 100 | 8100-9000 | T>=90% | 3030-14140 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7800~10050 | LWIR | 7800 ± 50 – 10050 ± 50 | 8100-9700 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7800~10100 | LWIR | 7800 ± 50 – 10100 ± 50 | 7900-10000 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7800~10350 | LWIR | 7800 ± 70 – 10350 ± 100 | 7970-10150 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7800~10600 | LWIR | 7800 ± 100 – 10600 ± 100 | 8000-10400 | T>=85% | 1000-12000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP7800~12100 | LWIR | 7800 ± 100 – 12100 ± 100 | 8100-11900 | T>=85% | 1000-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP7800~12200 | LWIR | 7800 ± 75 – 12200 ± 75 | 8100-11950 | T>=85% | 1000-15000 nm; T < 1% | Germanium | 0.5, 0.9 |
| STO-WBP7800~14200 | LWIR | 7800 ± 100 – 14200 ± 100 | 8300-13500 | T>=85% | 1500-19000 nm; T < 1% | Germanium | 0.7 |
| STO-WBP7800~9650 | LWIR | 7800 ± 50 – 9650 ± 50 | 8200-9300 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3, 0.7 |
| STO-WBP7800~9700 | LWIR | 7800 ± 50 – 9700 ± 50 | 8100-9500 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850-13650 | LWIR | 7850 ± 50 – 13650 ± 50 | 8100-13300 | T>=70% | 1500-20000 nm; T < 1.5% | Silicon | 1 |
| STO-WBP7850~10450 | LWIR | 7850 ± 50 – 10450 ± 50 | 8000-10100 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~10600 | LWIR | 7850 ± 50 – 10600 ± 50 | 8000-10350 | T>=85% | 1000-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~10650 | LWIR | 7850 ± 100 – 10650 ± 100 | 8050-10450 | T>=90% | 500-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~13750 | LWIR | 7850 ± 50 – 13750 ± 50 | 8100-13300 | T>=70% | 1500-20000 nm; T < 1.5% | Silicon | 0.5 |
| STO-WBP7850~13900 | LWIR | 7850 ± 100 – 13900 ± 400 | 8200-13400 | T>=80% | 2000-19000 nm; T < 1% | Germanium | 1 |
| STO-WBP7850~9650 | LWIR | 7850 ± 50 – 9650 ± 50 | 7900-9400 | T>=90% | 400-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~9700 | LWIR | 7850 ± 50 – 9700 ± 50 | 8300-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~9750 | LWIR | 7850 ± 50 – 9750 ± 50 | 7950-9450 | T>=90% | 400-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7850~9850 | LWIR | 7850 ± 50 – 9850 ± 50 | 7900-9400 | T>=90% | 400-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7800~10200 | LWIR | 7880 ± 100 – 10300 ± 100 | 8080-10100 | T>=90% | 406-14140 nm; T < 1% | Germanium | 0.5 |
| STO-WBP7880~10400 | LWIR | 7880 ± 100 – 10400 ± 100 | 8100-10100 | T>=90% | 406-14140 nm; T < 1% | Germanium | 0.5 |
| STO-WBP7900~12000 | LWIR | 7900 ± 100 – 12000 ± 100 | 8100-11800 | T>=90% | 400-20000 nm; T < 1% | Germanium | 1 |
| STO-WBP7900~12200 | LWIR | 7900 ± 100 – 12200 ± 100 | 8150-11900 | T>=85% | 1000-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP7900~9800 | LWIR | 7900 ± 50 – 9800 ± 50 | 8300-9300 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7920~10350 | LWIR | 7920 ± 70 – 10350 ± 100 | 8090-10150 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7920~10500 | LWIR | 7920 ± 70 – 10500 ± 100 | 8090-10300 | T>=90% | 400-16000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7950~10050 | LWIR | 7950 ± 50 – 10050 ± 50 | 8300-9700 | T>=92% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7950~10400 | LWIR | 7950 ± 50 – 10400 ± 50 | 8500-10100 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP7950~13850 | LWIR | 7950 ± 50 – 13850 ± 50 | 8300-13300 | T>=75% | 1500-20000 nm; T < 1.5% | Silicon | 0.4 |
| STO-WBP7950~9850 | LWIR | 7950 ± 50 – 9850 ± 50 | 8200-9600 | T>=90% | 1500-12000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP7980~9680 | LWIR | 7980 ± 100 – 9680 ± 100 | 8030-9530 | T>=90% | 3030-14140 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8000~10100 | LWIR | 8000 ± 100 – 10100 ± 100 | 8200-9900 | T>=90% | 1500-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8000~10700 | LWIR | 8000 ± 200 – 10700 ± 200 | 8600-10000 | T>=90% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP8000~11300 | LWIR | 8000 ± 50 – 11300 ± 50 | 8300-11200 | T>=90% | 400-12200 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8000~11400 | LWIR | 8000 ± 50 – 11400 ± 50 | 8300-11000 | T>=90% | 400-12200 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8000~12000 | LWIR | 8000 ± 100 – 12000 ± 100 | 8200-11800 | T>=90% | 400-20000 nm; T < 1% | Germanium | 1 |
| STO-WBP8000~12200 | LWIR | 8000 ± 100 – 12200 ± 100 | 8300-11800 | T>=90% | 1000-15000 nm; T < 1% | Germanium | 0.5, 0.9 |
| STO-WBP8000~12400 | LWIR | 8000 ± 100 – 12400 ± 100 | 8300-12000 | T>=90% | 1000-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8000~13900 | LWIR | 8000 ± 50 – 13900 ± 50 | 8300-13600 | T>=75% | 1500-20000 nm; T < 1.5% | Silicon | 1 |
| STO-WBP8050~13850 | LWIR | 8050 ± 50 – 13850 ± 50 | 8500-13300 | T>=70% | 1500-20000 nm; T < 1.5% | Silicon | 1 |
| STO-WBP8080~9880 | LWIR | 8080 ± 100 – 9880 ± 100 | 8500-9500 | T>=90% | 3030-14140 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8100~11700 | LWIR | 8100 ± 100 – 11700 ± 100 | 8400-11400 | T>=90% | 400-12200 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8100~12800 | LWIR | 8100 ± 100 – 12800 ± 100 | 8300-12600 | T>=85% | 1000-15000 nm; T < 1% | Germanium | 0.5 |
| STO-WBP8100~9000 | LWIR | 8100 ± 100 – 9000 ± 100 | 8250-8850 | T>=85% | 490-10090 nm; T < 1% | Germanium | 0.9, 1 |
| STO-WBP8200-10100 | LWIR | 8200 ± 400 – 10100 ± 420 | 8800-9500 | T>=88% | 2000-12000 nm; T < 1% | Germanium | 0.5, 0.6 |
| STO-WBP8200-12000 | LWIR | 8200 ± 100 – 12000 ± 100 | 8400-11800 | T>=90% | 400-20000 nm; T < 1% | Germanium | 1 |
| STO-WBP8200~10900 | LWIR | 8200 ± 200 – 10900 ± 200 | 8600-10000 | T>=90% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP8230~12400 | LWIR | 8230 ± 150 – 12400 ± 200 | 8800-11000 | T>=75% | 7000-15000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP8200~9000 | LWIR | 8240 ± 50 – 9140 ± 50 | 8340-9040 | T>=90% | 490-10090 nm; T < 1% | Germanium | 1 |
| STO-WBP8300-8900 | LWIR | 8300 ± 100 – 8900 ± 100 | 8400-8700 | T>=85% | 1570-14070 nm; T < 1% | Germanium | 0 |
| STO-WBP8300~13000 | LWIR | 8300 ± 160 – 13000 ± 160 | 8800-12500 | T>=75% | 7000-15000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP8300~9200 | LWIR | 8300 ± 100 – 9200 ± 100 | 8430-9090 | T>=85% | 490-10090 nm; T < 1% | Germanium | 1 |
| STO-WBP8300~9300 | LWIR | 8300 ± 100 – 9300 ± 100 | 8500-9100 | T>=85% | 490-10090 nm; T < 1% | Germanium | 1 |
| STO-WBP8400~13000 | LWIR | 8400 ± 150 – 13000 ± 150 | 8900-12500 | T>=75% | 7000-15000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP8400~14700 | LWIR | 8400 ± 200 – 14700 ± 300 | 9000-13000 | T>=75% | 400-20000 nm; T < 1% | Silicon | 0.5 |
| STO-WBP8500-12250 | LWIR | 8500 ± 100 – 12250 ± 100 | 8700-12100 | T>=85% | 1500-15500 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8500-9050 | LWIR | 8500 ± 100 – 9050 ± 100 | 8650-8900 | T>=85% | 1570-14070 nm; T < 1% | Germanium | 0 |
| STO-WBP8550-12350 | LWIR | 8550 ± 50 – 12350 ± 50 | 8700-12200 | T>=85% | 1500-15500 nm; T < 1% | Germanium | 0.3, 0.5 |
| STO-WBP8600-12500 | LWIR | 8600 ± 150 – 12500 ± 150 | 8980-12000 | T>=85% | 1500-15500 nm; T < 1% | Germanium | 0.3, 0.8 |
| STO-WBP8700-9400 | LWIR | 8700 ± 100 – 9400 ± 100 | 8900-9300 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8770-9550 | LWIR | 8770 ± 50 – 9550 ± 50 | 9000-9400 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8800-9700 | LWIR | 8850 ± 50 – 9650 ± 50 | 9000-9500 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8900-9500 | LWIR | 8900 ± 100 – 9500 ± 100 | 9000-9400 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8900-9600 | LWIR | 8900 ± 100 – 9600 ± 100 | 9000-9500 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8900-9700 | LWIR | 8900 ± 100 – 9700 ± 100 | 9100-9500 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP8900-9800 | LWIR | 8900 ± 100 – 9800 ± 100 | 9100-9500 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP9000-9850 | LWIR | 9000 ± 100 – 9850 ± 100 | 9100-9500 | T>=85% | 1500-13000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP9600-14800 | LWIR | 9600 ± 100 – 14800 ± 100 | 9900-14400 | T>=85% | 400-20000 nm; T < 1% | Zinc selenide | 0.3 |
| STO-WBP9800-15100 | LWIR | 9800 ± 100 – 15100 ± 100 | 11000-14700 | T>=85% | 400-20000 nm; T < 1% | Zinc selenide | 0.3 |
| STO-WBP10100-11100 | LWIR | 10100 ± 100 – 11100 ± 100 | 10350-10850 | T>=90% | 7600-14000 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10160-11180 | LWIR | 10160 ± 50 – 11180 ± 50 | 10310-11030 | T>=90% | 2000-15000 nm; T < 1% | Germanium | 3 |
| STO-WBP10200-11600 | LWIR | 10200 ± 100 – 11600 ± 100 | 10600-11300 | T>=85% | 7000-14000 nm; T < 1% | Germanium | 1 |
| STO-WBP10240-10840 | LWIR | 10240 ± 50 – 10840 ± 50 | 10340-10740 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10240-11260 | LWIR | 10240 ± 50 – 11260 ± 50 | 10400-11100 | T>=90% | 2000-15000 nm; T < 1% | Germanium | 3 |
| STO-WBP10290-11490 | LWIR | 10290 ± 100 – 11490 ± 100 | 10490-11290 | T>=80% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP10300-11400 | LWIR | 10300 ± 100 – 11400 ± 100 | 10500-11100 | T>=80% | 7000-14000 nm; T < 1% | Germanium | 0.9 |
| STO-WBP10300-11500 | LWIR | 10300 ± 120 – 11500 ± 120 | 10800-11300 | T>=85% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP10250-10850 | LWIR | 10340 ± 50 – 10940 ± 50 | 10440-10840 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10340-10840 | LWIR | 10340 ± 50 – 10840 ± 50 | 10440-10740 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10340-11040 | LWIR | 10340 ± 50 – 11040 ± 50 | 10440-10940 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10360-10860 | LWIR | 10360 ± 50 – 10860 ± 50 | 10460-10760 | T>=90% | 1060-14060 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10400-11300 | LWIR | 10400 ± 100 – 11300 ± 100 | 10700-11100 | T>=90% | 7000-14000 nm; T < 1% | Germanium | 1 |
| STO-WBP10440-11040 | LWIR | 10440 ± 50 – 11040 ± 50 | 10600-10900 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10540-11140 | LWIR | 10540 ± 50 – 11140 ± 50 | 10700-11000 | T>=80% | 590-14090 nm; T < 1% | Germanium | 0.3 |
| STO-WBP10600-11450 | LWIR | 10600 ± 100 – 11450 ± 100 | 10700-11350 | T>=85% | 7500-14000 nm; T < 1% | Germanium | 0.7 |
| STO-WBP10600-11800 | LWIR | 10600 ± 100 – 11800 ± 100 | 10980-11750 | T>=80% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP11300-15600 | LWIR | 11300 ± 100 – 15600 ± 100 | 11500-15000 | T>=70% | 10080-16080 nm; T < 1% | Wedge germanium | 2 |
| STO-WBP11400-12380 | LWIR | 11400 ± 60 – 12380 ± 60 | 11550-12230 | T>=85% | 2000-15000 nm; T < 1% | Germanium | 3 |
| STO-WBP11400-12600 | LWIR | 11490 ± 100 – 12690 ± 100 | 12000-12490 | T>=85% | 1590-16090 nm; T < 1% | Germanium | 0.8 |
| STO-WBP11500-12500 | LWIR | 11500 ± 50 – 12500 ± 50 | 11650-12350 | T>=85% | 2000-15000 nm; T < 1% | Germanium | 3 |
| STO-WBP11570-12570 | LWIR | 11570 ± 50 – 12570 ± 50 | 11770-12370 | T>=85% | 2000-15000 nm; T < 1% | Germanium | 3 |
Ulteriori modelli passa-lungo per trasmettere energia infrarossa a lunghezza d'onda maggiore e bloccare le lunghezze d'onda più corte.
| Modello | Intervallo spettrale | Cut-on (nm) | Trasmittanza | Intervallo di trasmissione (nm) | Blocco | Substrato | Spessore del substrato (mm) |
|---|---|---|---|---|---|---|---|
| STO-LP1500 | SWIR | 1500 ± 100 | T>=85% | 1600-5300 | 400-1400 nm; T < 1% | Sapphire | 0.3 |
| STO-LP1700 | SWIR | 1700 ± 100 | T>=80% | 1750-3400 | 800-1600 nm; T < 1% | Silicon | 0.5 |
| STO-LP1800 | SWIR | 1800 ± 50 | T>=80% | 1850-3400 | 800-1600 nm; T < 1% | Silicon | 0.5 |
| STO-LP2200 | SWIR | 2200 ± 100 | T>=90% | 2700-3500 | 400-1800 nm; T < 1% | Silicon | 0.762 |
| STO-LP2250 | SWIR | 2250 ± 50 | T>=90% | 2400-3600 | 1500-2100 nm; T < 1% | Silicon | 1 |
| STO-LP2900 | MWIR | 2900 ± 50 | T>=90% | 3050-5100 | 1300-2600 nm; T < 1% | Zinc selenide | 0.5 |
| CUT3200 | MWIR | 3400 ± 10 | T>=90% | 3480-5350 | 1500-3266 nm; T < 1% | Germanium | 0.3 |
| CUT3500 | MWIR | 3670 ± 50 | T>=90% | 3800-5600 | 1500-3500 nm; T < 1% | Germanium | 1, 2.5 |
| STO-LP3710+DLC | MWIR | 3710 ± 50 | T>=70% | 4000-5500 | 1500-3400 nm; T < 1% | Silicon | 0.5 |
| STO-LP3730 | MWIR | 3730 ± 50 | T>=90% | 4400-4900 | 1700-3700反射; T < 1% | Germanium | 0.5, 0.7 |
| STO-LP3760 | MWIR | 3760 ± 60 | T>=90% | 3960-4800 | 1600-3480 nm; T < 1% | Germanium | 0.5 |
| STO-LP3850 | MWIR | 3850 ± 50 | T>=90% | 4000-5000 | 1500-3500 nm; T < 1% | Germanium | 0.5 |
| STO-LP4730 | MWIR | 4730 ± 200 | T>=80% | 4900-5150 | 400-4200 nm; T < 1% | Sapphire | 1 |
| STO-LP5800 | MWIR/LWIR transition | 5800 ± 150 | T>=80% | 6000-13000 | 2000-5500 nm; T < 1% | Silicon | 0.5 |
| STO-LP6200 | MWIR/LWIR transition | 6200 ± 100 | T>=90% | 6400-12600 | 2000-6000 nm; T < 1% | Germanium | 0.9, 3, 3.5 |
| STO-LP6300 | MWIR/LWIR transition | 6300 ± 100 | T>=90% | 6550-14500 | 1500-6100 nm; T < 1% | Germanium | 0.3 |
| STO-LP6400 | MWIR/LWIR transition | 6400 ± 100 | T>=90% | 6500-12600 | 2000-6000 nm; T < 1% | Germanium | 0.9, 3 |
| STO-LP6500 | MWIR/LWIR transition | 6500 ± 50 | T>=85% | 6800-11000 | 1500-6200 nm; T < 1% | Germanium | 0.9, 2.8, 3 |
| STO-LP7250 | MWIR/LWIR transition | 7250 ± 50 | T>=90% | 7450-11000 | 1400-7000 nm; T < 1% | Germanium | 2.5 |
| STO-LP7570 | MWIR/LWIR transition | 7570 ± 70 | T>=90% | 7770-12600 | 1010-7320 nm; T < 1% | Germanium | 0.3 |
| STO-LP7675 | MWIR/LWIR transition | 7675 ± 75 | T>=90% | 8000-14000 | 1500-7550 nm; T < 1% | Germanium | 0.3 |
| STO-LP7770 | MWIR/LWIR transition | 7770 ± 70 | T>=90% | 7870-12600 | 1010-7320 nm; T < 1% | Germanium | 0.3 |
| STO-LP7950 | MWIR/LWIR transition | 7950 ± 150 | T>=85% | 8050-14000 | 190-7800 nm; T < 1% | Germanium | 1 |
| STO-LP9000 | LWIR | 9000 ± 300 | T>=90% | 9500-12500 | 400-8500 nm; T < 1% | Germanium | 0.5 |
| STO-LP10000 | LWIR | 10000 ± 70 | T>=90% | 10150-14300 | 1500-9800 nm; T < 1% | Zinc selenide | 0.5 |
| STO-LP10015 | LWIR | 10015 ± 100 | T>=85% | 10450-14500 | 1500-9800 nm; T < 1% | Germanium | 0.3 |
| STO-LP10600 | LWIR | 10600 ± 100 | T>=80% | 11000-14000 | 1500-10000 nm; T < 1% | Germanium | 2.7 |
| STO-LP10900 | LWIR | 10900 ± 100 | T>=80% | 11200-15400 | 1500-10750 nm; T < 1% | Germanium | 1 |
| STO-LP11050 | LWIR | 11050 ± 50 | T>=80% | 11200-15400 | 1500-10750 nm; T < 1% | Germanium | 0.8, 0.9 |
| STO-LP11190 | LWIR | 11190 ± 100 | T>=80% | 11500-15700 | 1500-10750 nm; T < 1% | Germanium | 0.8, 1 |
| STO-LP11600 | LWIR | 11600 ± 100 | T>=85% | 11800-12200 | 7000-11200 nm; T < 1% | Germanium | 0.9 |
| STO-LP11700 | LWIR | 11700 ± 100 | T>=80% | 11900-12300 | 7000-11200 nm; T < 1% | Germanium | 0.8, 0.9, 1, 2.7 |
Ulteriori intervalli di rivestimenti antiriflesso per infrarossi. Salvo conferma nella fonte, dimensioni e dettagli dei materiali sono dati di riferimento per il preventivo.
| Modello | Intervallo spettrale | Intervallo di trasmissione (nm) | Trasmittanza media | Spessore del substrato (mm) |
|---|---|---|---|---|
| STO-AR1000~2600 | SWIR | 1000-2600 | T>=90% | 1, 1.6, 6 |
| STO-AR1000~5100 | MWIR | 1000-5100 | T>=80% | 0.5, 1 |
| STO-AR1200~5500 | MWIR | 1200-5500 | T>=85% | 0.5 |
| STO-AR1250-1650 | SWIR | 1250-1650 | T>=99% | 0.3 |
| STO-AR1500~1600 | SWIR | 1500-1600 | T>=97% | 0.3, 1 |
| STO-AR1580~6900 | MWIR | 1580-6900 | T>=85% | 0.5, 1 |
| STO-AR1600~5300 | MWIR | 1600-5300 | T>=90% | 0.5, 1 |
| STO-AR1800~10000 | MWIR/LWIR transition | 1800-10000 | T>=90% | 1.2 |
| STO-AR1800~6000 | MWIR | 1500-5000 | T>=95% | 0.5 |
| STO-AR2000~12000 | MWIR/LWIR transition | 2000-12000 | T>=85% | 0.5 |
| STO-AR2000~14000 | LWIR | 2000-14000 | T>=80% | 0.5 |
| STO-AR2000~5600 | MWIR | 2000-5600 | T>=85% | 0.3, 1 |
| STO-AR2000~6000 | MWIR | 2000-6000 | T>=90% | 1, 5 |
| STO-AR2100~5500 | MWIR | 2100-5500 | T>=90% | 0.9, 1 |
| STO-AR2300~12600 | MWIR/LWIR transition | 2300-12600 | T>=90% | 1, 1.6 |
| STO-AR2300~5500 | MWIR | 2300-5500 | T>=92% | 1 |
| STO-AR2400~14000 | LWIR | 2400-14000 | T>=80% | 0.8, 2 |
| STO-AR2500~12000 | MWIR/LWIR transition | 2500-12000 | T>=90% | 1, 1.6 |
| STO-AR2500~12600 | MWIR/LWIR transition | 2500-12600 | T>=90% | 1.6 |
| STO-AR2500~14000 | LWIR | 2500-14000 | T>=85% | 0.5 |
| STO-AR2500~3300 | MWIR | 2500-3300 | T>=90% | 0.65, 1, 3 |
| STO-AR2500~4600 | MWIR | 2500-4600 | T>=90% | 0.5 |
| STO-AR2500~4700 | MWIR | 2500-4700 | T>=90% | 0.7, 0.8, 2.9, 12 |
| STO-AR2500~6000 | MWIR | 2500-6000 | T>=85% | 0.5 |
| STO-AR2600~5200 | MWIR | 2600-5200 | T>=90% | 0.5, 4 |
| STO-AR2680~4520 | MWIR | 2680-4520 | T>=90% | 0.5, 2.8, 3 |
| STO-AR2700~5300 | MWIR | 2700-5300 | T>=95% | 0.5 |
| STO-AR2700~9100 | MWIR/LWIR transition | 2700-9100 | T>=90% | 0.5, 5 |
| STO-AR2800~4900 | MWIR | 2800-4900 | T>=90% | 0.9 |
| STO-AR2800~5500 | MWIR | 2800-5500 | T>=90% | 0.5 |
| STO-AR2850~4850 | MWIR | 2850-4850 | T>=90% | 0.5 |
| STO-AR2900~5400 | MWIR | 2900-5400 | T>=90% | 6 |
| STO-AR3000~11000 | MWIR/LWIR transition | 3000-11000 | T>=90% | 0.38, 1.6 |
| STO-AR3000~12600 | MWIR/LWIR transition | 3000-12600 | T>=90% | 0.4, 0.9, 1.6 |
| STO-AR3000~14000 | LWIR | 3000-14000 | T>=90% | 0.3, 0.6, 0.7, 0.75, 0.8, 0.9, 1 |
| STO-AR3100~3600 | MWIR | 3100-3600 | T>=90% | 1 |
| STO-AR3200~3600 | MWIR | 3200-3600 | T>=85% | 0.45, 0.9 |
| STO-AR3200~5500 | MWIR | 3200-5500 | T>=85% | 0.9, 1 |
| STO-AR3400~12500 | MWIR/LWIR transition | 3400-12500 | T>=90% | 1 |
| STO-AR3500~10000 | MWIR/LWIR transition | 3500-10000 | T>=90% | 0.5, 1 |
| STO-AR3500~5000 | MWIR | 3500-5000 | T>=95% | 0.5, 1, 1.6 |
| STO-AR3600~4800 | MWIR | 3600-4800 | T>=95% | 0.5, 1 |
| STO-AR3600~5000 | MWIR | 3600-5000 | T>=95% | 0.5 |
| STO-AR3700~4800 | MWIR | 3700-4800 | T>=90% | 0.5, 1 |
| STO-AR3700~5000 | MWIR | 3700-5000 | T>=95% | 0.9 |
| STO-AR400~1700 | NIR | 400-1700 | T>=90% | 0.85, 1 |
| STO-AR400~3000 | SWIR | 400-3000 | T>=85% | 1.5 |
| STO-AR400~880 | NIR | 400-880 | T>=90% | 0.5 |
| STO-AR420~780 | NIR | 420-780 | T>=90% | 1 |
| STO-AR4300 | IR | 4300 | T>=90% | 1 |
| STO-AR4500~13000 | LWIR | 4500-13000 | T>=90% | 0.8, 1 |
| STO-AR5500~11000 | LWIR | 5500-11000 | T>=90% | 0.8, 2.5 |
| STO-AR5500~14000 | LWIR | 5500-14000 | T>=80% | 0.5 |
| STO-AR6000~10500 | LWIR | 6000-10500 | T>=90% | 0.9, 1 |
| STO-AR6000~11000 | LWIR | 6000-11000 | T>=90% | 2.5 |
| STO-AR6000~13000 | LWIR | 6000-13000 | T>=90% | 1 |
| STO-AR6000~18000 | LWIR | 6000-18000 | T>=48% | 0.8, 1 |
| STO-AR6200~12600 | LWIR | 6200-12600 | T>=90% | 0.5, 0.6, 0.9, 3, 6 |
| STO-AR6500~11000 | LWIR | 6500-11000 | T>=95% | 1 |
| STO-AR7000~12500 | LWIR | 7000-12500 | T>=95% | 0.4, 2.5, 2.8 |
| STO-AR7000~12600 | LWIR | 7000-12600 | T>=90% | 0.7, 0.9, 1, 3 |
| STO-AR7000~14000 | LWIR | 7000-14000 | T>=90% | 1 |
| STO-AR7000~14500 | LWIR | 7000-14500 | T>=90% | 0.8, 1 |
| STO-AR7000~14600 | LWIR | 7000-14600 | T>=90% | 0.9, 1, 3 |
| STO-AR7000~16000 | LWIR | 7000-16000 | T>=90% | 0.8, 0.9, 1, 3.5 |
| STO-AR7400~10700 | LWIR | 7400-10700 | T>=95% | 2.6, 3 |
| STO-AR7400~10900 | LWIR | 7400-10900 | T>=94% | 0.8, 2.9 |
| STO-AR7400~12800 | LWIR | 7400-12800 | T>=90% | 0.9, 1 |
| STO-AR7500~10100 | LWIR | 7500-10100 | T>=90% | 0.7, 0.9, 1, 2.9, 8.7 |
| STO-AR7500~10500 | LWIR | 7500-10500 | T>=93% | 0.7, 1 |
| STO-AR7500~10700 | LWIR | 7500-10700 | T>=90% | 1 |
| STO-AR7500~11000 | LWIR | 7500-11000 | T>=90% | 2.5, 2.8 |
| STO-AR7500~13000 | LWIR | 7500-13000 | T>=90% | 0.9, 5 |
| STO-AR7500~13500 | LWIR | 7500-13500 | T>=90% | 0.8 |
| STO-AR7500~9700 | LWIR | 7500-9700 | T>=85% | 0.75 |
| STO-AR7600~12700 | LWIR | 7600-12700 | T>=93% | 1 |
| STO-AR7700~11000 | LWIR | 7700-11000 | T>=95% | 0.9, 3 |
| STO-AR7700~9300 | LWIR | 7700-9300 | T>=93% | 0.3, 0.75 |
| STO-AR7800~10000 | LWIR | 7800-10000 | T>=95% | 0.9, 1 |
| STO-AR8000~10000 | LWIR | 8000-10000 | T>=92% | 0.9, 2.7, 2.8, 3 |
| STO-AR8000~13500 | LWIR | 8000-13500 | T>=90% | 3 |
| STO-AR8000~15000 | LWIR | 8000-15000 | T>=93% | 2 |
| STO-AR800~4000 | SWIR | 800-4000 | T>=80% | 1 |
| STO-AR9000~16500 | LWIR | 9000-16500 | T>=90% | 1.6 |
| STO-AR900~1700 | SWIR | 900-1700 | T>=90% | 1.6 |
| STO-AR9500~17000 | LWIR | 9500-17000 | T>=80% | 0.7, 1.6 |
Abbina i filtri IR al materiale del rivelatore, alla trasmissione del substrato e alla temperatura di esercizio. Le diverse bande IR non sono intercambiabili.
Nelle applicazioni IR, il materiale può limitare l'intervallo di lunghezze d'onda utilizzabile prima ancora di considerare il rivestimento. Verifica prima il substrato.
Per termografia o rilevamento di gas, specifica la banda di assorbimento target, l'intervallo di blocco e le condizioni operative.
La pagina copre le esigenze di filtraggio nel vicino infrarosso, nell'infrarosso a onde corte, medie e lunghe, ove siano disponibili dati.
I materiali del substrato hanno intervalli di trasmissione diversi: il materiale deve quindi supportare la banda di lunghezza d'onda infrarossa desiderata.
Sì. Per i sistemi a infrarossi è possibile richiedere bande di lunghezza d'onda, dimensioni, substrati e rivestimenti personalizzati.
Qualità e conformità
Per programmi OEM, strumenti di laboratorio e sistemi industriali, OPTOStokes rende chiari fin dall'inizio della valutazione del fornitore gli aspetti di qualità, conformità dei materiali e supporto tecnico.
Controllo di processo, registri di ispezione e cicli di rivestimento ripetibili per la produzione di componenti ottici.
La documentazione di conformità può essere predisposta per progetti qualificati e filiere soggette a regolamentazione.
I requisiti di lunghezza d'onda, FWHM, substrato, AOI, dimensioni e montaggio possono essere verificati con il team tecnico.
Per un preventivo mirato, indica la lunghezza d'onda richiesta, il livello di blocco, la trasmittanza e i requisiti del disegno tecnico.
I nostri tecnici ti aiuteranno a scegliere la soluzione ottica più adatta.